Colored cover plate glass for solar cell
A technology of solar cells and cover glass, applied in the field of solar cells, can solve the problems of single color of photovoltaic cells, difficult to meet construction, etc., and achieve the effects of improving utilization rate, long service life and reducing damage
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Embodiment 1
[0039] In this embodiment, the glass substrate is made of ultra-clear glass, and the material of the anti-reflection film coated on the outer layer of the glass substrate is silicon oxide; the material of the transparent electrode layer coated on the inner layer of the glass substrate is indium tin oxide;
[0040] The n-type zinc oxide film layer (undoped zinc oxide) is plated on the surface of the transparent electrode layer. The specific process parameters are: use zinc acetate as the precursor, ethylene glycol methyl ether as the solvent, and the mixture of zinc acetate and ethylene glycol methyl ether. The ratio is 1:1, prepared as a colloidal solution, deposited on the coated indium tin oxide film by spin coating, then pyrolyzed in the air at 300°C, and finally annealed and crystallized in oxygen at 550°C;
[0041] A p-type zinc oxide film layer (antimony-doped zinc oxide) is plated on the surface of the n-type zinc oxide film layer. The specific process parameters are: zi...
Embodiment 2~3
[0044] Except film thickness, the preparation process parameter of embodiment 2 ~ 3 is basically the same as embodiment 1, the refractive index of undoped zinc oxide, antimony doped zinc oxide and silicon oxide film layer, film in embodiment 1 ~ 3 The layer thickness and the 1931 CIE (x, y) color coordinates of the colored cover glass under the CIE-D65 illuminant are listed in Table 1.
[0045] Table 1
[0046]
[0047] It can be known from the color coordinates of reflected light in Table 1 that the photovoltaic cover glass with green, purple, and brown gray reflections was obtained in sequence in Examples 1 to 3.
Embodiment 4
[0049] In this embodiment, the glass substrate is made of ultra-clear glass, the material of the antireflection film layer is silicon oxide; the material of the transparent electrode layer is indium tin oxide; the material of the n-type zinc oxide film layer is aluminum-doped zinc oxide, and the specific process parameters are: Zinc acetate is used as a precursor, aluminum nitrate is used as a dopant, and ethylene glycol methyl ether is used as a solvent. The ratio of zinc acetate to ethylene glycol methyl ether is 1:1, and the colloidal solution is prepared according to the Al / Zn ratio of 5:1000. It is deposited on ultra-clear glass coated with indium tin oxide film by spin coating, then pyrolyzed in air at 300°C, and finally annealed and crystallized in air at 600°C; the p-type zinc oxide film material is nitrogen-doped Zinc oxide, the specific process parameters are: zinc acetate as the precursor, ammonium acetate as the dopant, ethylene glycol methyl ether as the solvent, t...
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