Bonding conductor paste
A technology for bonding and bonding structures, used in cable/conductor manufacturing, conductive adhesives, inorganic adhesives, etc., which can solve the problems of easy viscosity fluctuation, exudation of conductor paste, and fast volatilization speed, so as to reduce deterioration. or damage, less bleeding, and the effect of preventing deterioration of electrical properties
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Embodiment 1
[0193] 50 g of diethylene glycol monobutyl ether was added as a solvent (C1) to 10 g of methanol slurry of nAg, and it separated into the solvent part and the wet powder of nAg by centrifugation.
[0194] The solvent portion was discarded, and 50 g of diethylene glycol monobutyl ether was added to the wet powder to disperse it, and then centrifuged to separate into a solvent portion and a wet powder of nAg. This operation was repeated three times to obtain nAg diethylene glycol monobutyl ether wet powder. Heat the wet powder to 400°C in TG-DTA, and calculate the weight of diethylene glycol monobutyl ether contained according to the weight loss. The diethylene glycol monobutyl ether content in the wet powder was 14.5 wt%.
[0195] Then, 80 parts of AgC-239, 23.4 parts of nAg wet powder (20 parts of nAg, 3.4 parts of diethylene glycol monobutyl ether: according to the calculated value obtained by the above-mentioned TG-DTA), as a solvent (C2 ) were mixed with 8 parts of tripro...
Embodiment 1~40
[0197] Adhesion was obtained in the same manner as in Example 1 except that the compounding amounts of silver particles (A), silver particles (B), solvent (C1), and solvent (C2) were set as shown in Tables 1 to 6. conductor paste.
Embodiment 32~35
[0209] ・Gold-plated substrate (manufactured by Nippon Testpanel Co., Ltd.) (Examples 32 to 35 and Comparative Example 5 only)
[0210] Substrate: Copper (1.0mm×9mm×60mm)
[0211] Substrate: Electroless Nickel (5μm)
[0212] Surface: semi-gloss silver plating (1.0μm)
[0213] ・Silicon chip (manufactured by YAMANAKA HUTEC Co., Ltd.)
[0214] Silicon (0.525mm×3mm×3mm)
[0215] Substrate: Titanium 500nm sputtering
[0216] Most surface: Silver 2μm sputtering
[0217] [mask]
[0218] ・Metal mask (manufactured by TOWA-TECH Co., Ltd.)
[0219] 3mm×3mm, mesh thickness 100μm
[0220] [equipment]
[0221] · Mounter
[0222] SMT-64H (manufactured by Okuhara Electric Co., Ltd.)
[0223] ·Sintering furnace (reflow furnace)
[0224] RSS-450-210-FA (manufactured by UNITEMP)
[0225] The bonding conductor paste obtained in the above-mentioned Examples and Comparative Examples was applied on the substrate (1) by a metal mask printing method to form a coating film (coating film thic...
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Abstract
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