Method for producing synthetic quartz material for semiconductor mask
A technology for synthesizing quartz and mask plates, which is applied in glass production, glass molding, manufacturing tools, etc. It can solve the problems of difficult metal impurity content, metal impurity pollution of quartz materials, material pollution, etc., and achieves improved optical uniformity and large size. , high quality effect
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[0041] The present invention will be further described below with reference to specific embodiments, so that those skilled in the art can better understand the present invention and implement it, but the embodiments are not intended to limit the present invention.
[0042] See figure 1 The present invention provides a method for producing a synthetic quartz material for a semiconductor mask, comprising four main processes: deposition of soot, dehydration of soot, vitrification and introduction of fluorine bases, and annealing in a furnace. VAD) is first deposited to form low-density SiO 2 The loose body 12 is then sintered; the sintering process is dehydrated, dehydroxylated, degassed and densified until vitrification is achieved; after the sintering is completed, the obtained quartz glass is annealed to fully release the internal stress of the quartz glass to ensure its uniformity and finally obtain the finished quartz glass 26 after annealing, that is, high-quality, high-pu...
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