Method for making lithographic plate

A technology of lithography and printing plates, applied in the field of printing plates, which can solve problems such as pollution, residual color or film performance deterioration, and easy production

Inactive Publication Date: 2002-02-06
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when such a developer containing alkali metal silicate is used, the following problems arise: it is easy to produce 2 caused by solid precipitation, and when neutralizing the waste water from the developer produced by SiO 2 induced gel
However, the known steam treatment method can prevent the dissolution of the film during the development process, but cannot solve the problem of contamination after retention, although it prevents residual color or residual film in the non-image area
Although treating anodized films with silicates can solve the problem of contamination after retention, it does not solve the problems of printing durability, residual color or performance deterioration of the film

Method used

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Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0126] In the preparation of these o-naphthoquinonediazide compounds, it is preferred to use 0.2-1.2eq, more preferably 0.3-1.0eq of 1,2-diazonaphthoquinone sulfonic acid chloride (based on the amount of the hydroxyl group of the polyhydroxy compound) out). The 1,2-diazonaphthalenesulfonic acid chlorine may preferably be 1,2-diazonaphthoquinone-5-sulfonic acid chlorine, but 1,2-diazonaphthoquinone-4-sulfonic acid chlorine may also be used. The obtained n-naphthoquinonediazide compound is a mixture of products differing in the position of the 1,2-diazonaphthoquinonesulfonic acid group and in the amount introduced therein. However, those mixtures having 5 mol% or more of the compound in which all of the hydroxyl groups are converted to 1,2-diazonaphthoquinone sulfonate (completely esterified compound) on the basis of the mixture are preferred, more preferably those having Those mixtures of 20-99 mol % of said compounds.

[0127] Moreover, instead of the o-naphthoquinonediazide...

Embodiment 1 to 14 and comparative Embodiment 1 to 4

[0326]

[0327] (a) Molten aluminum (Al) comprising the composition described in Table 1 was prepared, processed and filtered. Next, an aluminum ingot with a thickness of 500 mm and a width of 1200 mm was prepared by the DC casting method. The surface (average 10 mm thickness) of this aluminum ingot was cut with a planer. Then, it was left to stand at 550° C. for about 5 hours. After the aluminum ingot became 400° C., a smooth panel having a thickness of 2.7 mm was prepared by a hot roll. Also, heat treatment was performed at 500° C. using a continuous annealer, and then the plate was processed by cold rolls to bring the thickness of the plate to 0.24 mm. The width of the treated aluminum plate was 1030 mm, and then the following treatments were also carried out continuously.

[0328] combination

[0329] (b) The aluminum plate is etched with a solution containing 26wt.% sodium hydroxide and 6.5wt.% aluminum ions, and the amount of the aluminum plate dissolved ...

Embodiment 15 and 16， comparative Embodiment 5 and 6

[0382] After treatment of Substrate A according to Table 3 below, Compound A was as described in Examples 1 to 14 at 15 mg / m 2 An amount of is coated thereon, followed by drying at 80° C. for 10 seconds. A coating solution of photosensitive composition B (described below) was prepared, and it was coated at 1.0 g / m 2 Amounts of are coated onto low layer substrates to provide pre-sensitized plates for lithographic printing plate preparation. In Table 3, the treatment with the nitrite-containing solution was carried out at 80° C. for 1 minute unless otherwise specified.

[0383] (Coating Solution of Photosensitive Composition B)

[0384] Capric acid 0.03g

[0385] Copolymer 1 (see below) 0.75g

[0386] Between, p-cresol novolac resin (the mol ratio of m / p=6 / 4, weight-average molecular weight: 3500, containing the unreacted cresol of 0.5wt.%) 0.25g

[0387] p-toluenesulfonic acid 0.003g

[0388] Tetrahydrophthalic anhydride 0.03g

[0389] Cyanine dye A (see chemical formula...

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Abstract

The present invention relates to a preparation method for a lithographic printing plate, which comprises forming a presensitized plate by coating a photosensitive layer or thermosensitive layer on an aluminum substrate treated with an aqueous solution after optionally anodized and developing the presensitized plate with a developer comprising no silicate, wherein the aqueous solution comprises at least one compound selected from the group consisting of nitrite group-containing compound, fluorine atom-containing compound and phosphorous atom-containing compound, in the proviso that when the at least one compound is fluorine atom-containing compound, the treated aluminum substrate has a surface which satisfies the formula: 0.30 <= A / (A+B)<=0.90 (wherein, A represents peak area of fluorine atom (1S) (counts eV / sec) determined by X ray Electron Spectroscopy for Chemical Analysis (ESCA), and B represents peak area of aluminum atom (2P) (counts eV / sec) determined by X ray ESCA, and when the at least one compound is phosphorous atom-containing compound, the treated aluminum substrate has a surface which satisfies the formula: 0.05 <= A / (A+B) <= 0.70 (wherein, A represents peak area of phosphorous atom (1P) (counts eV / sec) determined by X ray ESCA, and B represents peak area of aluminum atom (2P) (counts eV / sec) determined by X ray ESCA.

Description

technical field [0001] The present invention relates to a method for preparing lithographic printing plates from photosensitive or heat-sensitive preformed photosensitive resin lithography. The present invention improves the characteristics of the plate, such as residual color and film in the non-image area, contamination of printed matter in the portion corresponding to the non-image area, and improves printing durability. Background technique [0002] Conventional PS plates used to make lithographic printing plates have an ink-receiving photosensitive layer formed on a hydrophilic substrate. When the photosensitive layer of the PS plate is imagewise exposed, the exposed photosensitive layer is then developed by a developer to remove the exposed photosensitive layer area, exposing the hydrophilic surface of the substrate. On the other hand, unexposed areas of the photosensitive layer remain on the surface of the above-mentioned substrate to form ink-receiving image portion...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B41N3/03
CPCB41N3/034B41N3/038
Inventor 堀田久坂本敦
Owner FUJIFILM CORP
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