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47 results about "Electron spectroscopy" patented technology

Electron spectroscopy is an analytical technique to study the electronic structure and its dynamics in atoms and molecules. In general an excitation source such as x-rays, electrons or synchrotron radiation will eject an electron from an inner-shell orbital of an atom. Detecting photoelectrons that are ejected by x-rays is called x-ray photoelectron spectroscopy (XPS) or electron spectroscopy for chemical analysis (ESCA). Detecting electrons that are ejected from higher orbitals to conserve energy during electron transitions is called Auger electron spectroscopy (AES).

Separator material and method of producing the same, and alkali secondary battery separator

A separator material of the present invention is a sulfonated nonwoven that comprises a polyolefin ultra-fine short fiber having a fineness of less than 0.5 dtex and other polyolefin short fiber(s). The other polyolefin short fibers include a polyolefin thermal bonding short fiber. At least a portion of the polyolefin thermal bonding short fiber is flattened to bond the component fibers together. The nonwoven has a specific surface area in a range of 0.6 m2/g to 1.5 m2/g and satisfies the following ranges. (1) A ratio (S/C)E of the number of sulfur atoms (S) to the number of carbon atoms (C) in the nonwoven, as measured by Electron Spectroscopy for Chemical Analysis (ESCA), is in a range of 5×10−3 to 60×10−3. (2) A ratio (S/C)B of the number of sulfur atoms (S) to the number of carbon atoms (C) in the nonwoven, as measured by a flask combustion technique, is in a range of 2.5×10−3 to 7×10−3. (3) A ratio (S/C)E/(S/C)B (depth of sulfonation) of (S/C)E to (S/C)B is in a range of 1.5 to 12. Thus, a separator material that has a high level of self-discharging performance when charge and discharge are repeatedly performed, a high level of process performance when assembling a battery, and a high level of short-circuit withstand capability; a method of producing the same; and an alkali secondary battery separator, are provided.
Owner:DAIWABO HLDG

Method and apparatus for compensating waveforms, spectra, and profiles derived therefrom for effects of drift

A method and apparatus for compensating waveforms, spectra, and profiles derived therefrom for effects of drift is disclosed. The present invention removes the effects of drift from a sequential series of waveforms obtained from a waveform-source device, or spectra, from a spectrometer, to produce for output a sequential series of drift-compensated waveforms, or spectra, respectively. In addition, the present invention performs a factor analysis, or alternatively a linear-least-squares analysis, on an array of the drift-compensated waveforms, or spectra to provide a set of drift-compensated principal factors; and, generates drift-compensated scaled target-factor profiles from a profile trajectory lying within a space of the set of drift-compensated principal factors. In addition, in the case of spectra, the invention provides for conversion of the drift-compensated scaled target-factor profiles to drift-compensated compositional profiles. The invention finds particular utility in the field of electron spectroscopy when the invention is applied to correcting sputter-depth-profile analyzes for the effects of spectral drift caused by charging in insulating samples. The invention, by extension, also, finds utility in waveform processing in situations where a sequential series of waveforms having similar features are offset by arbitrary phase shifts, and, even more generally, in time-series analysis, where a time-series is affected by leading or lagging data.
Owner:INT BUSINESS MASCH CORP

Synclastic dual-channel time-of-flight mass spectrometer

Provided is a synclastic dual-channel time-of-flight mass spectrometer. The mass spectrometer comprises collateral dual-channel accelerators (1), a minitype vacuum chamber body (2), a laser sputtering ion source (3), an ion signal detector (4), an ion signal detector (5), and an ion collimator (6). When ions generated by the laser sputtering ion source (3) enter into the dual-channel accelerators (1), the front segment and the rear segment are respectively accelerated to the ion signal detector (4) and the ion signal detector (5) for detection in the same direction. Ion beams generated by the ion source are segmented to an upper part and a lower part through a dual-channel time-of-flight mass analyzer by the collimator, and are respectively transversely accelerated, deflected and focused to the upper detector and the lower detector to record ion time-of-flight mass spectrometry. If the upper detector is replaced by an electron energy analyzer, then a photoelectron spectroscopy experiment for selecting some ions can be carried out at the same time. The synclastic dual-channel time-of-flight mass spectrometer is combined with the electron energy analyzer, and can quickly and conveniently carry out a laser irradiation experiment for ions of all mass peaks. The measured electron spectroscopy of a certain ion and mass peak time-of-flight of the certain ion have a strict corresponding relation. The whole instrument is compact, small and exquisite, simple in structure, and convenient to operate. More importantly, acquired ion electron spectroscopy signal to noise ratio is high, and resolution ratio is high.
Owner:DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI

Preparation method for lithographic printing plate

The present invention relates to a preparation method for a lithographic printing plate, which comprises forming a presensitized plate by coating a photosensitive layer or thermosensitive layer on an aluminum substrate treated with an aqueous solution after optionally anodized and developing the presensitized plate with a developer comprising no silicate, wherein the aqueous solution comprises at least one compound selected from the group consisting of nitrite group-containing compound, fluorine atom-containing compound and phosphorous atom-containing compound, in the proviso that when the at least one compound is fluorine atom-containing compound, the treated aluminum substrate has a surface which satisfies the formula: 0.30.ltoreq.A/(A+B).ltoreq.0.90 (wherein, A represents peak area of fluorine atom (1S) (counts.multidot.eV/sec) determined by X ray Electron Spectroscopy for Chemical Analysis (ESCA), and B represents peak area of aluminum atom (2P) (counts.multidot.eV/sec) determined by X ray ESCA), and when the at least one compound is phosphorous atom-containing compound, the treated aluminum substrate has a surface which satisfies the formula: 0.05.ltoreq.A/(A+B).ltoreq.0.70 (wherein, A represents peak area of phosphorous atom (2P) (counts.multidot.eV/sec) determined by X ray ESCA, and B represents peak area of aluminum atom (2P) (counts.multidot.eV/sec) determined by X ray ESCA).
Owner:FUJIFILM CORP

Method and apparatus for compensating waveforms, spectra, and profiles derived therefrom for effects of drift

A method and apparatus for compensating waveforms, spectra, and profiles derived therefrom for effects of drift is disclosed. The present invention removes the effects of drift from a sequential series of waveforms obtained from a waveform-source device, or spectra, from a spectrometer, to produce for output a sequential series of drift-compensated waveforms, or spectra, respectively. In addition, the present invention performs a factor analysis, or alternatively a linear-least-squares analysis, on an array of the drift-compensated waveforms, or spectra to provide a set of drift-compensated principal factors; and, generates drift-compensated scaled target-factor profiles from a profile trajectory lying within a space of the set of drift-compensated principal factors. In addition, in the case of spectra, the invention provides for conversion of the drift-compensated scaled target-factor profiles to drift-compensated compositional profiles. The invention finds particular utility in the field of electron spectroscopy when the invention is applied to correcting sputter-depth-profile analyses for the effects of spectral drift caused by charging in insulating samples. The invention, by extension, also, finds utility in waveform processing in situations where a sequential series of waveforms having similar features are offset by arbitrary phase shifts, and, even more generally, in time-series analysis, where a time-series is affected by leading or lagging data.
Owner:IBM CORP

Method for making lithographic plate

The present invention relates to a preparation method for a lithographic printing plate, which comprises forming a presensitized plate by coating a photosensitive layer or thermosensitive layer on an aluminum substrate treated with an aqueous solution after optionally anodized and developing the presensitized plate with a developer comprising no silicate, wherein the aqueous solution comprises at least one compound selected from the group consisting of nitrite group-containing compound, fluorine atom-containing compound and phosphorous atom-containing compound, in the proviso that when the at least one compound is fluorine atom-containing compound, the treated aluminum substrate has a surface which satisfies the formula: 0.30 <= A / (A+B)<=0.90 (wherein, A represents peak area of fluorine atom (1S) (counts eV / sec) determined by X ray Electron Spectroscopy for Chemical Analysis (ESCA), and B represents peak area of aluminum atom (2P) (counts eV / sec) determined by X ray ESCA, and when the at least one compound is phosphorous atom-containing compound, the treated aluminum substrate has a surface which satisfies the formula: 0.05 <= A / (A+B) <= 0.70 (wherein, A represents peak area of phosphorous atom (1P) (counts eV / sec) determined by X ray ESCA, and B represents peak area of aluminum atom (2P) (counts eV / sec) determined by X ray ESCA.
Owner:FUJIFILM CORP

Method for simulating spatial energy spectrum environment by using single energy electron beam

The invention discloses a method for simulating a spatial energy spectrum environment by using a single energy electron beam. The method comprises: a spatial plasma distribution function and a velocity element of the distribution function of a GEO orbit are determined; expression relationships between characterization parameters and the velocity element of a single energy electron beam and plasma are established respectively; a matching equation is established by using velocity element identity as a matching target according to a plasma characterization parameter value of a to-be-simulated spatial energy spectrum environment, the equation is solved to obtain the density and velocity of the single energy electron beam for simulating the spatial energy spectrum environment, and then the energy and beam current density of the single energy electron beam are obtained by transform. According to the invention, the velocity elements of the single energy electron beam and the spatial energy spectrum distribution plasma are matched and the energy and beam current density selection parameters of the single energy electron beam are obtained by calculation, so that description of spatial energy spectrum plasma environment characteristics is realized accurately and the support is provided for improving accuracy of the satellite charging-discharging effect ground simulation test.
Owner:LANZHOU INST OF PHYSICS CHINESE ACADEMY OF SPACE TECH
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