The utility model provides a
silicon carbide VDMOS with a source
electrode shielding structure. The
silicon carbide VDMOS is characterized in that the lower side surface of a drift layer is connected to the upper side surface of a
silicon carbide substrate; a groove is formed in the drift layer; the insulating
dielectric layer is arranged on the groove, a source
electrode shielding layer is arranged in the insulating
dielectric layer, a groove is formed in the insulating
dielectric layer, and the groove is located above the source
electrode shielding layer; the lower side surface of the well region is connected to the upper side surface of the drift layer, a source region is arranged in the well region, one side surface of the source region and one side surface of the well region are connected to one side surface of the insulating
dielectric layer, and the upper side surface of the source shielding layer is higher than the lower side surface of the well region; the source electrode
metal layer is connected to the well region and the source region, and the source electrode
metal layer is electrically connected to the source electrode shielding layer; the gate
metal layer is arranged in the groove; the drain metal layer is connected to the lower side surface of the
silicon carbide substrate; the source shielding layer reduces the
capacitance effect from the gate metal layer to the drift layer, so that the gate-drain Miller
capacitance is effectively reduced, the gate charge of the device is reduced, the switching speed of the device is improved, and the driving loss of the device is reduced.