Method for preparing nanostructure using photo-activation nano active water
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 张金龙
- Publication Date
- 2009-02-04
- Estimated Expiration
- Not applicable · inactive patent
Abstract
Description
technical field
[0001] Involved in the preparation of nanostructures. technical background
[0002] At present, the preparation of nanowires, nanomembranes, and nanodevices is still relatively difficult. Some are still in the stage of basic research, and some are in the stage of laboratory products and cannot enter industrial production. For example: the preparation of single crystal silicon oxide nanowires uses high-temperature chemical vapor deposition method, and the high temperature is above 1000 °C; the carbon-assisted growth method also requires high temperatures; Growing silicon oxide nanowires, removing the template agent by roasting or chemical corrosion, and finally obtaining nanowires requires roasting and template agents, which pollute the environment; laser ablation methods require high temperatures; a hydrothermal gas phase using ethylenediamine as a reaction solution Ferric nitrate is used as a synthetic method of supported silicon oxide, which undergoes a se...