Method for preparing cuprous compound

A compound, cuprous technology, applied in the field of preparation of monovalent copper compounds, can solve the problems of complex reaction system, high cost, and increased difficulty in purifying the target product, and achieve the effect of simple separation and purification and convenient preparation

Inactive Publication Date: 2011-05-11
长沙铂鲨环保设备有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] 1) The cost is high, and metal copper must be added when the cuprous compound is produced by the reverse disproportionation reaction, and the cost is very high
[0007] 2) The reaction system is complex and the target product is difficult to separate and purify
When divalent copper is reduced to monovalent copper by adding a reducing agent to produce cuprous compounds, sodium sulfite, sulfur dioxide, sodium bisulfite, hydrosulfite and other reducing agents must be added, and sodium ions, sulfite and sodium ions will eventually exist in the reaction system. Impurities such as sulfate radicals make the separation and purification of target products (such as cuprous chloride) difficult
[0008] 3) The

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] A kind of by 200 grams of cupric chloride (main component is CuCl 2 2H 2 O contains copper about 37%), 800 milliliters of DI (deionized) water, 50 grams of ethanolamine, 25 grams of sodium alanine, 200 milliliters of industrial ammonia and 230 grams of industrial ammonium chloride to form a blue alkaline cuproammonia solution. The pH is 8.5-9, and the divalent copper content is 60-80 g / L. Take 1 liter of this solution and place it in the cathode area of ​​an electrochemical reduction device (the cathode and anode areas are separated by a semi-permeable membrane, and the membrane is the cathode membrane produced by Beijing Huanyu Lida Company), and the solution in the anode area is alkaline Ammonia-ammonium chloride (100 g / L) buffer solution (ammonia water is added when the pH value of the anode area is lower than 8), the cathode is made of copper plate, the anode is made of graphite plate, and the output DC device is C25 type DZ47-63 high frequency switch Power supply...

Embodiment 2

[0023] A green acidic copper solution formed from 200 grams of copper chloride (about 37% copper), 1000 milliliters of DI water, 50 grams of glycine, 25 grams of butyric acid, 150 milliliters of industrial hydrochloric acid and 50 grams of sodium chloride, containing divalent Copper is 50-70 g / l. Get 1 liter of this solution, place it in the cathode region of an electrochemical reduction device, the cathode and anode regions are separated by an ion exchange membrane (the positive membrane of Shandong Tianwei Membrane Technology Co., Ltd.), and the anode region is 5% (W / V) dilute sulfuric acid solution, the output DC equipment is a C25 type DZ47-63 high-frequency switching power supply, the cathode adopts a titanium plate, and the anode adopts a titanium-based ruthenium iridium active coating plate (Shaanxi Kaida company product), at a temperature of 20-30 ℃, under the condition of controlling the reduction potential of the cathode, maintain a current of 1-2A for 4 hours; the ...

Embodiment 3

[0025] A kind of by 100 grams cupric chloride (main component is CuCl 2 2H 2 O contains about 37% copper), 650 milliliters of DI (deionized) water, 30 grams of malononitrile, 20 grams of pyridine, 280 milliliters of industrial ammonia and 230 grams of industrial ammonium chloride to form a blue alkaline cuproammonia solution, its pH 8.5-9, containing 30-40 g / L of divalent copper. Take 2 liters of this solution and place it in the cathode area of ​​an electrochemical reduction device (the cathode and anode areas are separated by a semipermeable membrane, and the membrane is the cathode membrane of Shandong Tianwei Membrane Technology Co., Ltd.), and the output DC equipment is C25 type DZ47-63 high-frequency switching power supply, the cathode is made of stainless steel plate; the solution in the anode area is an alkaline aqueous solution containing ammonium sulfate (100 g / L) and sodium hydroxide (add ammonia water when the pH value of the anode area is lower than 8 to maintain...

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PUM

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Abstract

The invention relates to a method for preparing a cuprous compound, in particular to a method for preparing a cuprous compound from a cupric solution. The method comprises the following steps: in a solution containing cupric ions, in the existence of ligands which can form complex ions with cuprous ions, electrochemical reduction is performed on the cupric ions so that the cupric ions in the solution are only converted to cuprous complex ions, and the cuprous complex ions are used to prepare cuprous salt or cuprous oxide. The invention provides a simple and practical method for preparing cuprous ions from cupric ions; and the obtained solution containing cuprous ions can be used for conveniently preparing the cuprous compound. The obtained compound is easy to separate and purify.

Description

technical field [0001] The invention relates to a method for preparing a monovalent copper compound, in particular to a method for preparing a monovalent copper compound from a solution containing divalent copper. Background technique [0002] Regarding the method for preparing monovalent copper ions, i.e. cuprous ion solutions, there are currently two common methods: [0003] 1) A reverse disproportionation reaction occurs between a solution containing divalent copper ions and metallic copper. Chinese patents CN1105341 (application number 94113822.4) and CN1583571 (application number 200410024943.4) both describe related preparation methods. [0004] 2) Reducing the divalent copper compound to a monovalent copper compound by reacting the compound solution containing divalent copper ions with a milder reducing agent. Common reductants include sulfite and sulfur dioxide. Chinese patent CN1762821 (application number 94113822.4) and Chinese patent CN1696062 (application numbe...

Claims

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Application Information

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IPC IPC(8): C01G3/02C01G3/00C25B3/04C25B3/12C25B3/13C25B3/25
Inventor 李德良张云亮
Owner 长沙铂鲨环保设备有限公司
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