Radiation resistant and ultraviolet filtering film for space optic quartz glass and manufacturing method thereof

A quartz glass, radiation-resistant technology, applied in chemical instruments and methods, optics, optical components, etc., can solve problems such as complex process, high cost, environmental pollution, etc., achieve stable process technology, improve radiation resistance performance, solve The effect of insufficient steepness
CN102096136AInactive Publication Date: 2011-06-15BEIJING INST OF CONTROL ENG

Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
BEIJING INST OF CONTROL ENG
Publication Date
2011-06-15
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention provides a radiation resistant and ultraviolet filtering film for space optic quartz glass and a manufacturing method thereof, comprising a quartz glass substrate and a multi-layer film, wherein the multi-layer film is plated on the quartz glass substrate by means of a vacuum thermal evaporation coating method and a magnetron sputtering film coating method; the multi-layer film is a L1 layer / H layer / L2 layer structure; the L1 layer is a SiO2 layer or SiO layer; the L2 layer is a SiO2 layer or SiO layer; and the H layer is a CeO2 layer or ZnO layer. The radiation resistant and ultraviolet filtering film for space optic quartz glass and the manufacturing method thereof provided by the invention have the advantage that the radiation resistant property of the material is improved by using a composite structure composed of a quartz glass substrate and a multi-layer film; according to the results of irradiation test, the radiation resistant property of the material composed of a common quartz and a film is far superior to that of doped quartz; the average value T of spectrum through rate in the working section (400 to 1000 nm) after the irradiation of an integrating dose of 5*108 Rad(Si) is not less than 90%, and the T of doping material is not less than 70%.
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Description

technical field

[0001] The invention relates to an optical quartz glass film and a preparation method thereof, and is especially suitable for a radiation-resistant ultraviolet filter film of an optical material used in a spacecraft and a preparation method thereof, and belongs to the technical field of preparation of a radiation-resistant ultraviolet filter film. Background technique

[0002] The optical material used in the digital sun sensor in the satellite control system is a kind of quartz glass. Due to the particularity of the use environment, there are special requirements for the optical material glass used. It must not only have good optical performance, but also have good Radiation resistance and UV filter performance.

[0003] The preparation of materials currently used is a doping process, through which the UV filter properties of quartz glass are realized, but it reduces the radiation resistance of the material and has some adverse effects on the optical propert...

Claims

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