Radiation resistant and ultraviolet filtering film for space optic quartz glass and manufacturing method thereof

A quartz glass, radiation-resistant technology, applied in chemical instruments and methods, optics, optical components, etc., can solve problems such as complex process, high cost, environmental pollution, etc., achieve stable process technology, improve radiation resistance performance, solve The effect of insufficient steepness

Inactive Publication Date: 2011-06-15
BEIJING INST OF CONTROL ENG
View PDF4 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The preparation process of doped quartz glass includes doping elements, homogenization of raw materials, and multiple hot forging processes ...

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Radiation resistant and ultraviolet filtering film for space optic quartz glass and manufacturing method thereof
  • Radiation resistant and ultraviolet filtering film for space optic quartz glass and manufacturing method thereof
  • Radiation resistant and ultraviolet filtering film for space optic quartz glass and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0079] 1. Process and shape the ordinary quartz glass substrate according to the requirements;

[0080] 2. Cleaning treatment: Wipe the substrate with calcium carbonate, rinse it with water, soak it in glass washing solution for more than 2 hours, take it out and rinse it with deionized water, dehydrate it with absolute ethanol, add 50% ethyl ether with 50% absolute ethanol The lotion wipes clean;

[0081] This example adopts the glass washing liquid of 55g potassium dichromate, 100ml water and 1000ml concentrated sulfuric acid configuration, pH value<3.

[0082] 3. On a quartz substrate, SiO was prepared by vacuum thermal evaporation 2 The film process is as follows:

[0083] a) Place the substrate in a vacuum chamber and heat to 110°C±10°C;

[0084] b) When the vacuum reaches 2×10 -3 When the Ha is below, the evaporation work is started, and the evaporation material is preheated, pre-evaporated, and evaporated; the film thickness is required to be 60-62nm;

[0085] c) E...

Embodiment 2

[0099] 1. Process and shape the ordinary quartz glass substrate according to the requirements;

[0100] 2. Cleaning treatment: Wipe the substrate with calcium carbonate, rinse it with water, soak it in glass washing solution for more than 2 hours, take it out and rinse it with deionized water, dehydrate it with absolute ethanol, add 50% ethyl ether with 50% absolute ethanol The lotion wipes clean;

[0101] 3. On the quartz substrate, SiO was prepared by magnetron sputtering 2 The film process is as follows:

[0102] a) the substrate is placed in a vacuum chamber, and the temperature of the substrate is the temperature of the vacuum chamber;

[0103] b) When the vacuum reaches 2×10 -3 Start sputtering coating work when Ha is below, the vacuum chamber is filled with argon and the vacuum degree is stabilized at 8×10 -1 ~2×10 0 In the state of Ha, the target is preheated, pre-sputtered, and sputtered; the film thickness is required to be 60-62nm;

[0104] c) End evaporation ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to view more

Abstract

The invention provides a radiation resistant and ultraviolet filtering film for space optic quartz glass and a manufacturing method thereof, comprising a quartz glass substrate and a multi-layer film, wherein the multi-layer film is plated on the quartz glass substrate by means of a vacuum thermal evaporation coating method and a magnetron sputtering film coating method; the multi-layer film is a L1 layer/H layer/L2 layer structure; the L1 layer is a SiO2 layer or SiO layer; the L2 layer is a SiO2 layer or SiO layer; and the H layer is a CeO2 layer or ZnO layer. The radiation resistant and ultraviolet filtering film for space optic quartz glass and the manufacturing method thereof provided by the invention have the advantage that the radiation resistant property of the material is improved by using a composite structure composed of a quartz glass substrate and a multi-layer film; according to the results of irradiation test, the radiation resistant property of the material composed of a common quartz and a film is far superior to that of doped quartz; the average value T of spectrum through rate in the working section (400 to 1000 nm) after the irradiation of an integrating dose of 5*108 Rad(Si) is not less than 90%, and the T of doping material is not less than 70%.

Description

technical field [0001] The invention relates to an optical quartz glass film and a preparation method thereof, and is especially suitable for a radiation-resistant ultraviolet filter film of an optical material used in a spacecraft and a preparation method thereof, and belongs to the technical field of preparation of a radiation-resistant ultraviolet filter film. Background technique [0002] The optical material used in the digital sun sensor in the satellite control system is a kind of quartz glass. Due to the particularity of the use environment, there are special requirements for the optical material glass used. It must not only have good optical performance, but also have good Radiation resistance and UV filter performance. [0003] The preparation of materials currently used is a doping process, through which the UV filter properties of quartz glass are realized, but it reduces the radiation resistance of the material and has some adverse effects on the optical propert...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G02B5/22G02B1/10B32B9/04B32B17/00
Inventor 刘江秦素然高修涛王周好王俊杰石建民范汉超
Owner BEIJING INST OF CONTROL ENG
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap