Method for preparing metal ion-doped titanium dioxide target material and target material thereby

A technology of titanium dioxide and metal ions, which is applied in the preparation of metal ion-doped titanium dioxide targets and the field of targets obtained therefrom, can solve the problem that the amount of metal ion doping is difficult to control accurately, the amount of metal ion doping is difficult to accurately control, Limiting the wide application of magnetron sputtering technology and other issues, to achieve the effects of easy mass production, high uniformity, and good sol stability

Inactive Publication Date: 2012-01-18
INNER MONGOLIA UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, when using this method to prepare metal ion-doped titanium dioxide nano-films, usually pure metal titanium and other dopant metals are used as two or more targets, and sputtering is carried out at a certain heating temperature in an oxygen atmosphere. , such as disclosed in CN1876229A, the sputtering rate of this method is low, the reaction process is unstable, it is difficult to completely oxidize metal Ti, and the doping amount of metal ions is also difficult to accurately control, and the distribution of doped metal ions is uneven. uniform
In addition, there are also ceramic targets made of titanium dioxide and metal-doped oxides to prepare titanium dioxide nano-films, such as disclosed in CN1524977A, this method also makes it difficult to accurately control the doping amount of metal ions, and the doped metal ions Difficult to distribute evenly in titania target and film
Therefore, the wide application of magnetron sputtering technology in the preparation of titanium dioxide nano-films is limited.

Method used

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  • Method for preparing metal ion-doped titanium dioxide target material and target material thereby
  • Method for preparing metal ion-doped titanium dioxide target material and target material thereby
  • Method for preparing metal ion-doped titanium dioxide target material and target material thereby

Examples

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Embodiment 1

[0031] Example 1: First, mix n-butyl titanate with absolute ethanol and deionized water in a volume ratio of 1:2:0.1, and stir at room temperature at a speed of 1000 rpm; then add zinc nitrate-containing Mass percent is 10% dehydrated alcohol solution, makes the mol ratio of zinc and titanium be 1: 10, forms the sol liquid of ion doping; Add acetic acid and diethanolamine again, make acetic acid, diethanolamine and sol press 1: 1: Mix at a volume ratio of 10, continue to stir for 2 hours, and then seal and age at room temperature for 12 hours; add deionized water to the aged titanium dioxide sol until the gel is completely formed, and then dry the gel at 80°C for 12 hours. Hours, a yellow xerogel is formed; then the titanium dioxide powder obtained by mechanically grinding the xerogel is mixed with the binder evenly, and put into the mold with an axial loading rate of 20KN / min to an axial pressure of 50MPa Keep it under pressure for 10 minutes for briquetting, and unload at a ...

Embodiment 2

[0032] Example 2: First, n-butyl titanate was mixed with absolute ethanol and deionized water at a volume ratio of 1:5:0.2, and stirred at a temperature of 30°C at a speed of 800 rpm; then adding Ferric nitrate and copper nitrate mass percent are 20% dehydrated alcohol solution, make the molar ratio of iron, copper and titanium be 1: 1: 15, form the sol liquid of two kinds of metal ions mixed doping; Add oxalic acid and dimethyl Base ethanolamine, make oxalic acid, dimethylethanolamine and sol mix by the volume ratio of 1: 1: 15, continue to stir for 5 hours and seal and age at room temperature for 24 hours; Add deionized water to the titanium dioxide sol after aging The gel is completely formed, and then the gel is dried at 100°C for 12 hours to form a yellow xerogel; then the titanium dioxide powder obtained by mechanically grinding the xerogel and the binder are mixed and stirred evenly, and placed in In the mold, the loading rate of 30KN / min to the axial pressure of 80MPa ...

Embodiment 3

[0033] Example 3: first mix n-butyl titanate with absolute ethanol and deionized water in a volume ratio of 1:8:0.2, and stir at a temperature of 30°C at a speed of 800 rpm; then add Cerous nitrate mass percent is 20% dehydrated alcohol solution, makes the mol ratio of cerium and titanium be 1: 15, forms the sol liquid of rare earth cerium ion doping; Add citric acid and diethanolamine again, make citric acid, diethanolamine Mix with the sol at a volume ratio of 1:1:10, continue to stir for 8 hours, and then seal and age at room temperature for 24 hours; add deionized water to the aged titanium dioxide sol until the gel is completely formed, and then place the gel in Dry at 100°C for 18 hours to form a yellow xerogel; then mix and stir the titanium dioxide powder obtained by mechanically grinding the xerogel with the binder, and put it into the mold at a loading rate of 50KN / min to Hold the axial pressure of 100MPa for 30min to briquette, and unload at a rate of 100KN / min to o...

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Abstract

The invention relates to a method for preparing a metal ion-doped titanium dioxide target material and a target material thereby. The target material is prepared by adopting the steps of preparing metal ion-doped titanium dioxide powder through a solution reaction and compressing and sintering. The preparation process is simple and is easy to realize uniform doping of one or more metal ions; the doping amount of the ions can be precisely controlled, and the metal ions can enter a titanium dioxide crystal lattice in the preparation process to generate chemical bonding; the average crystal granularity of titanium dioxide in the prepared target material is below 200 nano, and the target material has high density; and the target material can be used for preparing a metal ion-doped titanium dioxide nano film by adopting a magnetron sputtering method.

Description

Technical field: [0001] The invention relates to a method for preparing a metal ion-doped titanium dioxide target material and the target material obtained therefrom. The target material can be used for preparing a metal ion-doped titanium dioxide nanometer film by a magnetron sputtering method. Background technique: [0002] Among the two common crystal structures of titanium dioxide, the anatase phase has high photocatalytic activity, and the rutile phase has strong ultraviolet absorption ability. After they are prepared into titanium dioxide nano-films, due to the refinement of their grain size, they have special nano-effects such as small size effects, quantum effects, and surface and interface effects of nanomaterials. They are coated on the surface of glass, ceramics and other substrates with moisture-sensitive properties. , Gas sensitivity, photocatalysis, super hydrophilic, high refractive index, high dielectric constant, stable chemical properties and other properti...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B35/46C04B35/622
Inventor 冀国俊史志铭金永军
Owner INNER MONGOLIA UNIV OF TECH
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