Solid-state hot-compression low-temperature bonding method using nickel micro needle cones
A low-temperature bonding and thermal compression technology, used in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problem of difficult removal of flux residues, improve interconnect density, simplify process flow, and improve product reliability. Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0036] Under-bump metallurgy (UBM), copper pillar bumps, nickel barrier, and bump surfaces formed on bare die with I / O pads by standard photolithographic patterning, sputter deposition, and electrochemical deposition A typical copper pillar bump size is 60 μm in diameter and 40 μm in height. A typical nickel barrier layer thickness is about 1 μm. A typical tin layer thickness is 5 μm with a height difference of less than 0.5 μm. The nickel microneedle cone layer and the surface anti-oxidation gold layer were prepared by chemical deposition or electrochemical deposition on the pad area of the flip-chip substrate. The overall thickness was about 5 μm, the surface needle cone height was about 1 μm, and the gold thickness was about 10 nm. This thickness of gold plating does not affect the needle cone topography. Fix the chip, which has been washed with acid to remove the oxide layer on the surface of the bump, and the substrate face-to-face and fix it on the flip-chip bon...
Embodiment 2
[0038] The front I / O pads of the bare chip with I / O pads on the front side and through-silicon vias (TSVs) to the device side on the back form the under-bump metal layer (UBM) and tin layer, typically tin The layer thickness is 2 - 5 μm, and the height difference is less than 0.5 μm. The chip is usually thinned to less than 100 μm, and the nickel microneedle cone layer and the surface anti-oxidation gold layer are prepared on the surface of the ground and exposed TSV filling metal. The overall thickness is about 5 μm, and the height of the surface needle cone is about 1 μm. The thickness is about 10 nm. After using plasma to remove the surface oxide layer and contamination particles, two or more silicon wafers with this structure are stacked and fixed in the bonding machine, and the temperature is raised to a bonding temperature of 180 ° C. At the same time, the bonding machine applies 7.5 The equivalent static pressure of MPa is maintained for 5 minutes to complete the in...
Embodiment 3
[0040] The nickel microneedle cone layer and the surface anti-oxidation gold layer are prepared on the metal block of the pad area of the printed circuit board (PCB) for ball grid array (BGA) surface mounting, the overall thickness is about 5-10 μm, and the surface needle The cone height is about 1-2 μm, and the gold thickness is about 10 nm. The BGA package planted with tin alloy solder balls with a size of 300 - 800 μm is pickled to remove the oxide layer on the surface of the solder balls, and fixed and aligned with the PCB in the bonding machine, and the temperature is raised to a bonding temperature of 180°C , and at the same time, the equivalent static pressure of 10 MPa is applied by the bonding machine, and it is kept for 5 minutes to complete the preliminary stacking bonding. After the preliminary bonding is completed, the chip is placed in a 140°C protective atmosphere for heat treatment for 6h.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com