Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation method of ultra-thick tin-ticn multilayer composite film material

A multi-layer composite, thin film material technology, applied in metal material coating process, coating, ion implantation plating and other directions, to achieve the effect of good adhesion, smooth surface, excellent wear resistance

Active Publication Date: 2016-05-25
LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it is still a big challenge to achieve ultra-long-term use, and it is even less promising to make ultra-thick thin-film materials with excellent properties.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] Clean the substrate: ultrasonically clean the substrate (N100 type silicon wafer and 2520-310S high-temperature steel) with absolute ethanol and acetone solutions for 10 minutes each, and place them in the reaction chamber after drying. Vacuuming: Use a high-efficiency molecular pump to evacuate the reaction chamber. Substrate surface treatment: when the vacuum degree is 6.0×10 -4 Pa, pass argon gas in the deposition chamber, and use argon (Ar) plasma to sputter and clean the substrate for 10 min under the condition of 80% pulse direct current negative bias voltage 1100V, to remove the oxide layer and other substances on the surface. Impurities. Deposition: Pass the mixed gas of argon, nitrogen and methane into the reaction chamber, adjust the interception baffle valve (control chamber pressure) to 1-5°, the distance between the target and the substrate is 10cm, and the duty cycle is 80 % Negative bias voltage 100V, the initial chamber temperature is kept at 40 °C, tu...

Embodiment 2

[0026] As described in Example 1, the total deposition time was changed to 180 min to obtain a TiN-TiCN multilayer composite film with 20 bimolecular layers.

[0027] Field emission scanning electron microscopy (FESEM) was used to observe the cross-section of the film, and it was found that the thickness of the film was 16.13 μm, and the TiCN layer and TiN layer could be clearly observed, and they were uniform and dense, and well bonded to the substrate. Nano-indentation experiments show that the hardness and elastic modulus of the film are 24.4-26.7GPa and 338.6-367.7GPa, respectively. The bonding force between the high temperature steel (2520-310S) and the film measured by the scratch test is about 24-30N. Tested by UMT friction testing machine, it is known that the film has excellent wear resistance.

Embodiment 3

[0029] As described in Example 1, the total deposition time was changed to 100 min to obtain a TiN-TiCN multilayer composite film with 10 bimolecular layers.

[0030] Observation of the cross section of the film by field emission scanning electron microscope (FESEM) reveals that the film thickness is 9.68 μm, and the TiCN layer and TiN layer can be clearly observed, and are uniform and compact, and well bonded to the substrate. The nano-indentation experiment shows that the hardness and elastic modulus of the film are 27.0-30.1GPa and 355.0-389.2GPa, respectively. The bonding force between the high temperature steel (2520-310S) and the film measured by the scratch test is about 34-38N. Tested by UMT friction testing machine, it is known that the film has excellent wear resistance.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
elastic modulusaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a preparation method for super thick tin-titanium carbonitride (TIN-TICN) multi-layer composite thin film materials. According to the preparation method for the super thick TIN-TICN multi-layer composite thin film materials, the technology of direct current magnetron sputtering physical vapor deposition is used for preparing the TIN-TICN multi-layer composite thin film materials, the thickness of the TIN-TICN multi-layer composite thin film materials is 9.5-24.0 microns, and the TIN-TICN multi-layer composite thin film materials is uniform and compact in texture, smooth in surface, good in elasticity and adhesiveness, high in hardness, and good in anti-wear performance, and can be used in cutters for mechanical cutting and hole drilling and molds for processing and shaping.

Description

technical field [0001] The invention relates to a method for a TiN-TiCN multilayer composite film material with high hardness and excellent wear resistance. Background technique [0002] TiN and TiCN thin film materials have excellent properties such as high hardness, excellent wear resistance and corrosion resistance, excellent chemical stability and good electrical and thermal conductivity, so they are widely used in machinery, tribology, anti-corrosion, aviation, etc. Aerospace and other fields have broad application prospects. In addition to combining the advantages of the two, the TiN-TiCN multilayer composite film material has greatly improved the internal stress of the TiN-TiCN multilayer composite film material through interlayer thickness control and dislocation effects, making its thickness and combination Strength was significantly improved. [0003] At present, the main methods for preparing TiN-TiCN multilayer composite thin film materials include physical vap...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/06
Inventor 郝俊英郑建云
Owner LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products