Nickel-vanadium alloy magnetron sputtering rotating target containing trace rare earth elements and preparation method

A technology of rare earth elements and nickel-vanadium alloys, applied in sputtering plating, metal material coating process, ion implantation plating, etc., can solve the problem of poor oxidation resistance and corrosion resistance, no sharing of production equipment, sputtering rate Instability and other issues, to achieve high throughput, save labor costs, good economic and social benefits

Active Publication Date: 2016-06-22
NANJING DAMAI SCI&TECH IND CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Some existing targets have the problem of low utilization rate; the production method of powder metallurgy has complicated process and no sharing of production equipment; the chemical composition is simple and the chemical elements in the alloy are active, so that the oxidation resistance and anti-oxidation properties of the target Poor corrosion, easy to cause oxidation and sputtering rate instability during use, shortening target life

Method used

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  • Nickel-vanadium alloy magnetron sputtering rotating target containing trace rare earth elements and preparation method
  • Nickel-vanadium alloy magnetron sputtering rotating target containing trace rare earth elements and preparation method
  • Nickel-vanadium alloy magnetron sputtering rotating target containing trace rare earth elements and preparation method

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Embodiment 1

[0042] A nickel-vanadium alloy magnetron sputtering rotary target containing trace rare earth elements and a preparation method thereof, the preparation steps are as follows:

[0043] ⑴Raw material preparation: by weight percentage, the alloy composition is: 0.05% RE, 9% V, the balance is Ni and unavoidable impurities, the impurity content is less than 0.1%, and the total input is 180 kg, including electrolytic nickel 163.71 kg, sponge Vanadium 16.2 kg, mixed rare earth 0.09 kg;

[0044] (2) Vacuum smelting: use industrial alcohol to remove the dirt on the surface of electrolytic nickel, remove oxides with dilute nitric acid, put the treated electrolytic nickel into a melting crucible after drying, and smelt with electricity at a melting temperature of 1600°C for 80 minutes. Vacuumize during the process to make the vacuum degree less than 8Pa. Before casting the ingot, first pass argon gas 4Mpa in the vacuum state, then add the sponge vanadium into the crucible from the small ...

Embodiment 2

[0053] A nickel-vanadium alloy magnetron sputtering rotary target containing trace rare earth elements and a preparation method thereof, the preparation steps are as follows:

[0054] ⑴Raw material preparation: by weight percentage, the alloy composition is: 0.002% RE, 5% V, the balance is Ni and unavoidable impurities, the impurity content is less than 0.1%, and the total input is 180 kg, including electrolytic nickel 170.9964 kg, sponge Vanadium 9 kg, mixed rare earth 0.0036 kg;

[0055] (2) Vacuum smelting: use industrial alcohol to remove the dirt on the surface of electrolytic nickel, remove oxides with dilute nitric acid, put the treated electrolytic nickel into a melting crucible after drying, and smelt with electricity at a melting temperature of 1550°C and a melting time of 80 minutes. Vacuumize during the process to make the vacuum degree less than 8Pa. Before ingot casting, first pass argon gas 4Mpa in the vacuum state, then add the sponge vanadium into the crucible...

Embodiment 3

[0064] A nickel-vanadium alloy magnetron sputtering rotary target containing trace rare earth elements and a preparation method thereof, the preparation steps are as follows:

[0065] ⑴Raw material preparation: by weight percentage, the alloy composition is: 0.026% RE, 7% V, the balance is Ni and unavoidable impurities, the impurity content is less than 0.1%, and the total feed is 180 kg, of which electrolytic nickel is 167.3532 kg, sponge Vanadium 12.6 kg, mixed rare earth 0.0468 kg;

[0066] (2) Vacuum smelting: use industrial alcohol to remove the dirt on the surface of electrolytic nickel, remove oxides with dilute nitric acid, put the treated electrolytic nickel into a melting crucible after drying, and smelt with electricity. The melting temperature is 1610 °C and the melting time is 80 minutes. Vacuumize during the process to make the vacuum degree less than 8Pa. Before ingot casting, first pass argon gas 4Mpa in the vacuum state, then add the sponge vanadium into the c...

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Abstract

A nickel vanadium alloy magnetron sputtering rotary target containing trace rare earth elements and its preparation method, the chemical composition of the target is 0.002wt~0.05wt%RE, 5~9wt%V, the balance is Ni and unavoidable Impurities. Through vacuum melting, casting, hot forging, hot perforation or hot extrusion into tube shape, cold drawing, annealing, machining and other processes. The raw materials used include electrolytic nickel with a purity of 99.95%, sponge vanadium with a purity of 99.9%, and mixed rare earth elements with a purity of 99.9%. Through vacuum smelting, adding sponge vanadium after electrolytic nickel smelting and refining can significantly improve the oxidation resistance and corrosion resistance of the rotating target, improve the stability and thermal hardness of the target and the sensitivity to material overheating, adding a small amount of Rare earth elements can improve the purity of the material, realize the refinement and uniformity of the microstructure of the target material, help to improve the density and material plasticity of the Ni-V-RE rotating target material, and prolong the service life of the material. The rotating target is widely used in electronic components, communications, solar energy and other industries.

Description

technical field [0001] The invention relates to a nickel-vanadium alloy magnetron sputtering rotating target containing trace rare earth elements and a preparation method thereof, belonging to the technical field of new materials (hereinafter referred to as Ni (nickel)-V (vanadium)-RE (mixed rare earth) alloy magnetron sputtering rotating target). Background technique [0002] With the rapid development of the coating field, due to the huge pressure of commercial competition and the blockade of target material technology abroad, relevant domestic enterprises and scientific research institutions have further strengthened the research work on target materials. Current target production status: Ni-Cr magnetron sputtering target, Al-based alloy sputtering target, mixed rare earth high-resistance sputtering target, indium oxide rotary target, zinc oxide rotary target, silicon-based alloy rotary Targets, high-purity nickel targets for magnetron sputtering, resistive film targets,...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C22C19/03C23C14/35
Inventor 王小叶吴宇宁王荣巧徐海斌袁聪
Owner NANJING DAMAI SCI&TECH IND CO LTD
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