High-temperature oxidation-resistant and heat-corrosion-resistant Al-cr coating on the surface of a titanium-aluminum alloy and preparation method thereof
A high-temperature oxidation-resistant, titanium-aluminum alloy technology, applied in chemical instruments and methods, metal material coating technology, coatings, etc., can solve the problem that the content of Al and Cr in the coating cannot be accurately controlled, and it is not suitable for large pieces or complex shapes. Parts and plasma liquid are expensive, etc., to achieve the effect of improving high temperature oxidation resistance and thermal corrosion resistance, excellent oxidation resistance and thermal corrosion resistance, and excellent thermal shock resistance
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[0035] The preparation method of the above-mentioned high-temperature oxidation-resistant and heat-corrosion-resistant Al-Cr coating on the surface of the titanium-aluminum alloy includes first preparing a Cr diffusion layer on the surface of the titanium-aluminum alloy substrate, and then performing an aluminizing treatment on the surface of the Cr diffusion layer to prepare an Al-Cr alloy layer and rich Al deposition layer, the steps are as follows:
[0036] Step 1. Put the titanium-aluminum alloy substrate and the pure Cr target into the arc glow plasma surface metallurgy device, use the titanium-aluminum alloy substrate as the workpiece electrode, and use the pure Cr target as the source electrode; wherein, the pure Cr target The purity of Cr is 99.999wt%.
[0037] Step 2. Vacuumize to 5×10 -4 Pa~8×10 -4 Pa, send argon gas, start glow, and debug process parameters are: arc current: 50-70A; workpiece bias voltage: 250-350V; argon gas pressure: 0.3-0.5Pa; distance between ...
Embodiment 1
[0045] 1) O-Ti 2 AlNb-based alloys and pure Cr targets were loaded into an arc-added glow plasma surface metallurgy device, and O-Ti 2 The AlNb-based alloy is used as the workpiece electrode, and the pure Cr target is used as the source electrode. The purity of Cr in the target is 99.999%;
[0046] 2) Vacuum to 5×10 -4 Pa, send argon gas, start glow, and debug process parameters are: arc current: 50A; workpiece bias voltage: 250V; argon gas pressure: 0.3Pa; target and workpiece distance: 180mm; duty ratio: 0.2; holding time : 0.5h; Working temperature: 880~920℃;
[0047] 3) Stop the glow, cut off the power, and complete the preparation of the Cr diffusion layer;
[0048] 4) Put the sample prepared by the Cr diffusion layer and the pure Al target into the arc glow plasma surface metallurgy device, the sample prepared by the Cr diffusion layer is used as the workpiece electrode, and the pure Al target is used as the source electrode; , the purity of Al in the pure Al target...
Embodiment 2
[0054] 1) Put the γ-TiAl alloy and the pure Cr target into the arc glow plasma surface metallurgy device, use the γ-TiAl alloy as the workpiece electrode, and use the pure Cr target as the source. The purity of Cr in the target is 99.999%;
[0055] 2) Vacuum to 8×10 -4 P, send argon gas, start glow, and debug process parameters are: arc current: 50A; workpiece bias voltage: 350V; argon gas pressure: 0.5Pa; distance between target and workpiece: 150mm; duty cycle: 0.2; : 0.5h; Working temperature: 880~920℃;
[0056] 3) Stop the glow, cut off the power, and complete the preparation of the Cr diffusion layer;
[0057] 4) Put the sample prepared by the Cr diffusion layer and the pure Al target into the arc glow plasma surface metallurgy device, the sample prepared by the Cr diffusion layer is used as the workpiece electrode, and the pure Al target is used as the source electrode; , the purity of Al in the pure Al target material is 99.999wt%.
[0058] 5) Vacuum to 8×10 -4 P, ...
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