A kind of preparation method of bismuth sulfide semiconductor film

Abstract

The invention discloses a preparation method of a bismuth sulfide semiconductor film. The preparation method comprises the steps: soaking a substrate successively in a bismuth-salt ethylene glycol methyl ether solution and a sulfur compound-containing organic solution, then carrying out heat treatment in a protection atmosphere, and growing the bismuth sulfide semiconductor film on the surface of the substrate. The method is simple in operation, low in cost, good in reproducibility and easy in continuous mass production. The method can control the thickness of the bismuth sulfide film and the continuous compact growth of the bismuth sulfide film in a large area; and the prepared bismuth sulfide semiconductor film is homogenous in thickness, good in crystallinity, continuous, compact and good in photoelectric property.

Description

technical field [0001] The invention relates to a method for preparing a bismuth sulfide semiconductor thin film, in particular to preparing a bismuth sulfide semiconductor thin film material with photoelectric catalytic degradation organic matter performance on a substrate by using an organic solution deposition method combined with a heat treatment method, and belongs to the technical field of new energy sources for photoelectric materials. Background technique [0002] In recent years, environmental pollution has attracted more and more attention from the world, and water pollution is the focus of attention. Organic dyes are an important aspect of water pollution. They have strong coloring ability, are easy to be found in water systems, and have a wide range of sources. Their complex atomic structures make them stable and difficult to be biodegraded. The dyes in the solution can reflect and absorb part of the sunlight, thereby affecting photosynthetic activity and ultimat...

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Problems solved by technology

But most oxides have some shortcomings: TiO 2 The band gap of ZnO and ZnO is too large; Cu 2 O and the like are difficult to keep stable in solution; In 2 o 3 The raw material cost such as is too high, is difficult to obtain practical application; And WO 3 (2.7eV) and the like lack metallic properties, and it is difficult to obtain stable photocatalytic activity; Pb and Cd systems are inherently toxic and should not be used

Vacuum methods such as sputtering, evaporation, spray pyrolysis, molecular beam epitaxy, etc. are not conducive to industrial mass production due to complex equipment and high cost

The preparation of ionic liquid in liquid deposition technology such as ionic liquid method has the disadvantage of high cost, which also restricts the industrial application of ionic liquid

However, the hydrothermal method requires the use of high-pressure reactors to limit large-scale production, and is not suitable for the preparation of water-sensitive reactants, and nanoparticles may agglomerate

The solvothermal method requires a large amount of organic solvent, which is not economical, especially when using toxic organic reagents, it will pollute the environment, and the reaction is also carried out in an autoclave, which increases the risk and limits the application of large-scale production

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