Method for preparing orderly one-dimensional nanometer array on conductive substrate

A conductive substrate and nano-array technology, applied in the direction of nano-technology, can solve the problems such as the reduction of the order degree of porous alumina, and achieve the effect of facilitating subsequent applications and being convenient to hold

Active Publication Date: 2016-08-10
SHENZHEN GRADUATE SCHOOL TSINGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It must be pointed out that it is difficult to deposit an aluminum layer of more than 600 nanometers on the substrate by thermal evaporation or magnetron sp

Method used

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  • Method for preparing orderly one-dimensional nanometer array on conductive substrate
  • Method for preparing orderly one-dimensional nanometer array on conductive substrate
  • Method for preparing orderly one-dimensional nanometer array on conductive substrate

Examples

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Embodiment 1

[0065] This embodiment is used for illustrating and adopts the method for the present invention to prepare metallic nickel nanorod, comprises the following steps:

[0066] S1: Prepare a through-hole anodized aluminum template with a thickness of 800nm, and the surface scanning electron microscope (SEM) of the prepared through-hole anodized aluminum template is as follows figure 1 As shown, the through-hole anodized aluminum template has highly ordered nanopores, and the preparation of the through-hole anodized aluminum template specifically includes the following steps:

[0067] S11: Synthesis of porous anodized aluminum by two-step anodizing method using aluminum foil;

[0068] S12: peel off the aluminum substrate after applying a layer of nail polish on the porous anodized aluminum surface;

[0069] S13: Soak the porous anodized aluminum in a phosphoric acid solution with a mass fraction of 5% for 40 minutes to remove the barrier layer, then soak the porous anodized aluminu...

Embodiment 2

[0076] This embodiment is used to illustrate adopting the method of the present invention to prepare cadmium selenide semiconductor nanowires, comprising the following steps:

[0077] S1: Prepare a through-hole anodized aluminum template with a thickness of 900nm, wherein the preparation of the through-hole anodized aluminum template specifically includes the following steps:

[0078] S11: Synthesis of porous anodized aluminum by two-step anodizing method using aluminum foil;

[0079]S12: After coating a layer of polydimethylsiloxane (PDMS) on the porous anodized aluminum surface, the aluminum substrate is peeled off;

[0080] S13: Soak porous anodized aluminum in a phosphoric acid solution with a mass fraction of 3% for 50 minutes to remove the barrier layer, then soak porous anodized aluminum in acetone for 20 minutes to remove polydimethylsiloxane (PDMS) Obtain through-hole anodized aluminum template;

[0081] S14: Soak the through-hole anodized aluminum template in hydro...

Embodiment 3

[0087] This embodiment is used to illustrate adopting the method for preparing silver nanowires of the present invention, comprises the following steps:

[0088] S1: Prepare a through-hole anodized aluminum template with a thickness of 400nm, wherein the preparation of the through-hole anodized aluminum template specifically includes the following steps:

[0089] S11: Synthesis of porous anodized aluminum by two-step anodizing method using aluminum foil;

[0090] S12: peel off the aluminum substrate after applying a layer of nail polish on the porous anodized aluminum surface;

[0091] S13: Soak the porous anodized aluminum in a phosphoric acid solution with a mass fraction of 8% for 40 minutes to remove the barrier layer, then soak the porous anodized aluminum in acetone for 15 minutes to remove the nail polish to obtain a through-hole anodized aluminum template;

[0092] S14: Soak the through-hole anodized aluminum template in hydrogen peroxide with a mass fraction of 30% f...

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Abstract

The invention discloses a method for preparing an orderly one-dimensional nanometer array on a conductive substrate. The method includes the following steps that S1, a through-hole anode aluminum oxide template is prepared; S2, the conductive substrate where a gold film is formed through magnetron sputtering is put in a sulfydryl silane solution to be soaked and is then put in hydrochloric acid to be soaked; S3, the through-hole anode aluminum oxide template is attached to the gold film of the conductive substrate processed in the step S2, and is subjected to high-temperature dehydration processing; S4, the one-dimensional nanometer array is synthesized on the through-hole anode aluminum oxide template attached to the gold film of the conductive substrate through electrochemical deposition; and S5, after the through-hole anode aluminum oxide template is removed, moisture on the surface of the one-dimensional nanometer array is washed away, and the orderly one-dimensional nanometer array standing on the conductive substrate is obtained. According to the method, by attaching the through-hole anode aluminum oxide template to the gold film of the processed conductive substrate, the highly-orderly one-dimensional nanometer array is obtained through electrochemical deposition.

Description

technical field [0001] The invention relates to the technical field of nanomaterial preparation, in particular to a method for preparing an ordered one-dimensional nanoarray on a conductive substrate. Background technique [0002] Highly ordered one-dimensional nanostructures such as nanowires, nanorods, and nanotubes have important applications in optical components, biosensors, magnetic memory storage, solar cells, and biomedicine, while porous alumina templates have a wide range of pore sizes. The characteristics of adjustable, precisely adjustable aspect ratio, regular and orderly pores, and high temperature resistance have been widely used in the synthesis of one-dimensional nanostructures. [0003] Electrochemical deposition of one-dimensional nanostructures using porous alumina as a template is a widely used method, which has attracted people's attention because of its simple and convenient operation method, and the length of nanostructures can be simply controlled by...

Claims

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Application Information

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IPC IPC(8): C25D5/02B82Y40/00
CPCB82Y40/00C25D5/02
Inventor 孙树清王传举王桂强
Owner SHENZHEN GRADUATE SCHOOL TSINGHUA UNIV
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