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Single crystal wafer texturing additive

A single crystal silicon wafer and additive technology, which is applied in the direction of single crystal growth, single crystal growth, sustainable manufacturing/processing, etc. Production costs increase and other issues, to achieve superior texturing effect, improve photoelectric conversion efficiency, and reduce reflection effects

Inactive Publication Date: 2017-03-22
DEQING LIJING ENERGY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it should be pointed out that isopropanol and ethanol belong to low-boiling point alcohols, and the temperature in the texturing process is high, so it needs to be added frequently, which is inconvenient to operate and increases the production cost; at the same time, a large amount of use of isopropanol and ethanol will lead to residues in texturing. The COD (Chemical Oxygen Demand) of the liquid exceeds the standard seriously, causing environmental pollution
The currently used texturizing additives form a pyramid structure on the surface of a single crystal silicon wafer with a large size and a wide distribution, which is not conducive to reducing the reflection of light by the silicon wafer

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0016] A monocrystalline silicon wafer texturing additive is characterized in that it consists of the following components and their weight percentages:

[0017] Fluorocarbon surfactant 0.01%, polyvinylpyrrolidone 1%, acrylic acid-maleic anhydride copolymer 0.1%, propylene glycol methyl ether 1%, sodium benzoate 0.05%, sodium p-toluenesulfonate 0.1%, and the balance is water.

[0018] The fluorocarbon surfactant is one or more of sodium perfluorononenyloxybenzenesulfonate, potassium perfluorooctanesulfonate, perfluorooctylsulfonyldiethanolamine, and sodium perfluorooctanoate.

[0019] The water is deionized water, and the conductivity of the deionized water is less than 1 μs / cm.

[0020] Adopt the present invention to make the texturing method of monocrystalline silicon chip, its step is:

[0021] 1) Configuration of texturizing additives: 0.01% of fluorocarbon surfactant, 1% of polyvinylpyrrolidone, 0.1% of acrylic acid-maleic anhydride copolymer, 1% of propylene glycol meth...

Embodiment 2

[0025] A monocrystalline silicon wafer texturing additive, consisting of 0.05g sodium perfluorooctane sulfonate, 1g polyvinylpyrrolidone, 0.5g acrylic acid-maleic anhydride copolymer, 5g propylene glycol methyl ether, 0.1g sodium benzoate and 0.25g p- Sodium toluenesulfonate, 100ml deionized water composition.

[0026] 1. Configure texturizing additives: mix 0.05g sodium perfluorooctane sulfonate, 1g polyvinylpyrrolidone, 0.5g acrylic acid-maleic anhydride copolymer, 5g propylene glycol methyl ether, 0.1g sodium benzoate and 0.25g p-toluenesulfonic acid Sodium was sequentially dissolved into 100 ml of deionized water.

[0027] 2. Prepare lye: dissolve 10 g of sodium hydroxide in 990 g of deionized water to obtain a 1% sodium hydroxide aqueous solution.

[0028] 3. Prepare alkaline texturing solution: mix the texturizing additive obtained in step 1 and the lye obtained in step 2 evenly at a mass ratio of 0.5:100.

[0029] 4. Texturing process: immerse the monocrystalline sili...

Embodiment 3

[0032] A monocrystalline silicon wafer texturing additive, consisting of 0.1g sodium perfluorooctanoate, 5g polyvinylpyrrolidone, 1g acrylic acid-maleic anhydride copolymer, 3g propylene glycol methyl ether, 0.2g sodium benzoate and 0.5g sodium p-toluenesulfonate, 100ml Composition of deionized water.

[0033] 1. Configure the additive for texturing: Dissolve 0.1g sodium perfluorooctanoate, 5g polyvinylpyrrolidone, 1g acrylic acid-maleic anhydride copolymer, 3g propylene glycol methyl ether, 0.2g sodium benzoate and 0.5g sodium p-toluenesulfonate to 100ml in turn ionized water.

[0034] 2. Prepare lye: dissolve 15g of potassium hydroxide in 985g of deionized water to obtain a 1.5% potassium hydroxide aqueous solution.

[0035] 3. Prepare alkaline texturing solution: mix the texturizing additive obtained in step 1 and the lye obtained in step 2 evenly at a mass ratio of 1:100.

[0036] 4. Texturing process: immerse the monocrystalline silicon wafer for solar cells into the al...

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Abstract

The invention belongs to the technical field of single crystal wafer tools and especially relates to a single crystal wafer texturing additive. The single crystal wafer texturing additive is characterized by comprising the following components in parts by weight: 0.01-1% of fluorocarbon surfactants, 1-5% of polyvinylpyrrolidone, 0.1-3% of crylic acid-maleic anhydride copolymer, 1-5% of propylene glycol monomethyl ether, 0.05-0.5% of sodium benzoate, 0.1-2% of sodium p-toluenesulfonate and the balance of water. The single crystal wafer texturing additive has the beneficial effects of excellent texturing effect, smaller size of flock pyramid after texturing, narrower distribution, capability of reducing light reflection and capability of increasing photoelectric conversion efficiency of an assembled solar cell.

Description

technical field [0001] The invention belongs to the technical field of monocrystalline silicon wafer tools, and in particular relates to a monocrystalline silicon wafer texturing additive. Background technique [0002] In the preparation process of solar cells, reducing the reflection of light by silicon wafers as much as possible and increasing the absorption of light by silicon wafers will effectively improve the conversion efficiency of solar cells. Among them, texturing the surface of silicon wafers is a common way to increase the light absorption of crystalline silicon. In industrial production, a large amount of isopropanol or ethanol is often added to the alkaline texturing solution to improve the texturing effect. For example, Chinese invention patents CN201010195103.X and CN201010195095.9 respectively report two monocrystalline silicon wafer texturing additives and their usage methods. However, it should be pointed out that isopropanol and ethanol belong to low-bo...

Claims

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Application Information

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IPC IPC(8): C30B33/10C30B29/06H01L31/18
CPCC30B29/06C30B33/10H01L31/1804Y02E10/547Y02P70/50
Inventor 姜翰钦
Owner DEQING LIJING ENERGY TECH CO LTD
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