Three-dimensional carbon nano-material field effect flexible force sensing element and preparation method
A carbon nanomaterial and sensing element technology, applied in the field of electronic information, can solve the problems of environmental noise suppression, low signal-to-noise ratio, uncertainty of quantitative load measurement, etc., and achieve the effect of high sensitivity
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[0055] The method for preparing the three-dimensional structure of the copper surface firstly uses the template method to prepare the three-dimensional structure of the thermoplastic polyurethane, and the steps are:
[0056] (1) Firstly, single or multiple strip-shaped windows are etched on the surface of the silicon wafer with oxide layer, then the oxide layer is removed by HF etching, and then the tetramethylammonium hydroxide aqueous solution is added with isopropanol to etch the pyramid Strip corrosion pit negative type;
[0057] (2) Fill the heated pyramid-shaped silicon negative type with molten thermoplastic polyurethane, and mechanically peel it off after curing under vacuum to form a positive type polyurethane film;
[0058] (3) Coat a layer of polymethyl methacrylate on the positive surface of the above-mentioned polyurethane by the glue spin method with a thickness of less than 1 micron. After it is fully dried, a layer of pure copper is evaporated on the surface by the va...
Example Embodiment
[0066] Example one
[0067] 1. Using photolithography, the oxide layer thickness is 500 nm, and the crystal orientation is Single or multiple parallel photoresist windows with a width of 20 microns to 150 microns and a length of 150 microns to 500 microns are prepared on the monocrystalline silicon wafer. Hydrofluoric acid is used to dissolve the oxide layer at the window, and then placed in a 1:1 25 In a mixed solution of tetramethylammonium hydroxide aqueous solution and isopropanol with a weight ratio of 5%, etch at 95°C, take it out when the cone-shaped tip is fully formed, wash and dry to obtain a negative silicon pyramid;
[0068] 2. Cover the negative surface of the silicon pyramid with a thermoplastic polyurethane sheet with a thickness of 2 mm, heat it to 165°C in a vacuum, hold it under pressure for 5 minutes, take it out, and peel off the polyurethane adhesive layer after cooling and solidification to obtain a positive polyurethane elastomer film ;
[0069] 3. First, the...
Example Embodiment
[0078] Example two
[0079] 1. Same as Example 1, 1;
[0080] 2. Same as Example 1, 2;
[0081] 3. A layer of semiconducting carbon nanotubes is positively coated on the polyurethane elastomer film by the spinning method. The carbon nanotubes are dispersed in toluene solution at a concentration of 0.02mg / ml. The thickness of the carbon nanotube film dispersed on the surface of the pyramid Not more than 10 nanometers, dry at 140°C for 1 hour;
[0082] 4. Same as Example 1, 8;
[0083] 5. Same as Example 1, 9;
[0084] 6. Same as Example 1, 10;
[0085] 7. Same as Example 1, 11.
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