Preparation process of monocrystalline silicon for solar cell panel
A technology of solar cell and preparation process, applied in the field of solar energy, which can solve the problems affecting the photoelectric conversion efficiency of solar panels, short service life of monocrystalline silicon, poor crystal quality, etc., and achieve high photoelectric conversion efficiency, less internal defects and long service life long effect
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Embodiment 1
[0022] A process for preparing monocrystalline silicon for solar cell panels, comprising the following steps:
[0023] (1) Feeding: After the monocrystalline silicon raw material is heated at a low temperature of 400°C, it is cleaned with deionized water, then dried and mixed with impurities and put into a quartz crucible. The type of impurities depends on the N or P type of the resistor. Can be boron, phosphorus, antimony or arsenic;
[0024] (2) Melting: After adding the monocrystalline silicon raw material into the quartz crucible, close the crystal growth furnace and pump it into a vacuum, then fill it with high-purity argon to maintain the pressure, then turn on the power supply of the graphite heater, heat it to 800°C, and put the long crystal The crystal furnace is evacuated, and the argon gas is filled into the crystal growth furnace again, heated to a melting temperature above 1450°C, and the monocrystalline silicon raw material is melted to obtain a monocrystalline s...
Embodiment 2
[0030] A process for preparing monocrystalline silicon for solar cell panels, comprising the following steps:
[0031] (1) Feeding: After the monocrystalline silicon raw material is heated at a low temperature of 450°C, it is cleaned with deionized water, then dried and mixed with impurities and put into a quartz crucible. The type of impurities depends on the N or P type of the resistor. Can be boron, phosphorus, antimony or arsenic;
[0032] (2) Melting: After adding the monocrystalline silicon raw material into the quartz crucible, close the crystal growth furnace and pump it into a vacuum, then fill it with high-purity argon to maintain the pressure, then turn on the power of the graphite heater, heat it to 850°C, and put the long crystal The crystal furnace is evacuated, and the argon gas is filled into the crystal growth furnace again, heated to a melting temperature above 1450°C, and the monocrystalline silicon raw material is melted to obtain a monocrystalline silicon ...
Embodiment 3
[0038] A process for preparing monocrystalline silicon for solar cell panels, comprising the following steps:
[0039] (1) Feeding: After the monocrystalline silicon raw material is heated at a low temperature of 500°C, it is cleaned with deionized water, then dried and mixed with impurities and put into a quartz crucible. The type of impurities depends on the N or P type of the resistor. Can be boron, phosphorus, antimony or arsenic;
[0040] (2) Melting: After adding the monocrystalline silicon raw material into the quartz crucible, close the crystal growth furnace and vacuumize it, then fill it with high-purity argon to maintain the pressure, then turn on the power supply of the graphite heater, heat it to 900°C, and put the long crystal The crystal furnace is evacuated, and the argon gas is filled into the crystal growth furnace again, heated to a melting temperature above 1450°C, and the monocrystalline silicon raw material is melted to obtain a monocrystalline silicon me...
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