Molybdenum disulfide nanosheet and preparation method thereof

A technology of molybdenum disulfide and nanosheets, which is applied in the direction of molybdenum sulfide, ion implantation plating, coating, etc., can solve the problems of process condition control conditions, high cost, and long time consumption, so as to improve the charge and discharge cycle performance, reduce the Effect of Small Polarization Resistance

Inactive Publication Date: 2017-12-26
ANYANG INST OF TECH
View PDF1 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The CVD method is a method of depositing on a solid thin film substrate through a gas phase reaction at a high temperature, which can produce high-quality, large-area MoS 2 , but its development is restricted by high cost, complex process and strict process conditions.
MoS 2 It can also be prepared by lithiation method. The basic principle is to combine lithium-containing organic chemical reagents with MoS 2 reaction to intercalate lithium ions into MoS 2 The interlayer of the crystal, and then the MoS can be obtained by the reaction with water and the action of ultrasound 2 nanosheets, but this method needs to be carried out under an inert gas atmosphere during the production process to avoid O in the air 2 And the reaction of water vapor with lithium-containing organic chemical reagents takes a long time, which limits its further application
The method of liquid phase mechanical exfoliation can prepare high-quality graphene and graphene-like two-dimensional nanomaterials, but its efficiency is low and the cost is high

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0016] With the polished aluminum sheet as the substrate, the aluminum sheet is ultrasonically cleaned with acetone, ethanol, and distilled water in sequence

[0017] And after drying, put it into the vacuum chamber of the magnetron sputtering apparatus, adjust the base distance of the target to about 6cm, use metal molybdenum material as the target material, and the purity of the target material is above 99.99%, vacuumize to 8* 10 -4 Pa, and then heated the substrate stage, the temperature was raised to 100°C, and the flow rate of argon gas was 10.0 ml min -1 , the hydrogen sulfide flow rate is 1.0 ml min -1 , with a sputtering power of 9 W cm -2 , the sputtering pressure is 0.5Pa, the rotation speed of the substrate table is set to 5 cycles / min, the sputtering time is about 2 minutes, and the thickness is about 3 nm. After the MoS 2 After sputtering of the thin film, MoS will be sputter deposited with 2 The aluminum substrate of the film is immersed in a 10% hydrochloric...

Embodiment 2

[0019] With the polished copper sheet as the substrate, the aluminum sheet was ultrasonically cleaned with acetone, ethanol, and distilled water in sequence

[0020] And after drying, put it into the vacuum chamber of the magnetron sputtering apparatus, adjust the base distance of the target to about 7cm, use metal molybdenum material as the target material, and the purity of the target material is above 99.99%, vacuumize to 8* 10 -4 Pa, the flow rate of argon gas is 40.0 ml min -1 , the hydrogen sulfide flow rate is 3.0 ml min -1 , with a sputtering power of 8 W cm -2 , the sputtering pressure is 0.8Pa, the rotation speed of the substrate table is set to 10 cycles / min, the sputtering time is about 3 minutes, and the thickness is about 5 nm. After the MoS 2 After sputtering of the thin film, MoS will be sputter deposited with 2 The aluminum substrate of the thin film is immersed in a nitric acid solution with a mass fraction of 30% to remove the aluminum substrate, and MoS...

example 3

[0022] With the polished nickel sheet as the substrate, the aluminum sheet was ultrasonically cleaned with acetone, ethanol, and distilled water in sequence

[0023] And after drying, put it into the vacuum chamber of the magnetron sputtering apparatus, adjust the base distance of the target to about 7cm, use metal molybdenum material as the target material, and the purity of the target material is above 99.99%, vacuumize to 8* 10 -4 Pa, the flow rate of argon gas is 30.0 ml min -1 , the hydrogen sulfide flow rate is 1.5 ml min -1 , with a sputtering power of 5 W cm -2 , the sputtering pressure is 0.5 Pa, the rotation speed of the substrate table is set to 10 cycles / min, the sputtering time is about 3 minutes, and the thickness is about 3 nm, the MoS 2 Thin film sputtering. Sputtered with MoS 2 Nanosheet metal nickel sheets are used as catalytic hydrogen evolution electrodes, at 1mol L -1 Hydrogen is produced by electrolysis of water in a sulfuric acid medium, and the el...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention discloses a molybdenum disulfide nanosheet and a preparation method thereof. The molybdenum disulfide nanosheet is prepared by adopting a magnetron reactive sputtering method, metal molybdenum is taken as a target material and argon gas is used as sputtering gas, hydrogen sulfide is taken as reactive gas, and a metal sheet is used as a substrate. As a negative electrode material for a lithium ion battery, the molybdenum disulfide nanosheet has relatively high lithium storage performance, excellent charge-discharge cycle performance and rate capability. As an electrocatalytic hydrogen evolution electrode material and a fuel cell negative electrode material, the molybdenum disulfide nanosheet effectively reduces the electrode over-voltage and reduces the polarization resistance of the electrode.

Description

technical field [0001] The invention relates to the field of two-dimensional nanomaterials, specifically a molybdenum disulfide (MoS 2 ) nanosheets and preparation methods thereof. . Background technique [0002] Since the Geim research group at the University of Manchester in the United Kingdom synthesized graphene by micromechanical exfoliation in 2004, it has triggered an upsurge of research on graphene and its composite materials. At the same time, graphene-like two-dimensional nanomaterials, such as MoS 2 Nanoflakes, WS 2 Nanoflakes and black phosphorus nanoflakes have good catalytic hydrogen evolution activity and lithium storage performance, and have potential application value in the fields of catalysis and energy storage. [0003] Molybdenum disulfide nanosheets (hereinafter referred to as MoS 2 Nanosheets) can be prepared by a variety of methods, which can be mainly divided into physical methods and chemical methods, wherein physical methods can be divided int...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C01G39/06C23C14/35C23C14/06
CPCC01G39/06C01P2004/20C01P2006/40C23C14/0057C23C14/0623C23C14/35
Inventor 武卫明张长松王书红周丽敏郑勇张楠侯绍刚
Owner ANYANG INST OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products