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Preparation method of a highly sensitive zno/aln core-sheath nanorod array ultraviolet detector

A nanorod array and ultraviolet light technology, which is applied in the direction of semiconductor devices, final product manufacturing, sustainable manufacturing/processing, etc., can solve the problems of capturing photogenerated carriers, limiting the photoresponse speed, and affecting the performance of detectors, etc., to achieve fast Effects of response and recovery time, improvement of electrical properties, and improvement of crystallinity

Active Publication Date: 2019-05-28
SOUTHEAST UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, since there are often many surface states and defects in ZnO nanomaterials, it is easy to form trap centers to capture photogenerated carriers. For most ultraviolet photodetectors, ZnO nanorods must be exposed to air during testing, so The surface of nanorods will inevitably have water and oxygen adsorption, which will affect the performance of the detector.
This greatly limits the photoresponse speed and reduces the detection sensitivity

Method used

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  • Preparation method of a highly sensitive zno/aln core-sheath nanorod array ultraviolet detector
  • Preparation method of a highly sensitive zno/aln core-sheath nanorod array ultraviolet detector
  • Preparation method of a highly sensitive zno/aln core-sheath nanorod array ultraviolet detector

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preparation example Construction

[0025] Correspondingly, a method for preparing a highly sensitive and fast-response ZnO / AlN core-sheath ultraviolet light detector is characterized in that it comprises the following steps:

[0026] (1) Mix and grind ZnO powder and carbon powder with a purity of 99.97-99.99% according to a mass ratio of 1:1-1:3, and fill them into a ceramic boat; cut the sapphire substrate into 1.5cm×1cm, and proceed sequentially Ultrasonic cleaning with acetone, absolute ethanol, and deionized water, and blowing dry with nitrogen, as the growth substrate, place the cleaned sapphire substrate in the quartz tube at a position 5cm away from the nozzle; push the whole quartz tube horizontally into the tube furnace For high-temperature reaction, close the tube furnace, vacuumize, and feed argon and oxygen. After the reaction time, close the gas valve and vacuum pump, and feed air. When the pressure in the furnace is atmospheric pressure, open the tube furnace and take out the sample;

[0027] (2) ...

Embodiment 1

[0032] The first step: mix and grind ZnO powder and carbon powder with a purity of 99.99% according to a mass ratio of 1:1, and fill them into a ceramic boat; cut the sapphire substrate into 1.5cm×1cm, and perform acetone, Ultrasonic cleaning with anhydrous ethanol and deionized water, and blowing dry with nitrogen, as the growth substrate, the cleaned Sapphire substrate was placed in a quartz tube at a position 5cm away from the nozzle. The whole quartz tube is pushed into a horizontal tube furnace with a set temperature of 1050° C., the tube furnace is closed, vacuumized, and argon flow rate of 150 sccm and oxygen flow rate of 15 sccm are introduced. After 10 minutes of reaction, close the air valve and vacuum pump, and let in the air. When the pressure in the furnace is atmospheric pressure, open the tube furnace and take out the sample;

[0033] Step 2: Use a magnetron sputtering apparatus to sputter a layer of AlN film on the surface of the zinc oxide nanoarray, use the A...

Embodiment 2

[0037]The first step: mix and grind ZnO powder and carbon powder with a purity of 99.99% according to a mass ratio of 1:1, and fill them into a ceramic boat; cut the sapphire substrate into 1.5cm×1cm, and perform acetone, Ultrasonic cleaning with anhydrous ethanol and deionized water, and blowing dry with nitrogen, as the growth substrate, the cleaned Sapphire substrate was placed in a quartz tube at a position 5cm away from the nozzle. The whole quartz tube is pushed into a horizontal tube furnace with a set temperature of 1000° C., the tube furnace is closed, vacuumized, and argon flow rate of 150 sccm and oxygen flow rate of 15 sccm are introduced. After 30 minutes of reaction, close the air valve and vacuum pump, and let in the air. When the pressure in the furnace is atmospheric pressure, open the tube furnace and take out the sample;

[0038] Step 2: Use a magnetron sputtering apparatus to sputter a layer of AlN film on the surface of the zinc oxide nanoarray, use the Al...

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Abstract

The invention discloses a ZnO / AlN core sheath nanorod array ultraviolet detector with high sensitivity, and a preparation method of the same. The ZnO / AlN core sheath nanorod array ultraviolet detectorwith high sensitivity includes a sapphire substrate, a ZnO nanorod array, AlN sheath films and metal electrodes. The preparation method of the ZnO / AlN core sheath nanorod array ultraviolet detector with high sensitivity includes the steps: growing a ZnO nanorod array on the sapphire substrate; by means of a magnetron sputtering method, sputtering AlN sheath films with different thickness on the ZnO nanorod; and by means of the sputtering method or electron beam vapor plating vapor plating, respectively preparing metal electrodes with ohmic contact at two ends of the ZnO / AlN core sheath nanorod array to form a complete device. By means of the simple magnetron sputtering method, the preparation method of the ZnO / AlN core sheath nanorod array ultraviolet detector with high sensitivity can control the sputtering time and grow AlN sheath films with different thickness and smooth surface on the ZnO nanorod; the prepared ZnO / AlN core sheath optical detector has better ultraviolet response, and the light-to-dark-currents ratio is 5.5*103 under 360nm ultraviolet irradiation and 5V voltage, so that one order of magnitude is improved; and at the same time, the preparation method of the ZnO / AlN core sheath nanorod array ultraviolet detector with high sensitivity has relatively quicker response and recovery time, respectively 0.883 and 0.956s.

Description

technical field [0001] The invention relates to the technical field of semiconductor optoelectronics, in particular to a method for preparing a highly sensitive ZnO / AlN core-sheath nanorod array ultraviolet light detector. Background technique [0002] Ultraviolet photodetectors are widely used, and have excellent prospects in the fields of optical engineering, space science, biomedicine, water purification, flame detection, and optoelectronic devices. At present, the main ultraviolet detectors used are ultraviolet vacuum tubes, photomultiplier tubes, etc., but such devices generally have disadvantages such as complex structures, bulky volume, and high power consumption. Ultraviolet photodetectors based on wide-bandgap semiconductor materials have gradually attracted attention due to their advantages such as small size, simple process, no response to visible light, and room temperature operation. Zinc oxide (ZnO) material is a group II-IV compound with a direct wide band ga...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/101H01L31/0296H01L31/0352H01L31/18
CPCH01L31/0296H01L31/035227H01L31/101H01L31/1836Y02P70/50
Inventor 徐春祥游道通石增良秦飞飞
Owner SOUTHEAST UNIV
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