Preparation method of a highly sensitive zno/aln core-sheath nanorod array ultraviolet detector
A nanorod array and ultraviolet light technology, which is applied in the direction of semiconductor devices, final product manufacturing, sustainable manufacturing/processing, etc., can solve the problems of capturing photogenerated carriers, limiting the photoresponse speed, and affecting the performance of detectors, etc., to achieve fast Effects of response and recovery time, improvement of electrical properties, and improvement of crystallinity
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[0025] Correspondingly, a method for preparing a highly sensitive and fast-response ZnO / AlN core-sheath ultraviolet light detector is characterized in that it comprises the following steps:
[0026] (1) Mix and grind ZnO powder and carbon powder with a purity of 99.97-99.99% according to a mass ratio of 1:1-1:3, and fill them into a ceramic boat; cut the sapphire substrate into 1.5cm×1cm, and proceed sequentially Ultrasonic cleaning with acetone, absolute ethanol, and deionized water, and blowing dry with nitrogen, as the growth substrate, place the cleaned sapphire substrate in the quartz tube at a position 5cm away from the nozzle; push the whole quartz tube horizontally into the tube furnace For high-temperature reaction, close the tube furnace, vacuumize, and feed argon and oxygen. After the reaction time, close the gas valve and vacuum pump, and feed air. When the pressure in the furnace is atmospheric pressure, open the tube furnace and take out the sample;
[0027] (2) ...
Embodiment 1
[0032] The first step: mix and grind ZnO powder and carbon powder with a purity of 99.99% according to a mass ratio of 1:1, and fill them into a ceramic boat; cut the sapphire substrate into 1.5cm×1cm, and perform acetone, Ultrasonic cleaning with anhydrous ethanol and deionized water, and blowing dry with nitrogen, as the growth substrate, the cleaned Sapphire substrate was placed in a quartz tube at a position 5cm away from the nozzle. The whole quartz tube is pushed into a horizontal tube furnace with a set temperature of 1050° C., the tube furnace is closed, vacuumized, and argon flow rate of 150 sccm and oxygen flow rate of 15 sccm are introduced. After 10 minutes of reaction, close the air valve and vacuum pump, and let in the air. When the pressure in the furnace is atmospheric pressure, open the tube furnace and take out the sample;
[0033] Step 2: Use a magnetron sputtering apparatus to sputter a layer of AlN film on the surface of the zinc oxide nanoarray, use the A...
Embodiment 2
[0037]The first step: mix and grind ZnO powder and carbon powder with a purity of 99.99% according to a mass ratio of 1:1, and fill them into a ceramic boat; cut the sapphire substrate into 1.5cm×1cm, and perform acetone, Ultrasonic cleaning with anhydrous ethanol and deionized water, and blowing dry with nitrogen, as the growth substrate, the cleaned Sapphire substrate was placed in a quartz tube at a position 5cm away from the nozzle. The whole quartz tube is pushed into a horizontal tube furnace with a set temperature of 1000° C., the tube furnace is closed, vacuumized, and argon flow rate of 150 sccm and oxygen flow rate of 15 sccm are introduced. After 30 minutes of reaction, close the air valve and vacuum pump, and let in the air. When the pressure in the furnace is atmospheric pressure, open the tube furnace and take out the sample;
[0038] Step 2: Use a magnetron sputtering apparatus to sputter a layer of AlN film on the surface of the zinc oxide nanoarray, use the Al...
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