A kind of silicon photovoltaic cell and preparation method thereof
A battery and silicon light technology, applied in the field of solar cells, can solve the problems of unsatisfactory passivation effect, complicated process and increased manufacturing cost.
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[0017] A method for preparing a silicon photovoltaic cell proposed by a specific embodiment of the present invention includes the following steps: (1) preparing an array of silicon nanowires on the surface of an n-type silicon wafer; (2) preparing chlorobenzene containing insulating nanoparticles and Spiro-OMeTAD The solution is spin-coated on the silicon nanowire array of the n-type silicon wafer by spin coating, and annealed; (3) Preparation of the PEDOT:PSS layer: the front surface of the n-type silicon wafer obtained in step (2) is spun Coating with PEDOT:PSS solution and annealing; (4) Preparation of front electrode; (5) Preparation of 8-hydroxyquinoline-lithium / lithium fluoride composite interface layer on the back of n-type silicon wafer; (6) Backside aluminum electrode preparation.
[0018] Wherein, in the step (1), a silicon nanowire array is formed on the surface of the n-type silicon wafer by wet etching or dry etching, and then immersed in a hydrofluoric acid solut...
Embodiment 1
[0021] A method for preparing a silicon photovoltaic cell, comprising the following steps: (1) preparing an array of silicon nanowires on the surface of an n-type silicon wafer; (2) spin-coating a chlorobenzene solution containing insulating nanoparticles and Spiro-OMeTAD on the surface of the silicon photovoltaic cell by a spin coating method (3) Preparation of PEDOT:PSS layer: spin-coating PEDOT:PSS solution on the front of the n-type silicon wafer obtained in step (2), and annealing treatment; (4) preparation of front electrode; (5) preparation of 8-hydroxyquinoline-lithium / lithium fluoride composite interface layer on the back of n-type silicon wafer; (6) preparation of back aluminum electrode
[0022] Wherein, in the step (1), a silicon nanowire array is formed on the surface of the n-type silicon wafer by wet etching, and then immersed in a hydrofluoric acid solution to remove the natural oxide layer on the surface of the silicon nanowire. In the step (2), the concentrat...
Embodiment 2
[0025]A method for preparing a silicon photovoltaic cell, comprising the following steps: (1) preparing an array of silicon nanowires on the surface of an n-type silicon wafer; (2) spin-coating a chlorobenzene solution containing insulating nanoparticles and Spiro-OMeTAD on the surface of the silicon photovoltaic cell by a spin coating method (3) Preparation of PEDOT:PSS layer: spin-coating PEDOT:PSS solution on the front of the n-type silicon wafer obtained in step (2), and annealing treatment; (4) preparation of front electrode; (5) preparation of 8-hydroxyquinoline-lithium / lithium fluoride composite interface layer on the back of n-type silicon wafer; (6) preparation of back aluminum electrode
[0026] Wherein, in the step (1), a silicon nanowire array is formed on the surface of the n-type silicon wafer by wet etching, and then immersed in a hydrofluoric acid solution to remove the natural oxide layer on the surface of the silicon nanowire. In the step (2), the concentrati...
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