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Method for rapid preparation of gold nanocolumns

A gold nanocolumn and gold preparation technology, which is applied in metal material coating process, coating, liquid chemical plating, etc., can solve the problems of harsh experimental conditions, cumbersome steps, complicated process, etc., and achieve simple operation and simple process , The effect of the simple preparation process

Active Publication Date: 2020-05-05
CHANGCHUN UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to provide a method for rapidly preparing gold nanocolumns, which solves the technical problems of complex process, harsh experimental conditions, cumbersome steps and long time consumption in the prior art

Method used

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  • Method for rapid preparation of gold nanocolumns
  • Method for rapid preparation of gold nanocolumns
  • Method for rapid preparation of gold nanocolumns

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Experimental program
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Effect test

Embodiment 1

[0033] See attached figure 1 to attach Image 6 , the method for rapidly preparing gold nanocolumns of the present invention, comprises the following steps:

[0034] The method for rapidly preparing gold nanocolumns of the present invention comprises the following steps:

[0035] Step 1: cleaning the Si wafer, and plating gold on the surface of the Si wafer;

[0036] Place the Si sheet in acetone, absolute ethanol, and deionized water for ultrasonic cleaning, wash the earballs and blow dry, first coat a layer of chromium with a thickness of 5 nm, and then plate a layer of gold with a thickness of about 60 nm;

[0037] Step 2: using electron beam exposure technology or laser interference lithography technology to prepare nanohole arrays with different diameters on the gold-plated Si wafer;

[0038] Step 3: preparing gold nanocolumns;

[0039] A, the gold-plated Si sheet that has nanohole array in the step 2 is fixed in the beaker;

[0040] b. Inject chloroauric acid soluti...

Embodiment 2

[0052] See attached Figure 7 , the method for rapidly preparing gold nanocolumns of the present invention, comprises the following steps:

[0053] Step 1: Clean the Si wafer, and plate gold on the surface of the Si wafer; place the Si wafer in acetone, absolute ethanol, and deionized water for ultrasonic cleaning, wash the ear ball and dry it, first coat a layer of chromium with a thickness of 5nm, and then plate a The layer thickness is about 60 nm of gold.

[0054] Step 2: Prepare nanohole arrays with different diameters by electron beam exposure technology;

[0055]a. Spin-coat electronic resist on the gold-plated Si wafer, and then pre-bake;

[0056] b. Use electron beam exposure equipment to expose the electron resist, and obtain nanopore arrays with different diameters after developing;

[0057] Use the DesignCAD21 software on the electron beam exposure equipment to draw multiple array patterns with different diameters, and generate run file files; the acceleration v...

Embodiment 3

[0064] The difference between this embodiment and the second embodiment is that in step 2, the specific operation steps for preparing nanohole arrays with different diameters by laser interference lithography are as follows:

[0065] a. Spin-coat AR-P3740 UV photoresist with a ratio of 1:1 to the thinner AR 300-12 on the gold-plated Si wafer at a rate of 2000r / min, the time is 1min, the thickness of the photoresist is 600nm, and then Pre-bake on a hot plate at 100°C for 1min;

[0066] b. Use a three-beam laser interference system to expose the photoresist;

[0067] Use a high-power solid-state laser with a wavelength of 355nm, a high-reflection mirror, a beam splitter, a half-wave plate and a polarizer to build a three-beam laser interference system, and expose on the photoresist. The spatial angles of the three beams of coherent light are 0° respectively. , 120°, 240°; the polarization angles are 0°, 90°, and 90° respectively, and the incident angles of the three coherent be...

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Abstract

The invention discloses a method for quickly preparing gold nano-rods and belongs to the technical field of preparation of gold nano-materials. By means of the method, the technical problems that theprocess is complicated, the experimental conditions are harsh, the steps are tedious, and time consumption is high in the prior art are solved. The method comprises the steps that a nano-hole array with regular arrangement and different diameter is prepared on a gold-plated Si sheet through an electron beam lithography technology or a laser interference photoetching technology; the gold-plated Sisheet with the nano-hole array is placed into a beaker, then a solution composed of deionized water, chloroauric acid and sodium citrate is injected into the beaker for a reaction, the gold-plated Sisheet with the nano-hole array is taken out and air-dried under the natural condition, and the gold nano-rods with different diameters are obtained in the nano-hole array with different diameters. Themethod is simple in process, simple and convenient to implement, low in cost and high in repeatability, and the gold nano-rods arranged in order can be obtained quickly.

Description

technical field [0001] The invention belongs to the technical field of gold nanomaterial preparation, and in particular relates to a method for rapidly preparing gold nanocolumns. Background technique [0002] Nanopillars are a new technology in the field of nanostructures. Nanopillars are diameters of 10 -9 m nanostructures. The bottom of the nanopillar is a cylindrical structure, and the top is a tapered point. Because of its unique shape, it has many unique properties that other nanostructures do not have. In particular, gold nanopillars have attracted extensive attention from researchers at home and abroad due to their outstanding performance in surface-enhanced Raman scattering, biomarkers, drug loading and release, and nano-noble metal catalysis. [0003] At present, the most commonly used method for preparing gold nanopillars is the template method, using AAO as a template, electrochemically depositing gold nanoparticles to prepare gold nanopillars or using laser i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C18/44C23C18/18
CPCC23C18/1612C23C18/1658C23C18/1893C23C18/44
Inventor 宋正勋兀晓敏李理曹亮翁占坤张晓旭刘梦楠郝博张阳王作斌许红梅
Owner CHANGCHUN UNIV OF SCI & TECH
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