Cu-doped SnSe semiconductor film and electrochemical preparation method thereof
A semiconductor and thin film technology, applied in the field of Cu-doped SnSe semiconductor thin film and its electrochemical preparation, can solve problems such as limitations, and achieve the effects of avoiding cracks and holes, high carrier concentration, and high conductivity
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Embodiment 1
[0040] (1) Preparation of electrodeposition solution: weigh 0.90g disodium edetate, 0.45g SnCl 2 2H 2 O, 0.13g Na 2 SeO 3 ·5H 2 O, CuCl 2 ·5H 2 O, dissolve it in 200ml of deionized water after deoxygenation and stir evenly, and adjust the pH to 2.6 with 0.1M dilute hydrochloric acid.
[0041] (2) Electrodeposition: use the solution prepared in step (1) as the electrolyte, the pretreated ITO glass as the working electrode, the saturated calomel electrode as the reference electrode, and the platinum sheet as the auxiliary electrode. Connect to the corresponding terminal button of the potentiostat, ensure that the distance between the working electrode and the platinum sheet is 3cm, and ensure that the temperature of the electrolyte is between 15°C and 40°C, and the deposition time is 20min-60min to obtain Cu-doped SnSe The pre-deposited film was tested with an Oxford INCA-Penta-FET-X3 X-ray energy dispersive spectrometer to test the chemical composition of the film. The re...
Embodiment 2
[0044] (1) Preparation of electrodeposition solution: weigh 0.90g disodium edetate, 0.45g SnCl 2 2H 2 O, 0.13g Na 2 SeO 3 ·5H 2 O, CuCl 2 ·5H 2 O, the amount of urea to be added is 10mg / L, dissolved in 200ml of deionized water after deoxygenation and stirred evenly, and the pH is adjusted to 2.6 with 0.1M dilute hydrochloric acid.
[0045] (2) Electrodeposition: use the solution prepared in step (1) as the electrolyte, the pretreated ITO glass as the working electrode, the saturated calomel electrode as the reference electrode, and the platinum sheet as the auxiliary electrode. Connect to the corresponding terminal button of the potentiostat, ensure that the distance between the working electrode and the platinum sheet is 3cm, and ensure that the temperature of the electrolyte is between 15°C and 40°C, and the deposition time is 20min-60min to obtain Cu-doped SnSe The pre-deposited film was tested with an Oxford INCA-Penta-FET-X3 X-ray energy dispersive spectrometer to t...
Embodiment 3
[0048] (1) Preparation of electrodeposition solution: weigh 0.90g disodium edetate, 0.45g SnCl 2 2H 2 O, 0.13g Na 2 SeO 3 ·5H 2 O, CuCl 2 ·5H 2 O, the amount of sodium dodecylsulfonate added is 10mg / L, dissolved in 200ml of deionized water after deoxygenation and stirred evenly, and the pH is adjusted to 2.6 with 0.1M dilute hydrochloric acid.
[0049] (2) Electrodeposition: use the solution prepared in step (1) as the electrolyte, the pretreated ITO glass as the working electrode, the saturated calomel electrode as the reference electrode, and the platinum sheet as the auxiliary electrode. Connect to the corresponding terminal button of the potentiostat, ensure that the distance between the working electrode and the platinum sheet is 3cm, and ensure that the temperature of the electrolyte is between 15°C and 40°C, and the deposition time is 20min-60min to obtain Cu-doped SnSe The pre-deposited film was tested with an Oxford INCA-Penta-FET-X3 X-ray energy dispersive spec...
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