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78 results about "Cu doping" patented technology

Cu-doping modified TiO2 photocatalyst and preparation method thereof

The invention discloses a Cu-doping modified TiO2 photocatalyst. The Cu-doping modified TiO2 photocatalyst grows on a copper-titanium alloy wire or bar base body and has a two-dimensional structure on the peripheral surface of the copper-titanium alloy wire or bar base body, and the structural unit of the Cu-doping modified TiO2 photocatalyst is a Cu-doping TiO2 nanotube. The invention also discloses a preparation method of the Cu-doping modified TiO2 photocatalyst. The preparation method can be used for directly growing a Cu-doping TiO2 nanotube array which has the two-dimensional structure and higher visible light response property on the copper-titanium alloy wire or bar base body through an electrochemical anode oxidation method. The Cu-doping TiO2 photocatalyst with the two-dimensional structure, which is disclosed by the invention, enlarges the specific area of a TiO2 photocatalyst and effectively extends the forbidden bandwidth of the TiO2 photocatalyst, thereby outstandingly enhancing the adsorptive capacity on a degradation product and obtaining the high-efficiency absorption on a solar spectrum; and the Cu-doping TiO2 photocatalyst is conductive to improving the visible light catalytic activity and has the advantages of good recoverability of the TiO2 photocatalyst, simple process, low cost and high controllable degree.
Owner:RESEARCH INSTITUTE OF TSINGHUA UNIVERSITY IN SHENZHEN

Cu-doped ZnO/graphene composite photocatalyst and preparation method thereof

The invention discloses a Cu-doped ZnO/graphene composite photocatalyst and a preparation method thereof. The method comprises the following steps: mixing graphite oxide and a surfactant CTAB (cetyl trimethyl ammonium bromide) in distilled water and carrying out ultrasonic treatment to obtain a first precursor reactant; dissolving zinc acetate and cupric acetate in the distilled water and carrying out ultrasonic treatment to obtain a second precursor reactant; dissolving hexamethylenetetramine and sodium citrate in the distilled water and carrying out ultrasonic treatment to obtain a third precursor reactant; after mixing the first precursor reactant and the second precursor reactant, carrying out ultrasonic treatment, then mixing the obtained product and the third precursor reactant, controlling reaction temperature in the range of 70 DEG C to 120 DEG C and performing reaction; sealing, naturally cooling, standing and carrying out extraction filtration to obtain filter residues; and after drying the filter residues, carrying out annealing treatment. According to the invention, addition of graphene reduces electron-hole compounding possibility; and meanwhile, introduction of Cu ions can be used as an ion trap to temporarily capture a charge carrier and inhibit electron-hole compounding so as to obviously improve photocatalytic efficiency of the product.
Owner:SOUTH CHINA UNIV OF TECH

Microchannel plate and method for preparing high-resistance thin film with Cu being doped with Al2O3 on inner wall of microchannel plate

The invention relates to a microchannel plate and a method for preparing a high-resistance thin film with Cu being doped with Al2O3 on the inner wall of the microchannel plate. According to preparation of the high-resistance thin film with the Cu being doped with the Al2O3 on the inner wall of the microchannel plate, the high-resistance thin film with the Cu being doped with the Al2O3 is obtainedby the manner that different composition material deposition is performed on the inner wall of the microchannel plate through an atomic layer deposition method, when the deposition is performed, in one large circulation, the Cu doping ratio is controlled by controlling the deposition times of the Al2O3 and the deposition times of the Cu, so that the resistance rate of the thin film can be accurately adjusted and controlled within the range of 10<6>-10<10> omega.cm, the thickness of the thin film is controlled by controlling the circulation times of the large circulation, the resistance rate ofthe prepared thin film basically remains constant under a high-temperature working environment or after high-temperature annealing, and the technical problem of unstable performance of the microchannel plate caused by large change of the resistance rate of an existing microchannel plate surface thin film under the high-temperature condition is solved.
Owner:XI'AN INST OF OPTICS & FINE MECHANICS - CHINESE ACAD OF SCI
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