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Method and production system for producing reagent hydrochloric acid by using tail gas of Mannheim furnace

A Mannheim furnace, reagent hydrochloric acid technology, applied in chemical instruments and methods, halogen/halogen acid, chlorine/hydrogen chloride purification, etc., can solve the problems of small production scale, low output rate, high energy consumption, and achieve output The effect of high rate, reduced energy consumption and low energy consumption

Active Publication Date: 2021-11-09
河北卓泰肥业有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of this, the present invention aims to propose a method and a production system utilizing Mannheim furnace tail gas to produce reagent hydrochloric acid, to solve the problem of producing reagent hydrochloric acid in the prior art Problems of high energy consumption, low output rate, and small production scale

Method used

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  • Method and production system for producing reagent hydrochloric acid by using tail gas of Mannheim furnace
  • Method and production system for producing reagent hydrochloric acid by using tail gas of Mannheim furnace
  • Method and production system for producing reagent hydrochloric acid by using tail gas of Mannheim furnace

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Embodiment 1

[0039] Such as Figure 1~5 As shown, the present embodiment provides a method for utilizing Mannheim furnace tail gas to produce reagent hydrochloric acid, specifically comprising the following process:

[0040] (1) M101 Mannheim furnace tail gas treatment: absorb impurity gas with concentrated sulfuric acid

[0041] After the reaction of potassium chloride+concentrated sulfuric acid→potassium sulfate+hydrogen chloride gas in the Mannheim furnace, the gas impurities include nitrogen oxides, metal salts, sulfides, iron ions, organic VOCs, carbon oxides, bromide ions, etc. Hydrogen chloride gas accounts for about 32%~42% of it, and the tail gas is used as the raw material for the production of reagent hydrochloric acid. After the tail gas is guided into the sulfuric acid scrubber T104 by P106, it enters the sulfuric acid scrubber T104 from the lower part of the sulfuric acid scrubber T104. Use the P105 circulation pump to pump the concentrated sulfuric acid into the spray head ...

Embodiment 2

[0054] The method for producing reagent hydrochloric acid in this example is the same as that in Example 1, the difference being: (3) the first filter G101 in the primary filtration is filled with glass fiber and modified expanded graphite, and the preparation method of the expanded graphite is:

[0055] Put the spare expanded graphite into 32% hydrochloric acid solution, stir, filter, wash, dry at 105°C, and slowly dissolve chitosan with water to form a chitosan solution. Slowly add the dried expanded graphite into the chitosan solution, stir to make it fully mixed, and dry at 110° C. for 6 hours to obtain the chitosan / expanded graphite adsorbent. Wherein the mass ratio of chitosan to expanded graphite is 1:20.

Embodiment 3

[0057] The method for producing reagent hydrochloric acid in this example is the same as that in Example 2, the difference being that in (6) the S101 resin tank of the secondary filter is filled with adsorption resin, and the surface of the adsorption resin is loaded with β-cyclodextrin, and the adsorption resin is The β-cyclodextrin, polyol, isocyanate and foaming agent are polymerized under the action of a catalyst so that the β-cyclodextrin is loaded in the polyurethane cross-linked network, which has a good adsorption effect on organic matter and metal ions.

[0058] Specifically, the preparation method of the modified adsorption resin is:

[0059] Dissolve 2.0g of β-cyclodextrin in water; then dissolve 50g of polypropylene glycol, 100g of diphenylmethane diisocyanate, and 0.25g of initiator in deionized water to obtain a prepolymer system; among them, polypropylene glycol, diphenyl The mass ratio of methyl methane diisocyanate is 1:2, and the initiator adopts stannous oct...

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Abstract

The invention provides a method and a production system for producing reagent hydrochloric acid by using tail gas of a Mannheim furnace. The method comprises the following steps that tail gas discharged from a Mannheim furnace enters a sulfuric acid washing tower, impurity gas is absorbed by concentrated sulfuric acid, and gas discharged by the sulfuric acid washing tower sequentially passes through a first-stage washing tower, a first-stage filter, a second-stage washing tower, a third-stage washing tower and a second-stage filter, wherein the lower portion of the third-stage washing tower is communicated with the second-stage washing tower through a liquid phase pipeline so as to make the third-stage washing tower supplement liquid into the second-stage washing tower through a pipeline, a heat exchanger is additionally arranged on a circulating channel outside the second-stage washing tower and is communicated with a refrigerator, and circulating water of the heat exchanger is cooled to be lower than 5 DEG C by the refrigerator. According to the invention, at a low temperature, circulating water in a second-stage washing tower can circularly absorb hydrogen chloride gas all the time, so that the final hydrochloric acid concentration can be close to 36%, the hydrogen chloride gas absorption capacity is improved, and the concentration of the finally obtained reagent hydrochloric acid is further improved.

Description

technical field [0001] The invention relates to the field of electronic chemical reagent production, in particular to a method and a production system for producing reagent hydrochloric acid by using Mannheim furnace tail gas. Background technique [0002] With the rapid development of semiconductor technology, the requirements for ultra-clean and high-purity reagents are getting higher and higher. In the processing of integrated circuits (IC), ultra-clean and high-purity reagents are mainly used for cleaning and etching the surface of chips and silicon wafers. Their purity and cleanliness have a great influence on the yield, electrical performance and reliability of integrated circuits. significant impact. As an important microelectronic chemical, ultra-clean reagent hydrochloric acid has been widely used in the cleaning and drying of semiconductors and large-scale integrated circuits. [0003] At present, the main production technology used in the production of electroni...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B7/07
CPCC01B7/0706C01B7/0718C01B7/0725Y02P20/10
Inventor 吴军祥吴良毅孙汉勇石建华王秀萍夏涛索振华王林浩
Owner 河北卓泰肥业有限公司
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