Method for preparing zirconium oxide porcelain coating on self assembled functional organosilane single layer film
A self-assembled single-layer, zirconia ceramic technology, applied to the surface coating liquid device, pre-treated surface, coating, etc., to achieve low surface roughness, simple preparation process, anti-wear and anti-friction and anti-adhesion properties Good results
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Embodiment 1
[0024] Embodiment 1: The preparation of the zirconia ceramic film on the surface of the sulfonated MPTS self-assembled monolayer film includes two steps of A and B in turn:
[0025] A. Preparation of sulfonated MPTS self-assembled monolayer film:
[0026] (1) Use a single crystal silicon wafer as a substrate, wash it with a mixed solution (Piranha solution) of concentrated sulfuric acid and hydrogen peroxide with a volume ratio of 70%: 30% at 90 ° C, rinse with distilled water, and 2 air dry;
[0027] (2) Prepare 1×10 -3 Anhydrous toluene solution of M MPTS;
[0028] (3) Quickly immerse the cleaned monocrystalline silicon wafer in the prepared MPTS dilute solution and react at room temperature for 12 hours; after taking it out, wash it thoroughly with chloroform and deionized water and blow it dry with nitrogen gas to obtain MPTS monolayer film;
[0029] (4) The substrate on which the MPTS self-assembled monolayer film was prepared was then immersed in a mixed solution of ...
Embodiment 2
[0044] Embodiment 2: The preparation of sulfonated TSHT self-assembled monolayer film surface zirconia ceramic film, including two steps of A and B in turn:
[0045] A. Preparation of sulfonated TSHT self-assembled monolayer film:
[0046] (1) Using the glass slide as the substrate, the cleaning method is the same as in Example 1;
[0047] (5) prepare the dicyclohexyl solution of 1% (volume ratio) TSHT;
[0048] (6) Quickly immerse the cleaned glass slide in the prepared dilute TSHT solution and react at room temperature for 5 hours, take it out, wash it thoroughly with chloroform and dry it with nitrogen, and obtain a TSHT monolayer film with certain order;
[0049](7) The substrate prepared with TSHT self-assembled monolayer film was immersed in 30ml oxidant (2KHSO 5 ·KHSO 4 ·K 2 SO 4 ) aqueous solution, reacted at room temperature for 6 hours; after taking it out, thoroughly washed it with acetone, deionized water, and chloroform, and finally dried it with nitrogen to ...
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