Radiation-sensitive resin composition, method for forming spacer and spacer

A curable resin and composition technology, applied in nonlinear optics, patterned surface photoengraving process, semiconductor/solid-state device manufacturing, etc. Oven and other problems, to achieve the effect of excellent compressive strength, excellent friction resistance and high light transmittance
CN101025567AActive Publication Date: 2007-08-29JSR CORPORATIOON

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
JSR CORPORATIOON
Publication Date
2007-08-29

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Abstract

The radiation-sensitive resin composition contains (A) a polymer obtained by living radical polymerization in the presence of a specific thiocarbonyl thio compound and having carboxyl groups or polymer of epoxy radical or oxetane group, wherein the ratio (Mw / Mn) between weight average molecular weight (Mw) and number average molecular weight (Mn) in terms of polystyrene measured by gel permeation chromatography is <=1.7.
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Description

technical field

[0001] The present invention relates to a curable resin composition containing a specific resin, a spacer, an interlayer insulating film, a microlens, or a method for forming a cured film as a protective film using the same, and a cured film. Background technique

[0002] <Prior Art Regarding Spacers>

[0003] In liquid crystal display elements, in order to maintain a constant distance between two transparent substrates, spacer particles such as glass beads and plastic beads having a predetermined particle size have been used. These spacer particles are randomly dispersed on transparent substrates such as glass substrates. Therefore, if the spacer particles are present in the image forming region, there is a problem that the reflection phenomenon of the spacer particles occurs, or the incident light scatters, and the contrast of the liquid crystal display element decreases.

[0004] Therefore, in order to solve these problems, a method of forming space...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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