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Radiation-sensitive resin composition, method for forming spacer and spacer

A curable resin and composition technology, applied in nonlinear optics, patterned surface photoengraving process, semiconductor/solid-state device manufacturing, etc. Oven and other problems, to achieve the effect of excellent compressive strength, excellent friction resistance and high light transmittance

Active Publication Date: 2007-08-29
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In liquid crystal display elements, in order to maintain a constant distance between two transparent substrates, spacer particles such as glass beads and plastic beads having a predetermined particle size have been used. These spacer particles are randomly dispersed on transparent substrates such as glass substrates. Therefore, if there are spacer particles in the image formation area, there will be problems such as reflection phenomenon of spacer particles or scattering of incident light, which will reduce the contrast of the liquid crystal display element.
[0022] In addition, with the increase in size of panel substrates in recent years, in the baking step of forming a protective film from a thermosetting composition, sublimates are generated, accumulated inside the baking furnace, and contaminate the baking furnace, making it difficult to control the baking process. Conditions, or accumulated sublimates adhere to the panel substrate to cause contamination and poor display
[0023] In the formation of a protective film for color filters, it is preferable to use a curable resin composition that has the advantage of being able to easily form a protective film with excellent surface hardness. However, in addition to meeting the general requirements of protective films such as transparency, it can also A material that can form a protective film that can meet the above-mentioned various new high demands and is also excellent in storage stability as a composition has not yet been known.

Method used

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  • Radiation-sensitive resin composition, method for forming spacer and spacer
  • Radiation-sensitive resin composition, method for forming spacer and spacer
  • Radiation-sensitive resin composition, method for forming spacer and spacer

Examples

Experimental program
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Effect test

preparation example Construction

[0186] As the solvent used in the preparation of the first composition, each component is used to uniformly dissolve (A) polymer, (B) polymerizable unsaturated compound and (C) radiation-sensitive polymerization initiator, and optionally added other components, and Does not react with the ingredients.

[0187] Examples of such a solvent include the same solvents as the solvents that can be used to produce the above-mentioned (A) polymer.

[0188] Among such solvents, for example, alcohols, glycol ethers, glycol alkyl ether acetates, esters and diethylene glycol. Among them, for example, benzyl alcohol, 2-phenylethyl alcohol, 3-phenyl-1-propanol, ethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol Diethyl ether, diethylene glycol ethyl methyl ether, diethylene glycol dimethyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, methyl methoxypropionate, ethyl ethoxypropionate.

[0189] In addit...

Embodiment

[0403] Hereinafter, the present invention will be described more specifically by showing synthesis examples and examples, but the present invention is not limited to the following examples.

[0404] For the polymer synthesized in the synthesis example of the following polymer, the gel permeation chromatography was measured under the following conditions, the polystyrene-equivalent weight average molecular weight (Mw) and the number average molecular weight (Mn) were obtained, and the molecular weight distribution (Mw / Mn).

[0405] Device: GPC-101 (manufactured by Showa Denko Co., Ltd.)

[0406] Chromatographic column: combined with GPC-KF-801, GPC-KF-802, GPC-KF-803 and GPC-KF-804

[0407] Mobile phase: tetrahydrofuran containing 0.5% by weight phosphoric acid.

[0408] (1) Preparation and evaluation of the first composition

Synthetic example 1

[0411] In a flask with a condenser tube and a stirrer, add 5 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile), 5 parts by weight of tetraethylthiuram disulfide as a molecular weight control agent and 200 parts by weight of diethylene glycol diethyl ether, then add 20 parts by weight of styrene, 17 parts by weight of methacrylic acid, 18 parts by weight of tricyclic [5.2.1.0 2，6 ] Dec-8-yl methacrylate and 45 parts by weight of glycidyl methacrylate, after replacing nitrogen, slowly stirred, while raising the temperature of the reaction solution to 70°C, and kept the temperature for polymerization for 4 hours. Then, 3 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile) was added, and the polymerization was continued for 3 hours to obtain a solution containing a copolymer. Mw=12000 of this resin, Mw / Mn=1.60. This resin is called "resin (A-1)".

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Abstract

The radiation-sensitive resin composition contains (A) a polymer obtained by living radical polymerization in the presence of a specific thiocarbonyl thio compound and having carboxyl groups or polymer of epoxy radical or oxetane group, wherein the ratio (Mw / Mn) between weight average molecular weight (Mw) and number average molecular weight (Mn) in terms of polystyrene measured by gel permeation chromatography is <=1.7.

Description

technical field [0001] The present invention relates to a curable resin composition containing a specific resin, a spacer, an interlayer insulating film, a microlens, or a method for forming a cured film as a protective film using the same, and a cured film. Background technique [0002] <Prior Art Regarding Spacers> [0003] In liquid crystal display elements, in order to maintain a constant distance between two transparent substrates, spacer particles such as glass beads and plastic beads having a predetermined particle size have been used. These spacer particles are randomly dispersed on transparent substrates such as glass substrates. Therefore, if the spacer particles are present in the image forming region, there is a problem that the reflection phenomenon of the spacer particles occurs, or the incident light scatters, and the contrast of the liquid crystal display element decreases. [0004] Therefore, in order to solve these problems, a method of forming space...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/027G03F7/008G02F1/1339G03F7/20G02B3/00
CPCC08F2/50C08K5/28C08K5/372C08L101/08G02B1/041G02B3/00G02F1/1339G03F7/023G02F1/13398H01L21/0274
Inventor 梶田彻河本达庆松本龙一户大吾
Owner JSR CORPORATIOON
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