Organic-two-dimensional crystal-inorganic hybrid heterojunction solar cell device and preparation method thereof
A technology for solar cells and two-dimensional crystals, applied in the field of solar cells, can solve the problems of reducing the short-circuit current of solar cells, hindering charge transfer, reducing cell efficiency, etc., to enhance charge transfer capability, improve stability, and improve surface density of states defects. Effect
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[0046] Correspondingly, the method for preparing an organic-two-dimensional crystal-inorganic hybrid heterojunction solar cell device in an embodiment of the present invention includes the following steps:
[0047] S1. Clean the silicon wafer and do an alkyl passivation treatment to obtain a silicon-based substrate;
[0048] S2. The two-dimensional layered nanocrystalline material and the conjugated organic substance in different proportions are fully stirred in a solvent to obtain a mixed solution. The solvent can be an alkyl alcohol solvent such as isopropanol, ethanol, or deionized water; the concentration of the mixed solution is 1 mg / mL;
[0049] S3. Spin-coating a mixed solution of two-dimensional layered nanocrystalline materials and conjugated organics in different proportions onto the surface of the silicon-based substrate by a homogenizing spin coating method. In the homogenizing spin coating method, the spin coating speed is 1800~2000 rpm, and the spin coating time is 1 m...
Embodiment 1
[0061] (1) Take a certain amount of Bi 2 Te 3 Dry and weigh for later use. The optical image in bright field and dark field is like Figure 4a , Figure 4b , Scanning electron micrograph and Raman spectroscopy such as Figure 5a , Figure 5b Shown
[0062] (2) Soak the n-type silicon wafer in the diluted HF solution for at least 15 minutes, rinse with deionized water and blow dry with nitrogen, and put it in the glove box for later use;
[0063] (3) Combine PEDOT:PSS solution with Bi 2 Te 3 Mix well and stir, and then spin coat a layer of PEDOT:PSS-Bi on the silicon wafer at a speed of 2000 rpm 2 Te 3 The film is then annealed at 125℃;
[0064] (4) In PEDOT:PSS-Bi under high vacuum 2 Te 3 An Ag electrode with a thickness of 200nm is thermally vaporized on the thin film, and an Al electrode is thermally vaporized on the back of the silicon wafer;
[0065] At room temperature, use xenon lamp to simulate sunlight AM1.5, light intensity 100mWcm -2 Under the conditions, the short-circuit cu...
Embodiment 2
[0067] (1) Take a certain amount of Bi 2 Te 3 Dry and weigh for later use. The optical image in bright field and dark field is like Figure 4a , Figure 4b , Scanning electron micrograph and Raman spectroscopy such as Figure 5a , Figure 5b Shown
[0068] (2) Soak the n-type silicon wafer in the diluted HF solution for at least 15 minutes, then rinse with deionized water and blow dry with nitrogen, put it in the glove box, and use the two-step chlorination / alkylation method to treat the silicon The chip is methylated, that is, the silicon chip is first put into a saturated phosphorus pentachloride chlorobenzene solution at 110 ± 10 ℃ for 1 hour, and then passed through the chlorobenzene washing solution (2 times) and tetrahydrofuran washing solution (2 times) After cleaning, transfer to methyl magnesium chloride (CH 3 MgCl) in tetrahydrofuran solution (1M), let stand at 70±10℃ for 12h;
[0069] (3) Combine PEDOT:PSS solution with Bi 2 Te 3 Mix well and stir, and then spin coat a l...
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