Photocatalytic thin film on foam metal-graphene composite substrate and preparation method

A graphene composite, photocatalytic thin film technology, applied in catalyst activation/preparation, chemical instruments and methods, non-metallic elements, etc., can solve the problems of low solid solution photocatalytic efficiency, low Zn content, and large powder particle size.

Inactive Publication Date: 2018-02-02
秦永泽
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, there are some problems in this preparation method: First, due to the volatilization of Zn during the long-term high-temperature solid-state sintering process, the Zn content is low (1-xx Zn 1-x N x o 1-x The band gap of the solid solution is too large, which is not conducive to the absorption and utilization of visible light; secondly, the prepared Ga x Zn 1-x N x o 1-x Solid solution powder agglomeration is serious, the powder particle size is large, the size distribution is wide, and the specific surface area is very low. x Zn 1-x N x o 1-x The photocatalytic efficiency of solid solution is low; finally, since the catalyst is in powder form, it is difficult to recycle the powder during water catalysis, resulting in waste of catalyst
Chinese invention patent

Method used

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  • Photocatalytic thin film on foam metal-graphene composite substrate and preparation method
  • Photocatalytic thin film on foam metal-graphene composite substrate and preparation method
  • Photocatalytic thin film on foam metal-graphene composite substrate and preparation method

Examples

Experimental program
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Example Embodiment

[0035] Example 1, as attached figure 1 , 2 and 3.

[0036] One uses ECR-PEMOCVD equipment (patent number: ZL201210247144.8), muffle furnace equipment and radio frequency magnetron sputtering equipment to prepare "p-type g-C" on a foamed nickel-graphene composite substrate 3 N 4 / n type Ga 0.5 Zn 0.5 N 0.5 O 0.5 The continuous process steps of the heterogeneous PN junction visible light photocatalytic film are:

[0037] a. ECR-PEMOCVD method nitriding nickel foam-graphene composite substrate: select commercially available nickel foam-graphene composite with a length and width of 20mm×20mm, a thickness of 2mm, a pore size of 50μm, and a porosity of >97% The substrate, the composite substrate is a graphene layer loaded on the skeleton and inner wall of the foamed nickel matrix, the average thickness of the graphene layer is 0.67nm; the foamed nickel-graphene composite substrate is removed from the gloves of the ECR-PEMOCVD equipment The box is transferred to the sample loading chamber...

Example Embodiment

[0048] Example 2, as attached figure 1 , 2 and 3.

[0049] Step a to step e in Example 2 are exactly the same as Example 1, the difference is: in step b and step c, the ammonia flow is controlled to 15 sccm, the oxygen flow is controlled to 18 sccm, and the molar flow of trimethylgallium TMGa is controlled 2.8×10 - 6 mol / min, the molar flow rate of diethyl zinc DEZn is controlled to 7.7×10 -6 mol / min.

[0050] Using the above steps, the "p-type g-C" is prepared on a foamed nickel-graphene composite substrate with a length and width of 20mm×20mm. 3 N 4 / n type Ga 0.3 Zn 0.7 N 0.3 O 0.7 "Heterogeneous PN junction visible light photocatalytic film. Among them, Ga 0.3 Zn 0.7 N 0.3 O 0.7 The thickness of the buffer layer is 20nm; n-type Ga 0.3 Zn 0.7 N 0.3 O 0.7 The layer is a columnar nanocrystalline film with c-axis preferential orientation, the film thickness is 120nm, and the silicon doping concentration is 3×10 18 cm -3 , N-type Ga 0.3 Zn 0.7 N 0.3 O 0.7 The average lateral grain si...

Example Embodiment

[0052] Example 3, as attached figure 1 , 2 and 3.

[0053] Step a to step e in Example 3 are exactly the same as Example 1, except that: Step a uses commercially available ones with a length and width of 20mm×20mm, a thickness of 2mm, a pore size of 50μm, and a porosity of >97%. Foamed silver-graphene composite substrate, the composite substrate is a graphene layer supported on the skeleton and inner wall of the foamed silver matrix, the average thickness of the graphene layer is 0.67nm; and in step b and step c, ammonia The flow rate is controlled to 15sccm, the oxygen flow rate is controlled to 18sccm, and the molar flow rate of trimethylgallium TMGa is controlled to 2.8×10 -6 mol / min, the molar flow rate of diethyl zinc DEZn is controlled to 7.7×10 -6 mol / min.

[0054] Using the above steps, the "p-type g-C" is prepared on the foamed silver-graphene composite substrate with a length and width of 20mm×20mm. 3 N 4 / n type Ga 0.3 Zn 0.7 N 0.3 O 0.7 "Heterogeneous PN junction visibl...

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Abstract

The invention belongs to the technical field of photocatalytic thin film manufacturing, and provides a photocatalytic thin film on a foam metal-graphene composite substrate and a preparation method. Concretely, the preparation method comprises the steps of taking a foam metal-graphene composite material as a substrate, firstly using an electron cyclotron resonance-plasma enhancing metal organic matter CVD (chemical vapor deposition) method to successively perform nitrogen treatment of the foam metal-graphene composite substrate, preparation of a GaxZnl-xNxO1-x buffer layer and preparation of an n-type GaxZn1-xNxO1-x layer, then using a thermal polymerization method to prepare a p-type g-C3N4 layer, and finally using a magnetron sputtering method to prepare a precious metal nanometer granular layer. The prepared photocatalytic thin film has a very good visible light photocatalysis effect, can be used for photolyzing water to produce hydrogen, degrading organic pollutant in waste water,removing harmful gas and purifying air, and has a broad application prospect.

Description

technical field [0001] The invention belongs to the technical field of photocatalytic thin film manufacturing, and particularly relates to a photocatalytic thin film on a foamed metal-graphene composite substrate and a preparation method thereof. Specifically, the foamed metal-graphene composite material is used as a substrate, and electron cyclotron resonance is used first. -Plasma-enhanced metal-organic chemical vapor deposition (ECR-PEMOCVD) method sequentially nitridizes metal foam-graphene composite substrates and prepares Ga x Zn 1-x N x o 1-x buffer layer and preparation of n-type Ga x Zn 1-x N x o 1-x layer, followed by the preparation of p-type g-C using a thermal polymerization method 3 N 4 layer, and finally a noble metal nanoparticle layer was prepared using the magnetron sputtering method. Background technique [0002] Photocatalytic technology can use sunlight to drive some important chemical reactions, such as photolysis of water to produce hydrogen, ...

Claims

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Application Information

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IPC IPC(8): B01J27/24B01J37/34C01B3/04
CPCB01J27/24B01J35/0013B01J35/004B01J35/006B01J35/065B01J37/341B01J37/342C01B3/042Y02E60/36
Inventor 秦永泽
Owner 秦永泽
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