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Discharge gap control system and control method for wire electric discharge cutting single crystal silicon

An EDM wire and discharge gap technology, applied in circuits, manufacturing tools, electric machining equipment, etc., can solve problems such as relatively few research strategies and algorithms for real-time adjustment

Active Publication Date: 2020-06-26
XIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] At present, the research on the EDM of single crystal silicon materials focuses on the influence process of the process parameters of the discharge process on the process target, and controls the electrical parameters of the process, such as voltage and current, so that it is in the normal state control stage of spark discharge. , there are relatively few researches on strategies and algorithms for real-time adjustment of discharge gap by real-time online process parameter control. The author believes that the actual EDM cutting process of single crystal silicon must be the result of simultaneous action of mechanical and electrical parameters

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  • Discharge gap control system and control method for wire electric discharge cutting single crystal silicon
  • Discharge gap control system and control method for wire electric discharge cutting single crystal silicon
  • Discharge gap control system and control method for wire electric discharge cutting single crystal silicon

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Embodiment Construction

[0086] The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0087] The present invention is a discharge gap control system for wire electric discharge cutting single crystal silicon, such as figure 1 As shown, it includes a DK7740 wire-cut electric discharge machine tool 1 and a pulse power supply 2. The monocrystalline silicon workpiece and the cutting wire of the wire-cut electric discharge machine tool 1 are respectively connected to the positive pole and the negative pole of the pulse power supply 2, and the single-crystal silicon workpiece of the wire-cut electric discharge machine tool 1 A YK86HB80-04A-type stepping motor 3 and a YKA2608MC-type motor driver 4 are sequentially installed in the feeding direction of the crystalline silicon workpiece, and the motor driver 4 is connected to a NI-USB 6251 multifunctional data collector 6 and a computer through an AD converter 5 in turn. 7. Sampling re...

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Abstract

The invention discloses a discharging gap control system for wire electrical discharging machining monocrystalline silicon. The discharging gap control system comprises a wire electrical discharging machining machine tool and a pulsed power supply, wherein a monocrystalline silicon workpiece and a cutting line of the wire electrical discharging machining machine tool are connected onto the anode and the cathode of the pulsed power supply separately; a stepping motor and a motor driver are sequentially arranged in the feeding direction of the monocrystalline silicon workpiece of the wire electrical discharging machining machine tool; the motor driver is sequentially connected with a data acquisition unit and computer through an AD converter; the discharging loop of the wire electrical discharging machining machine tool is connected with a sampling resistor in series; and the sampling resistor is connected with the AD converter, so that the spark discharge gap is kept within a reasonablerange during the machining process, generation of an open circuit or a short circuit is avoided and the surface quality of the monocrystalline silicon workpiece is improved. A discharging gap controlmethod has significance for realizing wire electrical discharging machining of a monocrystalline silicon semiconductor and obtaining excellent wafer surface processing quality and processing efficiency.

Description

technical field [0001] The invention belongs to the technical field of high-precision special processing and manufacturing, and relates to a discharge gap control system for wire electric discharge cutting single crystal silicon, and also relates to a discharge gap control method for wire electric discharge cutting single crystal silicon using the discharge gap control system . Background technique [0002] As an important semiconductor material, monocrystalline silicon is widely used in large-scale integrated circuit manufacturing, microelectronic components and other fields due to its good high temperature resistance and radiation resistance, and is therefore considered the cornerstone of the modern information society. Although silicon material is only the first generation semiconductor material, due to the abundant reserves of mineral resources containing silicon on the earth, and single crystal silicon is the single crystal with the largest diameter, the most perfect pr...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B23H7/02B23H7/18B23H7/20
CPCB23H7/02B23H7/18B23H7/20
Inventor 李淑娟路雄辛彬李斯文
Owner XIAN UNIV OF TECH
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