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Picoliter-magnitude ultramicro-amount injector based on patterned surface and preparation method thereof

A patterned surface and ultra-micro-volume technology, applied in the field of material science, can solve the problems of complex preparation process, difficulty in micro-fluidic device manipulation, high cost of digital micro-fluidics, etc., to achieve simple preparation process, simplified processing difficulty, and operation simple effect

Active Publication Date: 2019-04-12
JILIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, a variety of microfluidic devices for obtaining quantitative ultra-micro-volume liquids have been reported, such as digital microfluidics and liquid microfluidics, but such microfluidic devices are difficult to achieve precise ultra-micro-volume liquid manipulation, and the cost of digital microfluidics is relatively High, and the preparation process is relatively complicated, which is contrary to the simple, cheap and efficient characteristics of microfluidics

Method used

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  • Picoliter-magnitude ultramicro-amount injector based on patterned surface and preparation method thereof
  • Picoliter-magnitude ultramicro-amount injector based on patterned surface and preparation method thereof
  • Picoliter-magnitude ultramicro-amount injector based on patterned surface and preparation method thereof

Examples

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Embodiment 1

[0035] Embodiment 1: the preparation of hydrophilic substrate

[0036] The substrate used is a single crystal silicon wafer (100). Cut the substrate to a size of 3cm in length and 2cm in width with a glass knife, and place it in acetone, ethanol and deionized water for three times for ultrasonication, each time for 1-2 minutes, and then put the mass fraction 98% concentrated sulfuric acid and a mass fraction of 30% hydrogen peroxide mixed solution (volume ratio is 7:3) in a water bath heated to 120 ° C, kept for 5 hours to obtain a hydrophilic substrate; then pour the mixed acid solution into the waste In the liquid bottle, the obtained substrate was repeatedly ultrasonically washed 5 times with deionized water, each time for 1-2 minutes, and stored in deionized water for later use.

Embodiment 2

[0037] Example 2: Preparation of patterned photoresist array structure substrate

[0038] The silicon wafer was cleaned in an oxygen plasma cleaning machine for 5 minutes, and then a layer of photoresist was spin-coated on the silicon wafer surface (the spin-coating condition was 3000rpm, 60s); UV exposure under the template for 10-30s, UV exposure for 14s, and then immerse the silicon wafer in a special developer solution for 30s to obtain a patterned photoresist surface. According to the required liquid volume and range, we designed a Responsive strip mask, different photolithographic mask patterns, we get a variety of patterned photoresist surfaces with different patterns and matching with a variety of chip microchannels; wherein, the patterned microstructure array mask is Chromium layer patterned and film-printed array of micron-scale stripes.

Embodiment 3

[0039] Example 3: Preparation of Hydrophobic Patterned Silicon Structure Array Structure Substrate

[0040] Place the patterned photoresist array structure substrate obtained in Example 2 in the cavity of a plasma etching machine, and the etching time is 10min (the etching pressure is 6mTorr, the etching temperature is 10°C, the etching power is 50W for RF, and the ICP 100W); then place the substrate in absolute ethanol for ultrasonic cleaning for 10 minutes to remove residual photoresist on the surface, then ultrasonically clean it with deionized water for 5 minutes, and dry it with nitrogen; place the obtained substrate in an oxygen plasma cleaning machine The surface of the substrate was cleaned with hydroxyl groups for 5 minutes, and then the surface of the substrate was grafted with 1H, 1H, 2H, 2H-perfluorooctyltrichlorosilane by vapor deposition to obtain a hydrophobic patterned silicon structure array. Depending on the resist pattern, we can obtain patterned silicon str...

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Abstract

The invention discloses a picoliter-magnitude injector based on a patterned surface and a preparation method thereof, and belongs to the technical field of materials science. The method of the invention relates to lithography technology, combines a plasma etching method to prepare a micron patterned structure array of a silicon wafer surface, and carries out surface modification on the patterned structure through vapor deposition technology, combines a glass microchannel, and is then further used for acquisition of ultramicro-amount liquid. The ultramicro-amount injector of the invention can realize accurate continuous picoliter-magnitude acquisition of multiple types of liquid, and acquisition processes of the liquid have very good stability and repeatability. Picoliter-magnitude liquid droplet acquisition failure caused by collapsing of the small micron channel is avoided through combination with the channel of glass material. Realization of fluid acquisition in the ultramicro-amountinjector relies on regulation on a gas-liquid-solid three-phase line of a substrate structure, a chip is made by glass and silicon material, errors caused by collapsing of the channel on liquid acquisition do not exist, and a liquid acquisition accuracy rate of the injector is up to more than 98%.

Description

technical field [0001] The invention belongs to the technical field of material science, and in particular relates to a picoliter level syringe based on a patterned surface and a preparation method thereof. Background technique [0002] The precise control of ultra-micro liquid volume has a wide range of applications in the fields of clinical diagnosis, drug analysis, cell culture and single cell direct injection of drugs (Richard Pariza, Chem.Rev.2006, 106, 2990-3001; SamuelK.Sia, Lab Chip ,2012,12,2118–2134), however, in order to realize the practical application and commercialization of this ultra-microinjection technology, there are still many problems to be solved urgently. Liquids on the order of picoliters should be confined within the space of small microns. People have successively proposed methods such as array microwell substrates, microneedle tip extrusion direct acquisition and microfluidics to achieve the acquisition of picoliter orders of liquid droplets. Amon...

Claims

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Application Information

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IPC IPC(8): B81B7/04B81C1/00
CPCB81B7/04B81C1/00031B81C1/00436
Inventor 张俊虎于年祚杨柏
Owner JILIN UNIV
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