System for treating dust-containing tail gas

A technology for exhaust gas and dust, which is applied in the field of systems for processing dust-containing exhaust gas, can solve the problems of long time to determine the position of broken bags, high risk, difficult to filter, etc., to avoid poor sealing and prolong the operation period.
CN111167301APending Publication Date: 2020-05-19CHINA ENFI ENGINEERING CORPORATION +1
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
CHINA ENFI ENGINEERING CORPORATION
Publication Date
2020-05-19

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Abstract

The invention discloses a system for treating dust-containing tail gas; the system comprises a combustion-dust removal-dust collection device, which comprises a combustion section, which is provided with a dust-containing tail gas inlet, a combustion support gas inlet, and a heat source; a dust removal section, which is connected with the combustion section and provided with an annular pipe, wherein a plurality of holes facing the inner wall of the dust removal section are evenly distributed in the circumferential direction of the annular pipe; a dust collection section, which is connected with the dust removal section and provided with filler, a liquid atomizer and a dust-collected gas outlet, wherein the liquid atomizer is located above the filler, and the dust-collected gas outlet is located above the liquid atomizer; a slurry outlet which is connected with the dust removal section and the dust collection section; a pH regulating device, which is provided with a slurry inlet, a slurry outlet after slurry mixing, a pH regulator inlet and a pH detector, and the slurry outlet extends below the liquid level of the pH regulating device; a liquid-solid separation device, which is provided with a filter element, a mixed slurry inlet, a slag slurry outlet and a filtered liquid outlet, and the filtered liquid outlet is connected with the ring pipe and the liquid atomizer; and a gaspurification device, which is provided with an adsorption layer, a dust-collected gas inlet and a purified gas outlet.
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Description

technical field

[0001] The invention belongs to the technical field of tail gas treatment, in particular, the invention relates to a system for treating dust-laden tail gas. Background technique

[0002] In the manufacturing process of integrated circuits and LED panels, a variety of silicon-containing substances are used in chemical vapor deposition, such as trichlorosilane, dichlorodihydrosilane, silane, disilane, ethyl orthosilicate, octamethyl Cyclotetrasiloxane, polysilazane, tetramethylsilane, trimethylsilane, etc.; in the manufacturing process of optical fiber preform, the main raw material used in vapor deposition is silicon tetrachloride. After these gases participate in the reaction, the Exhaust gas is discharged in the form of tail gas, and at the same time, the above-mentioned gas will also generate tail gas during the filling and replacement process. The above-mentioned poisonous and harmful gases used as process raw materials or reaction by-products, some of w...

Claims

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