Preparation method of anti-pollution polyamide reverse osmosis membrane
A technology of reverse osmosis membrane and polyamide, applied in semi-permeable membrane separation, chemical instruments and methods, osmosis/dialysis water/sewage treatment, etc., can solve the problem of loss of anti-pollution performance, hydrophilic coating peeling off, and lack of bonding To achieve long-term stable anti-pollution performance, accelerate production, and ensure desalination effect
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Embodiment 1
[0038] A method for preparing anti-contaminated polyamide reverse osmosis membrane, including the steps of:
[0039] 1) The polysulfone content is 20% of the polysulfone / nitrohydropylolidone cast film solution, completely dissolved at room temperature, depressing, and then coagulated by 20 ° C solidifying bath by 20 ° C, control the base film after the decismation is completed. The thickness is 5 mil, and it is placed in pure water after the cutting.
[0040] 2) Separating the above-mentioned base membrane in aqueous phase containing 2% amine diamine, 0.02% sodium hydroxide, and the soaking time is 1 min, and the dry film surface is blown after soaking, then soaked in a phenyl benzene containing 0.1% benzene. Among the cyclohexane of trimethyl chloride, the soaking time was 30s, and the reaction was completed, pure water rinsing was carried out, and the anti-contaminated polyamide reverse osmosis membrane was dried at 70 ° C.
Embodiment 2
[0042] A method for preparing anti-contaminated polyamide reverse osmosis membrane, including the steps of:
[0043] 1) The polysulfone / nitrohydropylolidone cast film solution is prepared, and an aniline monomer having an aniline monomer having a mold liquid mass is mixed with a nitrohydrrolidone before formulation, and then polysulfone is subjected to soaking, and Surmelt, slowly add 0.05% ammonium sulfate and 0.1% hydrochloric acid by 0.05%, completely dissolved at room temperature, and a base film is obtained by solidifying bath by 20 ° C, the control base film is 5 mils. Place the pure water after the cutting end;
[0044] 2) Separating the above-mentioned base membrane in a water phase solution containing 2% amine diamine, 0.02% sodium hydroxide, 1% DMAC, the soaking time is 1 min, and the dry film surface is blown after soaking, then soaked in Among the cyclohexane of 0.1% phenyl chloride, the soaking time is 30s, and the reaction is completed, pure water rinsing, drying a...
Embodiment 3
[0046] A method for preparing anti-contaminated polyamide reverse osmosis membrane, including the steps of:
[0047] 1) The polysulfone / nitrohydrophiltanone cast film solution is prepared, and a benzide monomer having a water mass of the cast film liquid is mixed with a nitrohydrrolidone before formulation, and then polysulfone is subjected to soaking, and then adding polysulfone, and Slowly add 0.3% hydrochloric acid from 0.15% of the cast film solution during immersion process, completely dissolved at room temperature to stand depoosure, and the base film is formed by coagulation bath points by 20 ° C, and the thickness of the base film is 5 mil. Place the pure water after the cutting end;
[0048] 2) Soak the above-mentioned base membrane in a water phase solution containing 2% amine diamine, 0.02% sodium hydroxide, 2% DMAC, and the soaking time is 1 min, and the dry film surface is blown after soaking, then soaked in it. Among the cyclohexane of 0.1% phenyl chloride, the soa...
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