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Water-based organic nano ink applied to organic thin-film device and preparation method thereof

An organic thin film and nano ink technology, applied in the field of water-based organic nano ink and its preparation, can solve the problems of agglomeration of nano silver ion particles, reduce the use of protective agents, etc., achieve high specific surface area, enhance thermal stability, and facilitate absorption and scattering effects

Inactive Publication Date: 2021-10-22
深创高新产业研究中心(深圳)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It not only improves the ink's ability to absorb ultraviolet light, but also enhances the curing efficiency and solves the problem of agglomeration of nano-silver ion particles, and also reduces the use of protective agents

Method used

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  • Water-based organic nano ink applied to organic thin-film device and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] A preparation method of a water-based organic nano-ink applied to an organic thin film device, comprising the following steps:

[0032] (1) Mix 50g of silver neodecanoate, 1g of block copolymer P123, 100g of tetraethyl orthosilicate, 6g of hydrazine hydrate, 250g of xylene and 250g of ethanol, then place the mixed solution at 24°C for constant magnetic stirring, and use Adjust the pH of the mixed solution with oxalic acid solution until the pH of the mixture is between 3-4, continue to stir for 0.5h, carry out hydrothermal reaction for 24h after the stirring is completed, and sinter at 300°C for 50min after the completion of the reaction to obtain silver-containing porous nano-SiO 2 ;

[0033] (2) in 300mlN, add the porous nanometer SiO of 100g step (1) gained in N dimethyl formamide 2 and 120g of toluene diisocyanate, the mixed solution was placed in a nitrogen atmosphere, and modified at 70°C for 3 hours. After the treatment, the solvent was removed by centrifugation...

Embodiment 2

[0039] A preparation method of a water-based organic nano-ink applied to an organic thin film device, comprising the following steps:

[0040] (1) Mix 60g of silver neodecanoate, 1g of block copolymer P123, 100g of orthosilicate ethyl ester, 6g of hydrazine hydrate, 250g of xylene and 250g of ethanol, then place the mixed solution under constant temperature magnetic stirring at 24°C, and use Adjust the pH of the mixed solution with oxalic acid solution until the pH of the mixture is between 3-4, continue to stir for 0.5h, carry out hydrothermal reaction for 24h after the stirring is completed, and sinter at 300°C for 50min after the completion of the reaction to obtain silver-containing porous nano-SiO 2 ;

[0041] (2) in N, N dimethyl formamide, add the porous nanometer SiO of 100g step (1) gained 2 and 130 g of toluene diisocyanate, the mixed solution was placed in a nitrogen atmosphere, modified at 80 ° C for 4 hours, after the treatment was completed, the solvent was remo...

Embodiment 3

[0047] A preparation method of a water-based organic nano-ink applied to an organic thin film device, comprising the following steps:

[0048] (1) Mix 70g of silver neodecanoate, 1g of block copolymer P123, 100g of orthosilicate ethyl ester, 6g of hydrazine hydrate, 250g of xylene and 250g of ethanol, then place the mixed solution under constant temperature magnetic stirring at 24°C, and use Adjust the pH of the mixed solution with oxalic acid solution until the pH of the mixture is between 3-4, continue to stir for 0.5h, carry out hydrothermal reaction for 24h after the stirring is completed, and sinter at 300°C for 50min after the completion of the reaction to obtain silver-containing porous nano-SiO 2 ;

[0049] (2) in N, N dimethyl formamide, add the porous nanometer SiO of 100g step (1) gained 2 and 145g of toluene diisocyanate, the mixed solution was placed in a nitrogen atmosphere, and modified at 80°C for 5h. After the treatment was completed, the solvent was removed ...

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Abstract

The invention belongs to the technical field of plastic electronic technology and industry, and particularly relates to water-based organic nano ink applied to an organic thin film device and a preparation method thereof. Silver neodecanoate is used as a precursor, a block copolymer P123 is used as a template, tetraethoxysilane is used as a silicon source, and a hydrothermal reaction is performed to prepare silver porous nano SiO2; the surface of the porous nano silicon is modified, and a grafted o-hydroxybenzotriazole functional group and a triazine functional group are covalently bonded, so that the absorption capacity of the ink to ultraviolet light is improved, the curing efficiency is enhanced, the problem of agglomeration of nano silver ion particles is solved, and the use of a protective agent is reduced.

Description

technical field [0001] The invention belongs to the field of plastic electronics technology and industrial technology, and in particular relates to a water-based organic nano-ink applied to organic thin film devices and a preparation method thereof. Background technique [0002] Compared with the traditional organic solvent processing method, the organic thin film optoelectronic devices processed by water-based solution have the advantages of environmental protection and low cost, and have been paid attention to. At the same time, the use of water-based organic nano-inks abandons the chlorine-containing and aromatic solvents in traditional technologies, and does not harm or poison the natural environment, so it has great practical value. The water-based nano-ink is compatible with screen printing, inkjet printing, spin coating, doctor blade coating, and continuous roll-to-roll processing. Its process is simple and can be applied to mass production. Compatible with a variety...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09D11/03C09D11/107C09D11/38
CPCC09D11/03C09D11/107C09D11/38
Inventor 任嵬李鹏龙杰吴苏州
Owner 深创高新产业研究中心(深圳)有限公司