Preparation method of epoxy group-containing phthalonitrile monomer

A technology of epoxy-based phthalonitrile and phenolic hydroxyl phthalonitrile, which is applied in the field of preparation of epoxy-containing phthalonitrile monomers, and can solve the limitations on the application and curing of phthalonitrile resins Poor toughness, high curing temperature and other problems, to achieve the effect of reducing production cost, lowering melting point, and simplifying the synthesis process
CN113683585AActive Publication Date: 2021-11-23QILU UNIV OF TECH

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
QILU UNIV OF TECH
Publication Date
2021-11-23

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Abstract

The invention discloses a preparation method of an epoxy group-containing phthalonitrile monomer, and relates to the technical field of organic synthesis. The method comprises the following steps: blending phenolic hydroxyl group-containing phthalonitrile and epoxy halopropane serving as raw materials in alkali liquor for a reaction under the catalysis of quaternary ammonium salt to obtain a mixed solution of an epoxy group-containing phthalonitrile monomer, and purifying the mixed solution to obtain the epoxy group-containing phthalonitrile monomer. According to the invention, the melting temperature of the phthalonitrile monomer is reduced, and the processing window of phthalonitrile is widened, so the application field of phthalonitrile resin is expanded.
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Description

technical field

[0001] The invention discloses a preparation method, relates to the technical field of organic synthesis, in particular to a preparation method of epoxy group-containing phthalonitrile monomer. Background technique

[0002] Phthalonitrile resin is widely used because of its excellent high temperature resistance, high flame retardancy, high carbon residue rate, low water absorption, good mechanical properties and excellent high glass transition temperature, unique optical and electrical properties Used in coatings, adhesives, high temperature resistant material matrix resin and other fields. However, due to the rigidity of the phthalonitrile monomer skeleton, it is easy to cause defects such as high monomer melting point, narrow processing window, high curing temperature, and poor toughness of the cured product during the processing of the phthalonitrile resin. The defects of the phthalonitrile resin caused by the easy decomposition of the curing agent at hig...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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