Pattern transfer by solid state electrochemical stamping
Patent Information
- Authority / Receiving Office
- US · United States
- Current Assignee / Owner
- THE BOARD OF TRUSTEES OF THE UNIV OF ILLINOIS
- Publication Date
- 2007-09-20
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT
[0001] This invention was made, at least in part, with United States governmental support awarded by National Science Foundation under contract number DMI-0328162. The United States government has certain rights in this invention.CROSS-REFERENCE TO RELATED APPLICATIONS
[0002] Not Applicable. BACKGROUND OF THE INVENTION
[0003] The use of solid state ionic conductors allows for nano-scale patterning and stamping by highly localized electrochemical etching and deposition. When an electric field is applied by two electrodes in contact with a material that exhibits ionic conduction, the metal ions near one of the electrodes migrate through the bulk of the ionic conductor, and, upon receiving electrons at the counter electrode, reduce back to metal atoms precipitating at the interface. Alternatively, under a reverse potential, a counter electrode of the metal is etched. By nano-patterning the contact between the electrode and...