Alkali soluble resin, photosensitive resin composition containing it and application thereof

A photosensitive resin, soluble technology, applied in the field of photosensitive resin composition, can solve the problems of residue, limiting self-leveling of photoresist glue, high viscosity of the system, etc.

Active Publication Date: 2013-01-16
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At the same time, in order to improve the developing efficiency of color filters, more high-viscosity alkali-soluble resins are often added to the formula of the raw material color photoresist, but this will lead to excessive viscosity of the syst

Method used

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  • Alkali soluble resin, photosensitive resin composition containing it and application thereof
  • Alkali soluble resin, photosensitive resin composition containing it and application thereof
  • Alkali soluble resin, photosensitive resin composition containing it and application thereof

Examples

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Effect test

Embodiment 1

[0059] The photosensitive resin composition of the present invention contains following components:

[0060] 100 parts by weight of alkali-soluble resin, 100 parts by weight of epoxy acrylate polymer, 100 parts by weight of pigment P.R.179, 100 parts by weight of dispersant BYK-110, 14 parts by weight of photoinitiator benzoyl isopropyl ether, 800 parts by weight of propylene glycol Monoethyl ether, 3 parts by weight of silane coupling agent.

[0061] Mix the above components uniformly to obtain a photosensitive resin composition.

[0062] Wherein, the preparation method of alkali-soluble resin is as follows:

[0063] 30g of maleic anhydride, 30g of styrene, 35g of benzyl acrylate, and 8g of initiator AIBN were mixed and reacted at 60°C for 4h, and the reaction product was stirred and refluxed in 150g of propylene glycol monoethyl ether solvent at 75°C, and placed in Add 12g of vinyl-terminated polydimethylsiloxane dropwise at a speed of 2-3 seconds during the stirring proce...

Embodiment 2

[0068] The photosensitive resin composition of the present invention contains following components:

[0069] 150 parts by weight of alkali-soluble resin, 100 parts by weight of polyurethane acrylate polymer, 100 parts by weight of phthalocyanine blue pigment, 100 parts by weight of dispersant BYK-170, 14 parts by weight of photoinitiator benzoyl isopropyl ether, 740 parts by weight of cyclo Hexane, 3 parts by weight of silane coupling agent.

[0070] Mix the above components uniformly to obtain a photosensitive resin composition.

[0071] Wherein, the preparation method of alkali-soluble resin is as follows:

[0072] 10g of maleic anhydride, 45g of styrene, 20g of benzyl acrylate, and 6.8g of initiator BPO were mixed and reacted at 90°C for 4h, and the reaction product was stirred and refluxed in 150g of cyclohexane solvent at 70°C, and Add 13g of vinyl-terminated polydimethylsiloxane dropwise at a speed of 2-3 seconds during stirring, adjust the temperature to 115°C after 2...

Embodiment 3

[0075] The photosensitive resin composition of the present invention contains following components:

[0076] 370 parts by weight of alkali-soluble resin, 120 parts by weight of pentaerythritol tetraacrylate, 100 parts by weight of pigment C.I. green pigment, 100 parts by weight of dispersant BYK-171, 20 parts by weight of photoinitiator benzoyl isopropyl ether, 850 parts by weight of ethylene glycol Alcohol monoethyl ether, 3 parts by weight of silane coupling agent.

[0077] Mix the above components uniformly to obtain a photosensitive resin composition.

[0078] Wherein, the preparation method of alkali-soluble resin is as follows:

[0079] Mix 10g of maleic anhydride, 45g of styrene, 20g of benzyl acrylate, and 6.8g of initiator BPO to react at 60°C for 5h, and stir and reflux the reaction product in 150g of ethylene glycol monoethyl ether solvent at 75°C , and add 12g of vinyl-terminated polydimethylsiloxane dropwise at a speed of 2-3 seconds during the stirring process,...

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Abstract

The invention discloses an alkali soluble resin and its preparation method. The alkali soluble resin has a chemical structural formula shown in formula 1, wherein a is an integer ranging from 1 to 5, b is an integer ranging from 1 to 5, c is an integer ranging from 1 to 10, d is an integer ranging from 1 to 10, m is an integer ranging from 1 to 30, n is an integer ranging from 1 to 10, and R is hydrogen, alkyl, alkoxy or an acrylic group. The alkali soluble resin has a weight-average molecular weight of 3500-35000. The invention also discloses a photosensitive resin composition containing the alkali soluble resin, and a color photoresist glue that contains the photosensitive resin composition and is used for color filters, as well as a display device containing the color photoresist glue, which has the advantage of a level and smooth coating surface.

Description

technical field [0001] The invention belongs to the field of liquid crystal display, and in particular relates to an alkali-soluble resin, a photosensitive resin composition containing the alkali-soluble resin and applications thereof. Background technique [0002] The raw material for preparing the color filter of a liquid crystal display is a colored negative photoresist, which is coated on the surface of a glass substrate and then produced through a process of pre-baking-exposure-development-post-baking. [0003] One of the color negative photoresists is a color photoresist. In order to achieve higher resolution and more vivid color effects, the surface of the color photoresist is required to be dense and flat. However, during the production process, due to various reasons, surface defects such as orange peel, shrinkage cavity, and Bernard swirl will occur on the surface, resulting in uneven coating and seriously affecting the display effect. [0004] The general treatm...

Claims

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Application Information

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IPC IPC(8): C08F290/06C08F220/18C08F212/08C08F222/08C08F230/08C08F2/38G03F7/075G02B5/20G02F1/1335
CPCG02B5/20G03F7/033G03F7/075C08F212/08C08F230/08C08F283/124C08F222/08C08F2/38G03F7/0007C08F290/06G03F7/0758G02F1/1335C08L33/064C08F220/18G03F7/0384G03F7/0388C08F290/068C08F299/08C08F220/1807C08F222/06C08F230/085C08F222/104
Inventor 舒适周春苗薛建设赵吉生王雪岚田肖雄
Owner BOE TECH GRP CO LTD
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