Alkali soluble resin, photosensitive resin composition containing it and application thereof
A photosensitive resin, soluble technology, applied in the field of photosensitive resin composition, can solve the problems of residue, limiting self-leveling of photoresist glue, high viscosity of the system, etc.
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Embodiment 1
[0059] The photosensitive resin composition of the present invention contains following components:
[0060] 100 parts by weight of alkali-soluble resin, 100 parts by weight of epoxy acrylate polymer, 100 parts by weight of pigment P.R.179, 100 parts by weight of dispersant BYK-110, 14 parts by weight of photoinitiator benzoyl isopropyl ether, 800 parts by weight of propylene glycol Monoethyl ether, 3 parts by weight of silane coupling agent.
[0061] Mix the above components uniformly to obtain a photosensitive resin composition.
[0062] Wherein, the preparation method of alkali-soluble resin is as follows:
[0063] 30g of maleic anhydride, 30g of styrene, 35g of benzyl acrylate, and 8g of initiator AIBN were mixed and reacted at 60°C for 4h, and the reaction product was stirred and refluxed in 150g of propylene glycol monoethyl ether solvent at 75°C, and placed in Add 12g of vinyl-terminated polydimethylsiloxane dropwise at a speed of 2-3 seconds during the stirring proce...
Embodiment 2
[0068] The photosensitive resin composition of the present invention contains following components:
[0069] 150 parts by weight of alkali-soluble resin, 100 parts by weight of polyurethane acrylate polymer, 100 parts by weight of phthalocyanine blue pigment, 100 parts by weight of dispersant BYK-170, 14 parts by weight of photoinitiator benzoyl isopropyl ether, 740 parts by weight of cyclo Hexane, 3 parts by weight of silane coupling agent.
[0070] Mix the above components uniformly to obtain a photosensitive resin composition.
[0071] Wherein, the preparation method of alkali-soluble resin is as follows:
[0072] 10g of maleic anhydride, 45g of styrene, 20g of benzyl acrylate, and 6.8g of initiator BPO were mixed and reacted at 90°C for 4h, and the reaction product was stirred and refluxed in 150g of cyclohexane solvent at 70°C, and Add 13g of vinyl-terminated polydimethylsiloxane dropwise at a speed of 2-3 seconds during stirring, adjust the temperature to 115°C after 2...
Embodiment 3
[0075] The photosensitive resin composition of the present invention contains following components:
[0076] 370 parts by weight of alkali-soluble resin, 120 parts by weight of pentaerythritol tetraacrylate, 100 parts by weight of pigment C.I. green pigment, 100 parts by weight of dispersant BYK-171, 20 parts by weight of photoinitiator benzoyl isopropyl ether, 850 parts by weight of ethylene glycol Alcohol monoethyl ether, 3 parts by weight of silane coupling agent.
[0077] Mix the above components uniformly to obtain a photosensitive resin composition.
[0078] Wherein, the preparation method of alkali-soluble resin is as follows:
[0079] Mix 10g of maleic anhydride, 45g of styrene, 20g of benzyl acrylate, and 6.8g of initiator BPO to react at 60°C for 5h, and stir and reflux the reaction product in 150g of ethylene glycol monoethyl ether solvent at 75°C , and add 12g of vinyl-terminated polydimethylsiloxane dropwise at a speed of 2-3 seconds during the stirring process,...
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