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Low-magnification polysiloxane compound containing mercapto multifunctional group and its composition and imprinted soft template

A technology of polysiloxane and compound, which is applied in the direction of photolithography of silicon organic compound, patterned surface, and nanotechnology for information processing, etc., which can solve the problem of limited use of soft templates and affect the precision of soft templates , Low moisture resistance of epoxy resin and other problems, to achieve the effect of easy repeated imprinting, high resistance to oxygen etching, and easy spin coating

Inactive Publication Date: 2015-11-25
SHANGHAI JIAOTONG UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are relatively few studies on the use of POSS compounds in the manufacture of imprinted soft templates in the prior art. At the same time, based on some defects of the existing UV photoresists themselves, such as acrylate photoresists, even if POSS compounds are introduced, it is still not possible. Avoid the disadvantages of oxygen inhibition, resulting in edge-shaped defects on the surface of graphics, and the low shrinkage of acrylates, which affects the precision of soft templates; and epoxy resin photoresists, due to their high Generally, it cannot be directly used as a soft template. It is necessary to modify the fluorine-containing groups on the graphic surface to reduce the surface energy, and the process is cumbersome.
At the same time, due to the low moisture resistance of epoxy resin and the defects of heat-induced yellowing, the number of times the soft template can be used is bound to be greatly limited.

Method used

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  • Low-magnification polysiloxane compound containing mercapto multifunctional group and its composition and imprinted soft template
  • Low-magnification polysiloxane compound containing mercapto multifunctional group and its composition and imprinted soft template
  • Low-magnification polysiloxane compound containing mercapto multifunctional group and its composition and imprinted soft template

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Experimental program
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preparation example Construction

[0062] The present invention relates to the preparation method of the polysiloxane compound of the multifunctional group containing mercapto group shown in general formula (1), and this method comprises the following steps successively:

[0063] Step (1) can be according to the recognized technique as follows [1，2] To prepare:

[0064] That is, add silane monomer or its mixture and concentrated hydrochloric acid into a one-necked flask with a magnetic stirrer in sequence, then add a certain amount of methanol solvent to dissolve it, heat and reflux for a period of time, let it stand still, and filter off the upper layer clear liquid to obtain a milky white product, dissolve the milky white product with dichloromethane, then add excess methanol solvent to settle the product, repeat three times, use rotary evaporation, and evaporate the solvent to obtain a purified mercapto-containing low polysiloxane compound (referred to as POSS-SH).

[0065] The silane monomers used in the ...

Embodiment 1

[0121] Embodiment 1 The preparation of the low multiple polysiloxane compound (POSS-SH) containing mercapto group

[0122] Take 15.0ml of (3-mercaptopropyl)trimethoxysilane (TPS), 30ml of concentrated hydrochloric acid (37% mass concentration) in a single-necked flask with a magnetic stirrer, and measure 350ml of methanol solvent for dissolution. The mixture was stirred and refluxed at 90°C for 24 hours, left to stand, and the supernatant liquid was filtered off to obtain a milky white product. After dissolving the milky white product with dichloromethane, an excess of methanol was added to precipitate the product. After repeated three times, rotary steaming was performed. The dry solvent obtains the low polysiloxane compound (abbreviated as POSS-SH) containing mercapto group of purified product (see figure 1 (a)).

Embodiment 2

[0123] Example 2 Grafting 1H, 1H, 2H, the cage octapoly (γ-mercaptopropyl) silsesquioxane (referred to as POSS-SCFA) formed after 2H-perfluorooctyl acrylate 6 -SH) Preparation

[0124] With the POSS-SH that embodiment 1 makes and 1H, 1H, 2H, 2H-perfluorooctyl alcohol acrylate (being called for short CFA 6 ) in order to add in the dichloromethane of the airtight reagent bottle with magnetic stirrer, wherein POSS-SH and CFA 6 The molar ratio is 1:4, and the initiator I-907 accounts for 5‰ of the total mass of the entire reaction system. It is stirred and reacted under a 365nm ultraviolet lamp for 6 hours, and an excessive amount of n-hexane is added to allow it to settle. After standing still, filter out In the supernatant, the resulting transparent product was dissolved in dichloromethane, and then excessive n-hexane was added to precipitate out. After repeated three times, the solvent was evaporated to dryness by rotary evaporation to obtain the purified product cage octamer ...

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Abstract

Provided are a polyhedral oligomeric silsesquioxane compound containing mercapto polyfunctional group shown as general formula (1), its composition used for preparing the soft template for imprinting and the imprinting process, wherein R1 is -CH2-CH2-CH2-SH, and m represents the integer of 3 to 12; R2 is unsubstituted or substituted alkyl group, unsubstituted or substituted alkoxy, unsubstituted or substituted ester group, and unsubstituted or substituted aryl group respectively, and the said substituent group is halogen; n represents the integer of 1 to 12. The composition is a high hydrophobic photoresist. When the composition is applied to prepare nanoimprinting template, a high precision structure can be achieved and the recycling rate of the template may be improved.

Description

technical field [0001] The invention belongs to the field of micro-nano processing in microelectronics and nanoelectronics, and relates to a polyhedral oligomeric silsesquioxane compound containing a mercapto is POSS") and its composition for preparing imprinted soft templates and imprinted soft templates. Background technique [0002] Nanoimprint lithography is considered to be one of the most promising next-generation lithography technologies. Based on its mechanical imprinting principle, the graphic resolution that nanoimprinting technology can achieve exceeds the limitations caused by light diffraction or particle beam scattering in other traditional technologies, and has the advantages of low cost, high resolution, and high productivity. [0003] Among them, the template is the biggest difference between Nanoimprintlithography (Nanoimprintlithography, NIL) and the traditional optical lithography process. The template as the initial carrier of the imprinting feature dir...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C07F7/21G03F7/004G03F7/027G03F7/00
CPCC07F7/21B82Y10/00B82Y40/00G03F7/0002G03F7/0275G03F7/0757
Inventor 林宏姜学松印杰锻治诚
Owner SHANGHAI JIAOTONG UNIV
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