A method for preparing diamond-like film by strong laser irradiation

Abstract

The invention relates to a method for preparing a diamond-like film by virtue of high-power laser irradiation. According to the method for preparing the diamond-like film by virtue of the high-power laser irradiation, a graphite coating of a substrate immersed in a circulating aqueous solution is irradiated by adopting high-power pulse laser; after absorbing energy of the laser, graphite is quickly gasified and ionized to produce massive high-speed plasma and also produce an instantaneous high-temperature and high-pressure microcell on the surface of the substrate, then the surface of the substrate is cooled at a high speed; and under the extreme unbalanced condition, nucleation and growth of a diamond are realized, wherein one part of graphite is converted into diamond, and molecular-scale and atomic-scale diffusion is carried out on the surface layer of the substrate. By adopting the method for preparing the diamond-like film by virtue of high-power laser irradiation, the problems that reaction conditions are special, devices are difficult to operate and cost is high are solved, continuous synthesis of the diamond-like film under macroscopic, normal temperature and normal pressure conditions is innovatively realized, a thick diamond-like film is obtained, reaction time is short, and bonding strength between the diamond-like film and the substrate is high.

Description

technical field [0001] The invention relates to the field of artificially manufacturing diamond-like thin films, in particular to a method for preparing diamond-like thin films by strong laser irradiation. Background technique [0002] Diamond is a special material with extreme performance in mechanics, heat, optics, chemistry, electronics, etc. Its excellent performance makes it more and more widely used in the field of industrial technology. The diamond-like carbon film is a kind of amorphous carbon film. When the diamond phase is more than the graphite phase, the film layer presents characteristics similar to diamond. Such as ultra-high hardness, good chemical stability, corrosion resistance, high resistivity, etc., it has good application prospects in the fields of machinery, electronics, optics, and acoustics. At present, there are hot-wire chemical vapor deposition, microwave plasma chemical deposition, and electron-assisted deposition, etc. Among them, thin films pre...

AI Technical Summary

Problems solved by technology

However, the preparation technology of artificial nano-diamond is still immature, and the cost of preparing diamond as a raw material is high, which is not conducive to putting into production

The invention patent with the patent number CN1221806A discloses a method of compound laser chemical vapor deposition of diamond film, which uses XeCl excimer laser and compound infrared laser to deposit diamond film under vacuum conditions. Since it needs to be carried out under vacuum conditions, the device’s The operation brings certain difficulties. At the same time, the flow ratio of hydrocarbons and hydrogen into the vacuum reaction chamber needs to be strictly controlled, resulting in high cost and complicated equipment.

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