Method for improving high-temperature-oxidation resistance of TC4 titanium alloy
A high-temperature oxidation-resistant, titanium alloy technology, applied in anodic oxidation, metal material coating process, ion implantation plating, etc., can solve the problems of weak oxidation resistance of titanium alloys, achieve high-temperature oxidation resistance, wide application, Combining the effects of high performance
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Embodiment 1
[0014] On the surface of the TC4 alloy, an arc ion plating technology and an aluminum target with a purity greater than 99.9wt.% are used to deposit a 2.1 micron thick aluminum coating on the surface. The size of the TC4 sample is 20mm×30mm×2mm. Before the arc ion plating, it is roughly ground with 1200# sandpaper to remove the oxide skin on the surface. It is cleaned with ethanol in an ultrasonic cleaner for 3 minutes, and then dried with a hair dryer for later use. The main process parameters of the arc ion aluminum coating are: argon gas flow rate: 200mL / min, target diameter: 100mm, arc current 100A, substrate bias voltage -200V, deposition time 2min.
[0015] Then at room temperature, the TC4 alloy with aluminum coating on the surface is used as the anode, placed in a 100g / L sodium silicate solution, and treated with a square wave pulse micro-arc oxidation power supply with a frequency of 1200Hz and a duty cycle of 60% for 20 minutes , the square wave pulse current density...
Embodiment 2
[0017] On the surface of the TC4 alloy, an arc ion plating technology and an aluminum target with a purity greater than 99.9wt.% are used to deposit a 2.4 micron thick aluminum coating on the surface. The size of the TC4 sample is 20mm×30mm×2mm. Before the arc ion plating, it is roughly ground with 1200# sandpaper to remove the oxide skin on the surface. It is cleaned with ethanol in an ultrasonic cleaner for 3 minutes, and then dried with a hair dryer for later use. The main process parameters of the arc ion aluminum coating are: argon gas flow rate: 200mL / min, target diameter: 100mm, arc current 100A, substrate bias voltage -200V, deposition time 2.5min.
[0018] Then at room temperature, the TC4 alloy with aluminum coating on the surface is used as the anode, placed in a 100g / L sodium silicate solution, and treated with a square wave pulse micro-arc oxidation power supply with a frequency of 1200Hz and a duty cycle of 60% for 20 minutes , the square wave pulse current densi...
Embodiment 3
[0020] On the surface of the TC4 alloy, an arc ion plating technology and an aluminum target with a purity greater than 99.9wt.% are used to deposit a 2.9 micron thick aluminum coating on the surface. The size of the TC4 sample is 20mm×30mm×2mm. Before the arc ion plating, it is roughly ground with 1200# sandpaper to remove the oxide skin on the surface. It is cleaned with ethanol in an ultrasonic cleaner for 3 minutes, and then dried with a hair dryer for later use. The main process parameters of the arc ion aluminum coating are: argon gas flow rate: 200mL / min, target diameter: 100mm, arc current 100A, substrate bias voltage -200V, deposition time 3min.
[0021] Then at room temperature, the TC4 alloy with aluminum coating on the surface is used as the anode, placed in a 100g / L sodium silicate solution, and treated with a square wave pulse micro-arc oxidation power supply with a frequency of 1200Hz and a duty cycle of 60% for 20 minutes , the square wave pulse current density...
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