Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

An ion plating arc spot control device and control method

The technology of a control device and control method, which is applied in the field of arc ion plating, can solve the problems of uneven target etching, large particle pollution of the film layer, and low utilization rate of the target, so as to reduce large particle pollution and control arc spot easily , the effect of fast movement speed

Active Publication Date: 2019-07-05
NORTHEASTERN UNIV LIAONING +1
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The embodiment of the present invention proposes an ion plating arc spot control device and control method to solve the problems in the prior art of uneven target etching, low target utilization, and large particle pollution in the plated film.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • An ion plating arc spot control device and control method
  • An ion plating arc spot control device and control method
  • An ion plating arc spot control device and control method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] Embodiment 1: An application example of the magnetic field structure and control method of the control device of the present invention on a large arc source with a target size of 160 mm.

[0038] On the arc source whose target material is titanium and the size is 160mm, press figure 1 The magnetic field structure is arranged as shown, in which the N poles of all permanent magnet columns in the permanent magnet structure face the target surface, and the magnetic field generated by the permanent magnet structure passes through the target surface; the N poles of the magnetic field generated after the electromagnetic coil is energized face the target surface, and the magnetic field The induction line penetrates the target surface, and the electromagnetic field and the permanent magnetic field are coupled at the target surface. The schematic diagram of the magnetic field induction line is as follows: figure 2 shown. At this time, the axial component of the permanent magnet...

Embodiment 2

[0040] Embodiment 2: An example of the magnetic field structure of the control device of the present invention in maintaining arc discharge stability.

[0041] On the arc source with a target size of 160 mm, the magnetic field structure is installed and adjusted according to the requirements of this patent, and a CrAl alloy target is selected. By comparing the minimum current that the arc spot can stably discharge when only using the permanent magnetic field and the minimum current that the arc spot can stably discharge when the electromagnetic field and the permanent magnetic field are coupled to the magnetic field of the present invention, it shows that the axisymmetric coupled magnetic field arc source structure of the present invention can stabilize the arc discharge. aspects of the effect.

[0042] Experimental process: first pump the vacuum chamber to 1.5×10 -2 Pa, then feed nitrogen into the vacuum chamber to keep the pressure of the vacuum chamber at 1.8Pa. When the ...

Embodiment 3

[0043] Embodiment 3: the magnetic field structure and control method of the control device of the present invention, and an example of improving the coating quality.

[0044] The titanium nitride film is plated on the substrate, and the effect of the present invention on reducing the pollution of large particles and improving the quality of the film is demonstrated by comparing the quality of the plated film layer using the control method of the present invention and the static magnetic field method only.

[0045] Experimental process: After grinding and polishing the stainless steel substrate, it was ultrasonically cleaned with acetone and alcohol respectively for 20 minutes, and then dried and placed in a vacuum chamber. Evacuate to a vacuum of 3×10 -2 Pa, pass argon gas to 2.0Pa, turn on the bias voltage of 500V, and perform glow cleaning for 20min. Then pump down to 1.5×10 -2 Pa, the working pressure of feeding nitrogen reaches 1.0Pa, turn on the bias voltage of 200V, ig...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to an ion plating arc spot control device and a control method. The control device includes: a target and electromagnetic field modules and permanent magnetic field modules with opposite polarities arranged on the front and rear sides of the target. The electromagnetic field module includes an electromagnetic coil and a control module. The electromagnetic coil is controlled according to The intensity and direction of the electromagnetic field are changed by different control parameters input by the module. The arc spot control method of the present invention uses a programmable logic controller to set the scanning voltage range, scanning waveform and scanning frequency input to the electromagnetic coil, so that the arc spot can make a circular motion with the target center as the center of the circle, expanding or shrinking in diameter. Etch the target comprehensively, evenly and accurately. By setting up electromagnetic fields and permanent magnetic fields with opposite polarities, the axial magnetic field components on the target surface weaken each other after magnetic field coupling, and the radial magnetic field components superimpose each other, which can reduce the random movement tendency of arc spots and increase the probability of circular motion of arc spots. speed, making the arc spot movement more stable and reducing the presence of large particles.

Description

technical field [0001] The invention relates to arc ion plating technology, in particular to an ion plating arc spot control device and control method. Background technique [0002] As a vacuum coating technology, arc ion plating has been widely used in the fields of tooling and mold surface coating strengthening, corrosion resistance and decoration. This technology relies on the local high temperature of the arc spot generated on the surface of the cathode target in the vacuum coating chamber, so that the cathode material as the target is evaporated and ionized instantaneously, and a plasma with high ionization degree and high ion energy is generated. Adding a negative potential can coat a layer of various hard films with high hardness, dense structure and good bonding on the surface of the workpiece under the condition of relatively low heating temperature of the workpiece. The behavior of the vacuum arc is controlled by many fast-moving arc spots on the surface of the ca...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/32C23C14/54
CPCC23C14/325C23C14/54
Inventor 蔺增王书豪王庆辛玉富
Owner NORTHEASTERN UNIV LIAONING
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com