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Tungsten trioxide/carbon nitride/bismuth oxide double-Z type photocatalyst and preparation method and application thereof

A technology of tungsten trioxide and photocatalyst, applied in the field of photocatalysis, can solve the problem of poor light absorption ability, photogenerated electron-hole separation rate and photocatalytic activity, difficulty in generating superoxide radicals and hydroxyl radicals, photogenerated electron-holes Fast recombination rate and other issues, to achieve the effect of good stability of photocatalytic performance, strong redox ability, and easy industrial utilization

Active Publication Date: 2017-11-24
HUNAN UNIV
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Problems solved by technology

In the existing research, in order to improve the photogenerated carrier separation ability and photocatalytic activity of carbon nitride materials, other semiconductor materials are usually combined with carbon nitride to form heterojunctions (such as carbon nitride / tungsten trioxide binary heterojunctions). junction, carbon nitride / bismuth oxide binary heterojunction), the spectral range of light absorption can be expanded by constructing a hybrid system, and the recombination of photoelectrons and holes can be suppressed, but since these heterojunction materials use heterojunction The conduction path has the problem of low redox potential in the valence band and the conduction band. Usually, it is difficult to generate superoxide radicals and hydroxyl radicals, and the redox performance is poor.
In addition, although the Z-type mechanism can retain a strong oxidative valence band and a strong reductive conduction band, it can obtain higher redox performance than heterojunction materials, but binary Z-type photocatalytic materials (such as carbon nitride / Tungsten trioxide binary Z-type photocatalytic materials, carbon nitride / bismuth oxide binary Z-type photocatalytic materials) still have the problems of poor light absorption ability, photogenerated electron-hole separation rate and photocatalytic activity need to be further improved.
Therefore, how to comprehensively improve the problems of poor light absorption ability, fast photogenerated electron-hole recombination rate, poor photocatalytic activity, and poor redox performance in existing carbon nitride materials is a technical problem that needs to be solved urgently in this field. A tungsten trioxide / carbon nitride / bismuth oxide double Z-type photocatalyst with high photogenerated electron-hole separation efficiency, high photocatalytic activity and strong redox ability is obtained, which is useful for efficiently degrading pollutants (such as antibiotics) in wastewater of great significance

Method used

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  • Tungsten trioxide/carbon nitride/bismuth oxide double-Z type photocatalyst and preparation method and application thereof
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  • Tungsten trioxide/carbon nitride/bismuth oxide double-Z type photocatalyst and preparation method and application thereof

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Embodiment 1

[0037] A tungsten trioxide / carbon nitride / bismuth oxide double-Z photocatalyst. The tungsten trioxide / carbon nitride / bismuth oxide double-Z photocatalyst uses carbon nitride as a carrier, and the carbon nitride is modified with tungsten trioxide and Bismuth oxide.

[0038] In this embodiment, in the tungsten trioxide / carbon nitride / bismuth oxide double Z photocatalyst, the mass percentage of tungsten trioxide is 2.4%, the mass percentage of bismuth oxide is 4.6%, and the mass percentage of carbon nitride is The mass percentage content is 93.0%.

[0039] In this embodiment, tungsten trioxide has a flake structure; bismuth oxide has a microsphere structure; and carbon nitride has a slate block structure.

[0040] A method for preparing the tungsten trioxide / carbon nitride / bismuth oxide double Z-type photocatalyst of the present embodiment includes the following steps:

[0041] (1) Put 100 mg of tungstic acid, 100 mg of bismuth nitrate pentahydrate and 4 g of melamine in an agate mortar...

Embodiment 2

[0061] The application of a tungsten trioxide / carbon nitride / bismuth oxide double-Z photocatalyst in the degradation of antibiotic wastewater includes the following steps:

[0062] Weigh 0.1g CN (Comparative Example 1), WO 3 (Comparative Example 2), Bi 2 O 3 (Comparative Example 3), CW (Comparative Example 4), CB (Comparative Example 5), WB (Comparative Example 6), WCB (Example 1), respectively added to 100mL, a concentration of 10mg / L tetracycline (TC) antibiotics In the wastewater, magnetically stirred for one hour in the dark (that is, under dark conditions) to reach adsorption equilibrium; then turn on the light source and irradiate it under visible light (λ≥420nm) for photocatalytic reaction for 60 minutes to complete the degradation of dye wastewater.

[0063] At the same time, in order to eliminate the influence of tetracycline wastewater self-degradation on the degradation effect, a control group without any catalyst was also set up, and the tetracycline wastewater was irrad...

Embodiment 3

[0078] To investigate the corrosion resistance and stability of the tungsten trioxide / carbon nitride / bismuth oxide double-Z photocatalyst during the photocatalytic degradation process, including the following steps:

[0079] (1) Weigh 0.1 g of the tungsten trioxide / carbon nitride / bismuth oxide double-Z photocatalyst (WCB) in Example 1, and add it to 100 mL of tetracycline wastewater with a concentration of 10 mg / L to obtain a reaction system.

[0080] (2) Place the reaction system (tetracycline wastewater with WCB added) obtained in step (1) on a magnetic stirrer, stir for 1 hour in the dark to reach adsorption equilibrium, and take out 4 mL of solution to represent the initial liquid to be degraded, namely When the reaction time is 0 min, the concentration of the solution is measured with an ultraviolet-visible spectrophotometer and recorded as C 0 .

[0081] (3) The remaining solution in step (2) is subjected to a photocatalytic reaction under visible light. After 60 minutes of rea...

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Abstract

The invention discloses a tungsten trioxide / carbon nitride / bismuth oxide double-Z type photocatalyst and a preparation method and application thereof. The tungsten trioxide / carbon nitride / bismuth oxide double-Z type photocatalyst is prepared by using carbon nitride as a carrier, and modifying tungsten trioxide and bismuth oxide to the carbon nitride. The preparation method comprises the following steps of mixing bismuth nitrate pentahydrate, tungstic acid and melamine, grinding, and calcining, so as to obtain the tungsten trioxide / carbon nitride / bismuth oxide double-Z type photocatalyst. The tungsten trioxide / carbon nitride / bismuth oxide double-Z type photocatalyst has the advantages that the light absorption ability is strong, the photo-induced electron and cavity separation efficiency is high, the photocatalysis activity is high, the oxidation and reduction ability is strong, and the like; the synthesizing method is simple and convenient, the cost of raw material is low, the energy consumption is low, the consumption time is short, the conditions are controllable, and the like; the photocatalyst is suitable for continuous large-scale batched production, and is favorable for industrialized utilization; the double-Z type photocatalyst can be used for degrading antibiotic wastewater, the application method is simple, the degrading efficiency is high, the abrasion-resistant property is strong, the photocatalysis property and the stability are good, and the good practical application prospect is realized.

Description

Technical field [0001] The invention belongs to the technical field of photocatalysis, and relates to a double-Z type photocatalyst and a preparation method and application thereof, in particular to a tungsten trioxide / carbon nitride / bismuth oxide double-Z type photocatalyst and a preparation method and application thereof. Background technique [0002] The use of semiconductor photocatalysts to degrade toxic and harmful organic pollutants is of great significance for solving environmental pollution. However, wide band gap and low quantum efficiency are still the "bottleneck" of semiconductor photocatalysts. Therefore, the active development of highly efficient and renewable semiconductor photocatalysts with visible light response is of great significance for giving full play to the role of solar energy. [0003] Carbon nitride (g-C 3 N 4 ) As a semiconductor photocatalyst, due to its good chemical stability, suitable energy band position and economic and environmental protection ...

Claims

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Application Information

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IPC IPC(8): B01J27/24B01J23/30B01J37/08C02F1/30C02F101/34C02F101/38C02F103/34
CPCC02F1/30B01J23/30B01J27/24B01J37/082C02F2101/34C02F2101/38C02F2103/343C02F2305/10B01J35/30B01J35/39Y02W10/37
Inventor 袁兴中蒋龙波陈晓红梁婕曾光明
Owner HUNAN UNIV
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