Battery piece wool making corrosive liquid and preparation process thereof

Abstract

The invention discloses a battery piece wool making corrosive liquid which contains sodium hydroxide, tetramethylammonium hydroxide, nonionic and anion compounded surfactant and water, wherein the nonionic surfactant in the nonionic and anion compounded surfactant is sodium silicate; and the anion surfactant in the nonionic and anion compounded surfactant is one or two of lauryl sodium sulfate fatty alcohol ether sodium sulfate. Due to adoption of the nonionic and anion compounded surfactant in the corrosive liquid, an ideal texture effect is achieved when being compared with that of IPA (Isopropanol), and a silicon piece is low in reflection rate and relatively good in surface cleanliness after wool making; meanwhile tetramethylammonium hydroxide has a corrosion selective ratio approximate to that of NaOH, a pyramid formed on a woof surface on the surface of the silicon piece is small in size and high in corrosion velocity, and then the wool making time is effectively shortened; and in addition, the surfactants in the solution act up together, so that the smoothness and the uniformity of the wool surface are improved, and the surface reflection rate is reduced.

Description

technical field [0001] The invention belongs to the field of solar cell silicon chip manufacturing, and in particular relates to a cell texturing corrosion solution and a preparation process thereof. Background technique [0002] In the production process of monocrystalline silicon solar cells, surface texture is one of the key processes, which can reduce the reflection loss of sunlight on the surface of silicon wafers. However, the monocrystalline silicon wafer is a solid with high surface energy, the surface energy tends to decrease, and it is easy to be polluted by the outside world. Surface pollutants directly affect the open circuit voltage, short circuit current and photoelectric conversion efficiency of finished cells. The pollution on the surface of the silicon wafer is mainly organic impurities, metal pollution, solid particles and oxide layers generated during the cutting process. [0003] Patent CN200910035633.5 provides a mixed solution of orthophosphate and ca...

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Problems solved by technology

Patent CN201010618903.8 provides a monocrystalline silicon texturing additive and monocrystalline silicon texturing process, wherein the monocrystalline silicon texturing additive consists of a wetting agent and a defoaming agent, and the wetting agent is a non-ionic surface active agent, but the alkaline substance is a mixture of sodium hydroxide and potassium hydroxide, which does not improve the corrosion of single crystal silicon

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