Organic-inorganic composite self-driven photodetector and preparation method thereof
A photodetector, inorganic composite technology, applied in the fields of photovoltaic power generation, electric solid state devices, semiconductor/solid state device manufacturing, etc. The effect of sufficient raw materials
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Embodiment 1
[0044] (1) The silicon wafer substrate was ultrasonically cleaned in acetone, alcohol and deionized water for 20 minutes respectively. After vacuum drying, the silicon flakes were placed in a vessel filled with a mixed solution of 4.6M hydrofluoric acid and 0.01M silver nitrate for etching, and silver particles were deposited on the silicon flakes at the same time. After rinsing with deionized water, stand still in a mixed solution containing 4.6M hydrofluoric acid and 0.4M hydrogen peroxide, and heat at 50°C for 15 minutes. Rinse it with deionized water, soak it in concentrated nitric acid for 15 minutes, then rinse it with deionized water, and dry it in a vacuum dryer for use. Using the above steps, a silicon nanowire array is formed on the silicon wafer, and the silicon nanowires formed by etching are perpendicular to the surface of the silicon wafer.
[0045] (2) Put the etched silicon wafer into the atomic layer deposition chamber, use titanium isopropoxide or titanium t...
Embodiment 2
[0050] A silicon wafer with a titanium oxide film was prepared according to the method in steps (1) and (2) of Example 1, except for step (3).
[0051] (3) Dissolve 10 mg of P3HT powder in 1 mL of chlorobenzene and stir overnight, and then use a homogenizer to spin coat the surface of the titanium oxide film step by step: first spin coating at 1000r / min for 20 seconds, then spin coating at 2000r / min for 20 seconds , the desired organic-inorganic composite self-driven photodetector was obtained after the chlorobenzene volatilized.
[0052] The photodetector prepared by this method can realize the photoresponse in the range of 300-1100nm, and the responsivity can reach 9.7A / W under 0V bias, and the detection rate can reach 7.6×10 14 Jones.
[0053] figure 2 It is the responsivity curve of the photodetector measured by the present invention, and the curve in the figure is the responsivity curve of the photodetector with a titanium oxide thickness of 5nm and a P3HT concentratio...
Embodiment 3
[0055] A silicon wafer with a titanium oxide film was prepared according to the method in steps (1) and (2) of Example 1, except for step (3).
[0056] (3) Dissolve 5 mg of P3HT powder in 1 mL of chlorobenzene and stir overnight, and then use a homogenizer to spin coat the surface of the titanium oxide film step by step: first spin coating at 1000r / min for 20 seconds, then spin coating at 2000r / min for 20 seconds , the desired organic-inorganic composite self-driven photodetector was obtained after the chlorobenzene volatilized.
[0057] The photodetector prepared by this method can achieve high response to 300-1100nm monochromatic light, and the responsivity under 0V bias can reach 5.5A / W, and the detection rate can reach 1.4×10 14 Jones.
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Abstract
Description
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