Vacuum film plating method with combined magnetic field, lined straight pipe and multihole baffle combined
A porous baffle and vacuum coating technology, which is applied in vacuum evaporation coating, sputtering coating, ion implantation coating, etc., can solve the problems of film composition pollution, large particle defects, low film deposition efficiency, etc., and achieve high utilization Efficiency, the effect of ensuring uniformity
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Example Embodiment
[0025] Specific implementation mode 1: the following combination Figure 1-6 To explain this embodiment, the device used in a vacuum coating method combining a magnetic field, a lined straight pipe, and a porous baffle includes a bias power supply (1), an arc power supply (2), and an arc ion plating target source (3). ), twin target high power pulse magnetron sputtering power supply (4), twin target high power pulse magnetron sputtering target source (5), bias power waveform oscilloscope (6), twin target high power pulse magnetron sputtering power supply Waveform oscilloscope (7), waveform synchronization matching device (8), movable coil device (9), movable coil device power supply (10), rheostat device (11), multi-level magnetic field device (12), multi-level magnetic field device power supply (13) ), lining biased straight pipe and porous baffle combination device (14), lining bias power supply (15), sample stage (16) and vacuum chamber (17);
[0026] In this device:
[0027] T...
Example Embodiment
[0044] Second embodiment: The difference between this embodiment and the first embodiment is that a combined magnetic field is connected with a vacuum coating method in which a lined straight pipe and a porous baffle are combined. The arc power supply (2) is turned on, and the multi-level magnetic field power supply is turned on (5) Adjust the multi-stage magnetic field device (12), turn on the liner bias power supply (15), adjust the bias voltage of the liner biased straight pipe and the porous baffle assembly (14), turn on the movable coil device power supply (10) to adjust The movable coil device (9) adjusts the output resistance of the rheostat device (10), and the waveform synchronization matching device (8) controls the bias power supply (1) and the twin target high-power pulse magnetron sputtering power supply (4) to be turned on at the same time. The period of the output pulse of the target high-power pulsed magnetron sputtering power supply (4) is an integer multiple of...
Example Embodiment
[0045] Specific embodiment 3: The difference between this embodiment and the first embodiment is that a combined magnetic field is connected with a vacuum coating method in which a lined straight tube and a porous baffle are combined, the arc power supply (2) is turned on, and the multi-level magnetic field power supply is turned on (5) Adjust the multi-stage magnetic field device (12), turn on the liner bias power supply (15), adjust the bias voltage of the liner biased straight pipe and the porous baffle assembly (14), turn on the movable coil device power supply (10) to adjust The movable coil device (9) adjusts the output resistance of the rheostat device (10), and the waveform synchronization matching device (8) controls the bias power supply (1) and the twin target high-power pulse magnetron sputtering power supply (4) to be turned on at the same time. The target high-power pulse magnetron sputtering power supply (4) outputs high-power pulses and the bias voltage power sup...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap