Polishing liquid, preparation method and application thereof

A polishing liquid and liquid technology, applied in the field of polishing liquid, can solve the problems of unstable performance of polishing liquid and short cycle life, and achieve the effect of reducing the time of cleaning the machine, reducing crystallization, and alleviating scratches

Active Publication Date: 2019-07-12
广东惠尔特纳米科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These substances are used in combination according to the ratio, so that the polishing rate is kept in a relatively stable state during the process of polishing sapphire, and the surface of the polished sapphire has no crystallization, thus overcoming the technical problems of unstable performance and short cycle life of the sapphire polishing liquid , can also reduce the cost of sapphire polishing, but it does not mention that it will not cause damage to the sapphire wafer

Method used

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  • Polishing liquid, preparation method and application thereof
  • Polishing liquid, preparation method and application thereof
  • Polishing liquid, preparation method and application thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0057] The present embodiment provides a kind of polishing liquid, and described polishing liquid comprises the following components by weight percentage:

[0058]

[0059] Wherein the particle diameter of silica in silica sol is 120nm, and the solid capacity of silica in silica sol is 40%; Dispersant is polyethylene glycol 400; pH adjuster is potassium hydroxide, ethylenediamine and triethanolamine Combination, the mass ratio of potassium hydroxide, ethylenediamine and triethanolamine is 1:1:1; the humectant is butanediol; the mass ratio of liquid lubricant and cyclodextrin in the liquid lubricant-cyclodextrin inclusion compound 1:3, the liquid lubricant is a combination of fatty alcohol polyoxyethylene ether and nonylphenol polyoxyethylene ether, the mass ratio of fatty alcohol polyoxyethylene ether and nonylphenol polyoxyethylene ether is 1:1; liquid lubrication The preparation method of agent-cyclodextrin clathrate comprises: adding fatty alcohol polyoxyethylene ether a...

Embodiment 2

[0064] The present embodiment provides a kind of polishing liquid, and described polishing liquid comprises the following components by weight percentage:

[0065]

[0066] Wherein the particle diameter of silicon dioxide in the silica sol is 80nm, and the solid capacity of silicon dioxide in the silica sol is 50%; the dispersant is sodium citrate; the pH regulator is a combination of potassium hydroxide, ethylenediamine and triethanolamine, The mass ratio of potassium hydroxide, ethylenediamine and triethanolamine is 1:1:1; the moisturizing agent is glycerol; the mass ratio of liquid lubricant and cyclodextrin in the liquid lubricant-cyclodextrin inclusion compound is 1 : 1, the liquid lubricant is a combination of fatty alcohol polyoxyethylene ether and nonylphenol polyoxyethylene ether, the mass ratio of fatty alcohol polyoxyethylene ether and nonylphenol polyoxyethylene ether is 3:1; liquid lubricant- The preparation method of the cyclodextrin inclusion compound compris...

Embodiment 3

[0071] The present embodiment provides a kind of polishing liquid, and described polishing liquid comprises the following components by weight percentage:

[0072]

[0073] Wherein the particle diameter of silicon dioxide in the silica sol is 150nm, and the solid capacity of silicon dioxide in the silica sol is 30%; the dispersant is sodium orthophosphate; the pH regulator is a combination of potassium hydroxide, ethylenediamine and triethanolamine, The mass ratio of potassium hydroxide, ethylenediamine and triethanolamine is 1:1:1; the moisturizing agent is propylene glycol; the mass ratio of liquid lubricant and cyclodextrin in the liquid lubricant-cyclodextrin inclusion compound is 1:5 , the liquid lubricant is a combination of fatty alcohol polyoxyethylene ether and nonylphenol polyoxyethylene ether, the mass ratio of fatty alcohol polyoxyethylene ether and nonylphenol polyoxyethylene ether is 2:1; liquid lubricant-cyclopaste The preparation method of the fine clathrate...

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Abstract

The invention provides a polishing liquid, a preparation method and an application thereof, wherein the polishing liquid comprises the following components by weight percent: 80-94% of silicon sol; 0.05-2% of dispersant; 0.1-5% of PH regulator;1-5% of liquid lubricant-cyclodextrin inclusion complex; 1-3% of moisturizer; the balance of water. When the polishing liquid is used in the process of sapphire wafer polishing, the average polishing rate can be ensured, the precipitation of silicon dioxide crystal can be reduced, and the scratch of silicon dioxide crystal on sapphire wafer can be reduced, on the other hand, the crystallization of polishing liquid on the machine table can be reduced, and the time of cleaning the machine table can be reduced, so that the production efficiency can be improved.

Description

technical field [0001] The invention belongs to the technical field of polishing liquid, and in particular relates to a polishing liquid and its preparation method and application. Background technique [0002] Sapphire is a multifunctional oxide crystal integrating excellent optical properties, physical properties and chemical properties. Single crystal sapphire has good thermal properties, wear resistance, electrical properties and dielectric properties. Its hardness is second only to diamond, reaching Mohs 9, and it still has good stability at high temperatures. Therefore, it is used in optoelectronics, communications , national defense and other fields have a wide range of applications. [0003] With the continuous development of science and technology, the above-mentioned application fields have higher and higher requirements on the processing accuracy and surface integrity of sapphire crystals, and the high-efficiency and low-damage processing technology of sapphire h...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02B24B29/00
CPCB24B29/00C09G1/02
Inventor 李薇薇钟荣峰梁振何万贵
Owner 广东惠尔特纳米科技有限公司
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