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Method for producing low-oxygen molybdenum-niobium alloy target material

A production method, molybdenum-niobium technology, applied in the field of production of low-oxygen molybdenum-niobium alloy sputtering targets, can solve problems such as limited, reduced oxygen content, and reduced processing performance

Inactive Publication Date: 2019-11-08
SHANDONG GEMEI TUNGSTEN & MOLYBDENUM MATERIAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the disadvantage of this method is that, on the one hand, the heat treatment at such a high temperature will promote the interdiffusion between molybdenum and niobium, thereby reducing its processing performance; on the other hand, due to the strong affinity of niobium to oxygen, this method The effect of reducing oxygen content is relatively limited

Method used

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  • Method for producing low-oxygen molybdenum-niobium alloy target material
  • Method for producing low-oxygen molybdenum-niobium alloy target material
  • Method for producing low-oxygen molybdenum-niobium alloy target material

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Embodiment 1

[0050] The molybdenum powder with a particle size of 6.8 μm was placed in a vacuum furnace for pretreatment. The pretreatment temperature is 1200°C, and the pretreatment time is 3 hours. Take niobium hydride powder (oxygen content 2000ppm) with a particle size of 6-20 μm and mix it with potassium chloride, and then mix it with the pretreated molybdenum powder, wherein the weight ratio of Mo:NbH:KCl is 100:10:1, after 150 -250MPa cold isostatic pressing for 5-10 minutes to obtain a pressed ingot. The ingot is heat treated in a hydrogen vacuum dual-purpose furnace: firstly in a hydrogen atmosphere at 400-550°C for 2-5 hours, then raise the temperature to 650-800°C for 1-3 hours, then pump out the hydrogen, heat it at 1200-1450°C 1. Heat treatment for 3-4 hours under a vacuum pressure of 0.001-0.01Pa to obtain a molybdenum-niobium alloy ingot with a density of 70-80%. Then the alloy ingot is sintered by hot isostatic pressing at 100-200MPa and 1300-1450° C., and the holding tim...

Embodiment 2

[0052] The niobium powder (with an oxygen content of 1500ppm) having a particle size of 50-300 μm is mixed with sodium chloride having a mass fraction of 1.2-1.6%, and subjected to cold isostatic pressing at 150-250 MPa to obtain an ingot. The ingot is sintered in a vacuum hydrogen dual-purpose furnace. First, it is kept at 600-800°C for 3-5 hours under a hydrogen atmosphere, then the hydrogen is pumped out, and the temperature is raised to 1500-1700°C for 2-5 hours, and finally the temperature is raised to 1900- Insulate at 2100°C for 3-6 hours, keep the air pressure at 0.001-0.01Pa after vacuuming, and obtain a sintered niobium ingot with a density of 92-96% and an oxygen content of less than 200ppm.

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Abstract

The invention discloses a method for producing a low-oxygen molybdenum-niobium alloy target material. The method comprises the following steps that 1, molybdenum powder is put into a vacuum sinteringfurnace for heat treatment; 2, niobium metal powder and alkali metal halide MX are uniformly mixed to obtain mixed powder; 3, the molybdenum powder obtained in the step 1 and the mixed powder obtainedin the step 2 are put into a V-shaped mixer for mixing, and cold isostatic pressing molding is carried out after a rubber sleeve is put into the mixture; and 4, an ingot is put into a vacuum-hydrogendual-purpose sintering furnace for heat treatment. Compared with the prior art, the method has the advantages of being low in oxygen removal cost and good in effect, and the obtained molybdenum-niobium alloy target material is low in impurity and oxygen content and excellent in performance.

Description

technical field [0001] The invention belongs to the technical field of metallurgical materials, and specifically designs a production method of a low-oxygen molybdenum-niobium alloy sputtering target Background technique [0002] Due to its high melting point, high electrical conductivity, and excellent corrosion resistance, molybdenum-niobium alloys are widely used in electrode deposition layers of thin-film transistors and contact layers of touch screens. However, an excessively high oxygen content in molybdenum-niobium alloys will lead to the generation of oxides. On the one hand, this oxide will cause the target to produce an arc effect during the sputtering process and cause local melting, thereby affecting the effect of sputtering evaporation. On the other hand, oxides are mainly concentrated at the interface of molybdenum-niobium, which reduces the formability of the molybdenum-niobium target. Therefore, reducing the overall oxygen content of molybdenum-niobium targ...

Claims

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Application Information

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IPC IPC(8): B22F1/00B22F3/04B22F3/10B22F3/15C23C14/34
CPCB22F3/04B22F3/101B22F3/1003B22F3/1039B22F3/15C23C14/3414B22F2998/10B22F1/142B22F2003/185
Inventor 陈兴友
Owner SHANDONG GEMEI TUNGSTEN & MOLYBDENUM MATERIAL CO LTD
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