Boron molybdenum nitride/molybdenum sulfide nano composite coating and preparation method thereof
A nano-composite coating, molybdenum sulfide technology, applied in coating, metal material coating process, vacuum evaporation plating and other directions, to achieve the effect of simple process, easy implementation and easy content
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[0032] The specific steps of the preparation method of the molybdenum boron nitride / molybdenum sulfide nanocomposite coating provided by the present invention are:
[0033] 1) Use metal (steel, cast iron or cemented carbide) or ceramic as the base, de-oil, de-oxidize, and dry with hot air, and then fix it on the rotatable work holder in the vacuum chamber;
[0034] 2) Combine high purity Mo and a certain amount of B 4 C and MoS 2 The composite target composed of target pieces is installed on the magnetron sputtering source; the metal Mo and (B 4 C and MoS 2 ) Area ratio is 10:1~7:3, where B 4 C and MoS 2 The area ratio is 5:1~1:5, the purity of Mo is 99.99%, B 4 C and MoS 2 The purity is 99.9%, and the distance between the composite target and the substrate is 80-120mm;
[0035] 3) Then the vacuum in the vacuum chamber is pumped to ≤5×10 -4 Pa, Ar with a flow rate of 20sccm, when the pressure of the vacuum chamber is 0.3Pa, pre-sputtering Mo / B 4 C composite target 5min, pre-sputtering...
Embodiment 1
[0041] 1) Put figure 1 Medium molybdenum target and 2 B 4 C and 2 MoS 2 Composed of composite target as magnetron sputtering source, where B 4 C and MoS 2 The area ratio to Mo is 1:1:8, and the distance between the composite target and the substrate is 10cm;
[0042] 2) Select high-speed steel as the base material, derust and polish its surface, and clean it with acetone, alcohol and deionized water in an ultrasonic cleaner for 10 minutes, then dry it with hot air and place it on the sample table in the vacuum chamber;
[0043] 3) The vacuum degree in the vacuum chamber is pumped to ≤5×10 -4 After Pa, apply a negative bias voltage of 800V to the substrate, and clean the surface of the substrate for 10 minutes with argon ion sputtering generated by glow discharge;
[0044] 4) Into 4sccm argon and 20sccm nitrogen, the flow ratio is 1:5, the working pressure is 0.8Pa, forming a mixed atmosphere, using magnetron sputtering technology to sputter Mo and (B 4 C and MoS 2 ) Composite target, ...
Embodiment 2
[0046] 1) Put figure 1 Medium molybdenum target and 2 B 4 C and 1 MoS 2 Composed of composite target as magnetron sputtering source, where B 4 C and MoS 2 The area ratio to Mo is 2:1:17, and the distance between the composite target and the substrate is 10cm;
[0047] 2) Select high-speed steel as the base material, derust and polish its surface, and clean it with acetone, alcohol and deionized water in an ultrasonic cleaner for 10 minutes, then dry it with hot air and place it on the sample table in the vacuum chamber;
[0048] 3) The vacuum degree in the vacuum chamber is pumped to ≤5×10 -4 After Pa, apply a negative bias voltage of 800V to the substrate, and clean the surface of the substrate for 10 minutes with argon ion sputtering generated by glow discharge;
[0049] 4) Into 4sccm argon and 20sccm nitrogen, the flow ratio is 1:5, the working pressure is 0.8Pa, forming a mixed atmosphere, using magnetron sputtering technology to sputter Mo and (B 4 C and MoS 2 ) Composite target....
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