Preparation method of patterned vanadium dioxide film

A vanadium dioxide and patterning technology, applied in the direction of electrical components, etc., can solve problems affecting the crystal structure of thin films, microscopic morphology and device performance, high fineness requirements, complex process steps, etc., to meet the requirements of fast and large-scale The effect of production, complete structure and simple and easy process flow

Active Publication Date: 2021-11-23
UNIV OF ELECTRONICS SCI & TECH OF CHINA
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Problems solved by technology

The current lithography technologies mainly include wet etching, electron beam lithography, excimer lithography, extreme ultraviolet lithography, etc. These methods usually involve expensive equipment such as vacuum or ion beam, the process steps are complicated, the precision requirements are high, and the cost High; in addition, the above-mentioned pattern processing methods are usually applied after the preparation of functional thin films, because the above-mentioned methods involve highly corrosive chemicals or high temperatures will affect the crystal structure, microscopic morphology and device performance of the film

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  • Preparation method of patterned vanadium dioxide film
  • Preparation method of patterned vanadium dioxide film
  • Preparation method of patterned vanadium dioxide film

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preparation example Construction

[0031] A method for preparing a patterned vanadium dioxide film, comprising the following steps:

[0032] Step 1. Prepare the vanadium ion precursor solution by polymer assisted deposition (PAD, Polymer assisted deposition);

[0033] Step 2. Clean the substrate, ultrasonically clean the substrate with acetone, absolute ethanol and deionized water in sequence, and then dry it with nitrogen for later use;

[0034] Step 3. Spin-coat the vanadium ion precursor solution obtained in step 1 on the cleaned substrate in step 2 by spin coating to obtain a film sample;

[0035] Step 4. adopting laser cutting to prepare the required graphics on the surface of the film sample obtained in step 3;

[0036] Step 5. Place the patterned sample in step 4 in a tube furnace and heat-treat it under a nitrogen-hydrogen mixed atmosphere. The specific process is: raise the temperature from room temperature to 440-460°C and keep it for 110-130min. Polymer pyrolysis to remove excess carbon in the film...

Embodiment 1

[0038] A method for preparing a patterned vanadium dioxide film, specifically comprising the following steps:

[0039] Step 1: Use the PAD method to prepare the vanadium ion precursor solution, wherein, take 0.0008 mol of polyethyleneimine (PEI), a water-soluble polymer raw material, and dissolve it uniformly in 50 mL of water, and then add 0.0008 mol of ethylenediaminetetraacetic acid to the solution (ethylene diamine tetraacetic acid, EDTA) and mix well, then add 0.0008 ammonium metavanadate (NH 4 VO 3 ) to stir evenly to obtain a polymer solution containing vanadium ions; pour the solution into an ultrafiltration cup, select an ultrafiltration membrane with a molecular weight of 10,000, add water to filter twice, and use a pinhole filter with a diameter of 13 mm and an aperture of 0.45 μm Obtain the precursor solution after filtering through the filter;

[0040]Step 2: Clean the silicon substrate, ultrasonically clean the substrate with acetone, absolute ethanol and deion...

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Abstract

The invention provides a preparation method of a patterned vanadium dioxide film, and belongs to the technical field of vanadium dioxide film preparation. According to the preparation method, a laser processing step is added in the process of growing a film through a polymer-assisted deposition method, a needed pattern can be formed in one step, fine patterning of a vanadium dioxide film can be achieved, the edge is clear, and the structure is complete. The prepared vanadium dioxide film is excellent in electrical property and good in phase change characteristic, the resistance change before and after phase change is 3-4 orders of magnitude or above, and the structure and the surface appearance of the film are not affected after laser-assisted patterning. The preparation method does not need a mask or assistance of photoresist, is simple and feasible in process flow, high in reliability and low in cost, can meet rapid and large-scale production, and has a very good popularization prospect.

Description

technical field [0001] The invention belongs to the technical field of vanadium dioxide film preparation, and in particular relates to a method for preparing a patterned vanadium dioxide film based on a polymer-assisted deposition method. Background technique [0002] Vanadium dioxide (VO 2 ) is a transition metal oxide with phase transition characteristics. When the temperature rises to the phase transition temperature, vanadium dioxide will undergo a rapid and reversible mutation from the insulating state to the metallic state. Before and after the phase transition, its electrical properties, optics The characteristics will change obviously, the resistance change can reach 4 to 5 orders of magnitude, and the transmission of light will also show the phenomenon of low-temperature high-transmission and high-temperature low-transmission, so it has good potential application value and broad application prospects. It is considered to be a revolutionary material for the future e...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L45/00
CPCH10N70/231H10N70/8833H10N70/021H10N70/061H10N70/063
Inventor 高敏杨帆林媛潘泰松路畅徐晨曦
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
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